A method of manufacturing a semiconductor package may include disposing, in a lower mold, a substrate strip in which a plurality of semiconductor chips are arranged in a horizontal direction, providing, in an upper mold, a release film to which a first encapsulant is attached, allowing the upper mold and the lower mold to be proximate to each other such that a first encapsulant is adjacent to an upper surface of each of the plurality of semiconductor chips, injecting a second encapsulant into a space between the upper mold and the lower mold, heating the first encapsulant and the second encapsulant to form a molded structure including a first encapsulating layer and a second encapsulating layer, allowing the upper mold and the lower mold to be spaced from each other such that the molded structure is separated from the release film, and cutting the molded structure.

Compact inductors are disclosed herein. In certain embodiments, a compact inductor includes a ferrite core including a ferrite body, and a first conductive pillar and a second conductive pillar that each extend from a bottom surface of the ferrite body to a top surface of the ferrite body. Additionally, the compact inductor includes a planar substrate coupled to the top surface of the ferrite body. The planar substrate includes interconnect that electrically connects the first conductive pillar to the second conductive pillar.

According to one aspect, a semiconductor package structure is provided. The semiconductor package structure includes: a plurality of first semiconductor chips arranged as being stacked along a first direction, the first semiconductor chip includes at least one first conductive structure, the first conductive structure includes a first connection structure extending along the first direction, a second connection structure extending along the first direction, and an interconnection structure between the first connection structure and the second connection structure in the first direction, and the interconnection structure is connected with both the first connection structure and the second connection structure; and a first bump connection layer between two adjacent ones of the first semiconductor chips in the first direction, the first bump connection layer includes at least one first bump structure, and the first bump structure is coupled with each of the first conductive structures in the two adjacent first semiconductor chips.

An electronic device includes: a first insulating layer; a first metal bump disposed on the first insulating layer; a second insulating layer disposed on the first metal bump; a metal layer, wherein the first insulating layer is disposed between the second insulating layer and the metal layer; a second metal bump disposed between the metal layer and the first insulating layer, wherein the second metal bump electrically connects to the first metal bump; a third insulating layer disposed between the second metal bump and the first insulating layer, wherein the third insulating layer includes an opening exposing a portion of the second metal bump; and a fourth insulating layer disposed between the third insulating layer and the first insulating layer, wherein a portion of the fourth insulating layer extends and is disposed in the opening to contact the second metal bump.

A method of making an assembly can include juxtaposing a top surface of a first electrically conductive element at a first surface of a first substrate with a top surface of a second electrically conductive element at a major surface of a second substrate. One of: the top surface of the first conductive element can be recessed below the first surface, or the top surface of the second conductive element can be recessed below the major surface. Electrically conductive nanoparticles can be disposed between the top surfaces of the first and second conductive elements. The conductive nanoparticles can have long dimensions smaller than 100 nanometers. The method can also include elevating a temperature at least at interfaces of the juxtaposed first and second conductive elements to a joining temperature at which the conductive nanoparticles can cause metallurgical joints to form between the juxtaposed first and second conductive elements.

A method of electroplating a metal into features, having substantially different depths, of a partially fabricated electronic device on a substrate is provided. The method includes adsorbing accelerator into the bottom of recessed features; partially filling the features by a bottom up fill mechanism in an electroplating solution; diffusing leveler into shallow features to decrease the plating rate in shallow features as compared to deep features; and electroplating more metal into the features such that the height of metal in deep features is similar to the height of metal in shallow features.

A semiconductor structure includes a semiconductor chip, a substrate and a plurality of bump segments. The bump segments include a first group of bump segments and a second group of bump segments collectively extended from an active surface of the semiconductor chip toward the substrate. Each bump segment of the second group of bump segments has a cross-sectional area greater than a cross-sectional area of each bump segment of the first group of bump segments. The first group of bump segments includes a first bump segment and a second bump segment. Each of the first bump segment and the second bump segment includes a tapered side surface exposed to an environment outside the bump segments. A portion of a bottom surface of the second bump segment is stacked on the first bump segment, and another portion of the bottom surface of the second bump segment is exposed to the environment.

Implementations of a semiconductor package may include a die; a first pad and a second pad, the first pad and the second pad each including a first layer and a second layer where the second layer may be thicker than the first layer. At least a first conductor may be directly coupled to the second layer of the first pad; at least a second conductor may be directly coupled to the second layer of the second pad; and an organic material may cover at least the first side of the die. The at least first conductor and the at least second conductor extend through openings in the organic material where a spacing between the at least first conductor and the at least second conductor may be wider than a spacing between the second layer of the first pad and the second layer of the second pad.

A chip structure having an interconnect and a manufacturing method thereof include a buffer layer formed between an upper metal structure and a passivation layer under the upper metal structure so as to prevent fractures, such as cracks, from occurring in the passivation layer due to difference of stress between the upper metal structure and the passivation layer.

An under bump metallurgy (UBM) and redistribution layer (RDL) routing structure includes an RDL formed over a die. The RDL comprises a first conductive portion and a second conductive portion. The first conductive portion and the second conductive portion are at a same level in the RDL. The first conductive portion of the RDL is separated from the second conductive portion of the RDL by insulating material of the RDL. A UBM layer is formed over the RDL. The UBM layer includes a conductive UBM trace and a conductive UBM pad. The UBM trace electrically couples the first conductive portion of the RDL to the second conductive portion of the RDL. The UBM pad is electrically coupled to the second conductive portion of the RDL. A conductive connector is formed over and electrically coupled to the UBM pad.