A semiconductor device comprising a terminal, a semiconductor element and a sealing resin. The semiconductor element is disposed on one side of the terminal in a first direction and electrically connected to the terminal. The sealing resin covers the semiconductor element and a part of the terminal. The sealing resin has a bottom surface disposed on an opposite side to the semiconductor element with respect to the terminal in the first direction. The terminal extends beyond the bottom surface.

A three-dimensional integrated circuit (3D IC) including a first die, a second die, a bonding layer between the first and second dies. The bonding layer bonds the first and second dies. The 3D IC also includes a chipping and delamination barrier (CDB) extending across the first die, the bonding layer, and the second die.

Microelectronic packages and methods of fabrication are described. In an embodiment, a redistribution layer spans across multiple components, and includes a region of patterned wiring traces that may mitigate stress in the RDL between the multiple components.

A semiconductor and a method of fabricating the semiconductor having multiple, interconnected die including: providing a semiconductor substrate having a plurality of disparate die formed within the semiconductor substrate, and a plurality of scribe lines formed between pairs of adjacent die of the plurality of disparate die; and fabricating, by a lithography system, a plurality of inter-die connections that extend between adjacent pair of die of the plurality of die.

A method of manufacturing a semiconductor chip includes forming a first stack by alternately stacking first material layers and second material layers over a semiconductor substrate, forming a first trench penetrating the first stack, and forming a first stress concentration portion by forming a second stack over the first stack.

In one example, an electronic device comprises a substrate comprising a conductive structure and an inner side and an outer side, a first electronic component over the inner side of the substrate and coupled with the conductive structure, a lid over the substrate and the first electronic component and comprising a first hole in the lid, and a thermal interface material between the first electronic component and the lid. The thermal interface material is in the first hole. Other examples and related methods are also disclosed herein.

A semiconductor device package comprises a semiconductor device, a first encapsulant surrounding the semiconductor device, a second encapsulant covering the semiconductor device and the first encapsulant, and a redistribution layer extending through the second encapsulant and electrically connected to the semiconductor device.

A semiconductor structure including a substrate and protection structures is provided. The substrate includes a die region. The die region includes corner regions. The protection structures are located in the corner region. Each of the protection structures has a square top-view pattern. The square top-view patterns located in the same corner region have various sizes.

Semiconductor devices including seal rings and method of making the same is provided. A semiconductor device comprises an interconnect layer over a substrate. The interconnect layer comprises a barrier layer over a dielectric layer. A seal ring is in the interconnect layer and the seal ring extends through the interconnect layer to abut the substrate. An insulator layer is around the seal ring and the insulator layer spaces the seal ring from the barrier layer. A protective structure is laterally adjacent to the seal ring and the protective structure extends through the interconnect structure to abut the substrate. The seal ring may be segmented and comprises a first segment in a first trench in an interconnect stack, and a second segment in a second trench in the interconnect stack.

A semiconductor device according to an embodiment includes a substrate, a transistor, an insulating layer, and a first sealing portion. The substrate includes a first region, and a second region provided to surround an outer periphery of the first region. The transistor is provided on the substrate in the first region. The insulating layer is provided above the transistor and over the first region and the second region. The first sealing portion is provided to divide the insulating layer and surround the outer periphery of the first region in the second region. The first sealing portion includes a first void.