A stacked semiconductor device includes a base semiconductor die and a plurality of core semiconductor dies that are stacked in a vertical direction, a plurality of temperature sensing circuits included in the plurality of core semiconductor dies, respectively, a conversion circuit included in the base semiconductor die, and a plurality of vertical conductive paths electrically connecting the base semiconductor die and the plurality of core semiconductor dies, through silicon vias provided in the plurality of vertical conductive paths in the vertical direction. The plurality of temperature sensing circuits generate sensing voltages that vary according to operating temperatures, and transfer the sensing voltages to the conversion circuit through a first vertical conductive path among the plurality of vertical conductive paths. The conversion circuit converts the sensing voltages into a temperature code.

Provided are a semiconductor package of which yield may be improved through rescuing and a test method and a rescue method for the semiconductor package. The semiconductor package includes a base chip, a plurality of memory chips stacked on the base chip, and a deactivation controller configured to deactivate the memory chips, wherein the memory chips are classified into at least two stack-ID (SID) regions, each of the at least two SID regions includes a subset of the plurality (set number) of memory chips, and, when a fail-SID region including a failed memory chip, from among the at least two SID regions, exists, the deactivation controller is configured to deactivate all memory chips included in the fail-SID region, and activate memory chips in remaining SID regions other than the fail-SID region.

A semiconductor memory device is provided. The device includes: first word lines in N layers, the first word lines extending from a first stack region toward first stair regions; second word lines in the N layers, the second word lines extending from a second stack region toward second stair regions; first memory cells provided in the first stack region; second memory cells provided in the second stack region; N first word line contacts connected to the first word lines in the first stair regions; and N second word line contacts connected to the second word lines in the second stair regions. A first word line in a Kth layer (K being an integer from 1 to N) among the first word lines and a second word line in an (NK+1)th layer among the second word lines are commonly connected to one sub-word line driver.

A method of forming a semiconductor device includes: forming a conductive pad over and electrically coupled to an interconnect structure, where the interconnect structure is disposed over a substrate and electrically coupled to electrical components formed on the substrate; forming a passivation layer over the conductive pad and the interconnect structure; and forming a sacrificial test structure over the passivation layer and electrically coupled to the conductive pad, where the sacrificial test structure includes a sacrificial pad extending along an upper surface of the passivation layer distal from the substrate, and includes a sacrificial via extending into the passivation layer and contacting the conductive pad.

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a first die and a through-dielectric via (TDV) surrounded by a dielectric material in a first layer, where the TDV has a greater width at a first surface and a smaller width at an opposing second surface of the first layer; a second die, surrounded by the dielectric material, in a second layer on the first layer, where the first die is coupled to the second die by interconnects having a pitch of less than 10 microns, and the dielectric material around the second die has an interface seam extending from a second surface of the second layer towards an opposing first surface of the second layer with an angle of less than 90 degrees relative to the second surface; and a substrate on and coupled to the second layer.

A memory device includes a lower source-level semiconductor layer, a source contact layer, and an upper source-level semiconductor layer, an alternating stack of insulating layers and electrically conductive layers, a memory opening vertically extending through the alternating stack, the upper source-level semiconductor layer, and the source contact layer, and a memory opening fill structure located in the memory opening and including a memory film and a vertical semiconductor layer having a surface segment that contacts the source contact layer. In one embodiment, the upper source-level semiconductor layer may be locally thickened to provide sufficient etch resistance during formation of a lateral isolation trench. In another embodiment, a sacrificial line trench fill structure may be employed as an etch stop structure during formation of a lateral isolation trench.

Provided is a three-dimensional storage device using wafer-to-wafer bonding. A storage device includes a first chip including a first substrate and a peripheral circuit region including a first control logic circuit configured to control operation modes of the non-volatile memory device and a second chip including a second substrate and three-dimensional arrays of non-volatile memory cells. The second chip may be vertically stacked on the first chip so that a first surface of the first substrate faces a first surface of the second substrate, and a second control logic circuit is configured to control operation conditions of the non-volatile memory device and is arranged on a second surface of the second substrate, the second surface of the second substrate being opposite to the first surface of the second substrate of the second chip.

A semiconductor device includes: a multilayered wiring layer including an insulation layer (30) and a diffusion prevention layer (21, 22, 23, 24) stacked alternately and including a wiring layer (11, 12, 13) internally; a gap section (50) disposed at least in a portion of the insulation layer (30); and a support section (60) disposed at least in a portion of the gap section (50) and configured to support the multilayered wiring layer.

An integrated circuit device including: a first integrated circuit die having an image sensing pixel array; a second integrated circuit die having an image processing logic circuit and an inference logic circuit; and a third integrated circuit die having a memory cell array. The second integrated circuit die and the third integrated circuit die are connected via a direct bond interconnect. The inference logic circuit is configured to process an image from the image sensing pixel array via multiplication and accumulation operations based on memory cells in the memory cell array having threshold voltages programmed to store data in multiplications and output currents from the memory cells connected to lines in summations.

A display apparatus includes a first substrate including a display area and a non-display area at least partially surrounding the display area, and a groove that overlaps the non-display area and is recessed in a thickness direction, pixels located on the first substrate and overlapping the display area, a driving chip located in the groove, and a printed circuit board located in the non-display area and overlapping the driving chip in a plan view.