H10W72/5525

Semiconductor device

The on-resistance of a semiconductor device is reduced. A package structure composing the semiconductor device includes a die pad, a plurality of leads, a first semiconductor chip having a power transistor and mounted on the die pad, and a second semiconductor chip including a control circuit for controlling the power transistor and mounted on the first semiconductor chip. Here, a source pad of the first semiconductor chip is electrically connected to a first lead and a seventh lead of the plurality of leads via a clip made of a material which is copper as a main component, and the width (and cross-sectional area) of the clip is larger than the width (and diameter) of a wire in plan view.

Bonding wire for semiconductor devices

There is provided a bonding wire for semiconductor devices that exhibits a favorable bondability even when being applied to wedge bonding at the room temperature, and also achieves an excellent bond reliability. The bonding wire includes a core material of Cu or Cu alloy (hereinafter referred to as a Cu core material), and a coating containing a noble metal formed on a surface of the Cu core material. A concentration of Cu at a surface of the wire is 30 to 80 at %.

Insulation module and gate driver
12581992 · 2026-03-17 · ·

This insulation module is provided with: a first conductor and a second conductor, which are buried in an insulating layer so as to face each other at a distance in the thickness direction of the insulating layer; a first electrode which is connected to the first conductor; a second electrode which is connected to the second conductor, while being arranged at a position that is away from the first electrode when viewed from the thickness direction of the insulating layer; a passivation layer which is formed on the surface of the insulating layer; a low dielectric constant layer which is formed on the surface of the passivation layer, and has a lower dielectric constant than the passivation layer; and a mold resin which covers the low dielectric constant layer.

NANOTWIN COPPER PLATING FOR MULTI-LAYERED LEADFRAMES

A described example includes a method for fabricating an integrated circuit (IC) device. The method can include forming a mask on a surface of a multi-layer substrate, in which the multi-layer substrate includes at least one leadframe having spaced apart regions of copper distributed across and extending from the surface into at least one layer of the multi-layer substrate. The method can also include forming nanotwin copper bond pads on the surface of the multi-layer substrate over a respective region of the regions of copper. The method can also include removing the mask and forming a layer of an insulating material over the surface of the multi-layer substrate and around the nanotwin copper bond pad.

SELECTIVE PLATING FOR PACKAGED SEMICONDUCTOR DEVICES
20260082971 · 2026-03-19 ·

A described example includes: a semiconductor die having a device side surface and an opposing backside surface, the backside surface mounted to a die pad of a lead frame, the lead frame comprising conductive leads spaced from the die pad; a conductor layer overlying the device side surface; bond pads including bond pad conductors formed in the conductor layer, a nickel layer over the bond pad conductors, and a palladium or gold layer over the nickel layer; conductor traces formed in the conductor layer, the conductor traces free from the nickel layer and the palladium or gold layer; bond wires bonded to the bond pads electrically coupling the bond pads to conductive leads; and mold compound covering the semiconductor die, the bond pads, the bond wires, and portions of the lead frame, wherein portions of the conductive leads are exposed from the mold compound to form terminals.

SEMICONDUCTOR DEVICE PACKAGE WITH VERTICALLY STACKED PASSIVE COMPONENT
20260083017 · 2026-03-19 ·

In a described example, an apparatus includes: a package substrate with conductive leads; a semiconductor die mounted to the package substrate, the semiconductor die having a first thickness; electrical connections coupling bond pads on the semiconductor die to conductive leads on the package substrate; brackets attached to the package substrate spaced from the semiconductor die and extending away from the package substrate to a distance from the package substrate that is greater than the first thickness of the semiconductor die; and mold compound covering the package substrate, the semiconductor die, the brackets, and the semiconductor die to form a semiconductor device package having a board side surface and a top surface opposite the board side surface, and having portions of the brackets exposed from the mold compound on the top surface of the semiconductor device package to form mounts for a passive component.

Semiconductor device, method for manufacturing same, and electric power converter
12588539 · 2026-03-24 · ·

In a semiconductor device, a first structure including a first uneven unit and a second structure covering the first structure and including a second uneven unit are formed in a bonding region defined in a semiconductor substrate. Metal wiring is joined to the second uneven unit in the second structure. A depth of a recess in the second uneven unit is shallower than a depth of a recess in the first uneven unit. An insulating member defining the bonding region is formed so as to reach the semiconductor substrate.

SEMICONDUCTOR DEVICE
20260090484 · 2026-03-26 ·

Semiconductor device includes: semiconductor elements electrically connected in parallel; pad portion electrically connected to the semiconductor elements; and terminal portion electrically connected to the pad portion. As viewed in thickness direction, the semiconductor elements are aligned along first direction perpendicular to the thickness direction. The pad portion includes closed region surrounded by three line segments each formed by connecting two of first, second and third vertex not disposed on the same straight line. As viewed in thickness direction, the first vertex overlaps with one semiconductor element located in outermost position in first sense of the first direction. As viewed in the thickness direction, the second vertex overlaps with one semiconductor element located in outermost position in second sense of the first direction. As viewed in the thickness direction, the third vertex is located on perpendicular bisector of the line segment connecting the first and second vertex.

Semiconductor device and method for manufacturing semiconductor device
12593717 · 2026-03-31 · ·

According to one embodiment, a semiconductor device includes a wiring substrate having a first surface, a second surface opposite to the first surface, and a side surface connecting the first surface and the second surface. A first electrode is on the first surface. A semiconductor element is on the wiring substrate and electrically connected to the first electrode. A resin layer covers the semiconductor element and the first surface from a first direction orthogonal to the first surface. A portion of the resin layer contacts the side surface of the wiring substrate from a second direction parallel to the first surface. The resin layer has an outside side surface that is substantially parallel to the first direction.

SEMICONDUCTOR PACKAGE
20260101817 · 2026-04-09 ·

A semiconductor package includes a substrate, a first semiconductor die disposed on the substrate, a second semiconductor die stacked on the first die and offset from it in a first direction and a second direction that are perpendicular to each other, and a third semiconductor die stacked on the first and second dies and offset from them in the first direction. The first semiconductor die includes a first pad and a second pad, arranged successively in the second direction. The second semiconductor die includes a third pad and a fourth pad, and the third semiconductor die includes a fifth pad and a sixth pad, each arranged successively in the second direction. A first conductive pattern connects the first and fifth pads, while a second conductive pattern connects the second, fourth, and sixth pads. The first and second conductive patterns are spaced apart from the third pad.