A method for assembling a stacked substrate package includes: a) binding a laminated base substrate, configured to route interconnections between first and second surfaces of the laminated base substrate, to a rigid carrier to prevent warping of the laminated base substrate; b) coupling an integrated circuit die to a dielectric build-up substrate to form a substrate stack, where the dielectric build-up substrate routes interconnections between first and second surfaces of the dielectric build-up substrate; c) coupling the second surface of the dielectric build-up substrate to the laminated base substrate; and d) releasing the rigid carrier from the laminated base substrate. At least one of: a) is performed before b) and c), b) and c) are performed at the same time, and d) is performed after a), b) and c); or b) is performed before c), c) is performed after a), and d) is performed after a), b) and c).

A micro-device substrate structure includes a support substrate having a support-substrate surface, spatially separated indentations extending into the support substrate, and a micro-device comprising a micro-device body and micro-device posts. The micro-device posts extend from the micro-device body into the support substrate and each of the posts is disposed at least partly in a different indentation. A release layer can be disposed between the micro-device posts and the support substrate. When the release layer is etched, the micro-device can be completely disconnected from the source substrate, removed from the indentations and source substrate, and micro-transfer printed to a target substrate.

In some examples, a method for manufacturing a semiconductor package comprises coupling first and second semiconductor dies to a metal frame; covering the first and second semiconductor dies and the metal frame with a mold compound; coupling first and second passive components to the first and second semiconductor dies, the first and second passive components on an external surface of the mold compound; sawing through a portion of the metal frame from a first direction to form a first vertical surface of the metal frame, the first vertical surface having a first roughness due to the sawing; and laser cutting through the mold compound and a remainder of the metal frame from a second direction opposing the first direction to form a second vertical surface on the metal frame and a third vertical surface on the mold compound, the second vertical surface having a second roughness due to the laser cutting and the third vertical surface having a third roughness due to the laser cutting.

This disclosure is related to integrating pixelated microdevices into a system substrate to develop a functional system such as display, sensors, and other optoelectronic devices. The process may involve having a structure of release layers in the housing and then using different decoupling mechanisms for release. The release layers are not limited to but can be a combination of chemical or optical or mechanical release layers.

A method for manufacturing a semiconductor device includes preparing a temporary fixing structure body in which semiconductor elements each including a first surface on which a connection terminal is formed and a second surface are attached to a temporary fixing material, forming a curable bonding adhesive layer on the second surface of each of the semiconductor elements, attaching a carrier to one surface of the curable bonding adhesive layer opposite to the semiconductor elements, fixing the semiconductor elements to the carrier by curing the curable bonding adhesive layer, and removing the temporary fixing material. The semiconductor elements are attached onto the temporary fixing material such that the first surface of each of the semiconductor elements is directed toward the temporary fixing material, and are encapsulated with an encapsulant material such that the second surface of each of the semiconductor elements is exposed from an encapsulant material layer.

A substrate treating apparatus includes: a chill plate; a first support part installed on the chill plate and including a first tip having a first height; and a second support part installed on the chill plate and having a height changed according to a temperature, wherein at a first temperature, a maximum height of the second support part becomes equal to or lower than a height of the first tip, such that the substrate is supported by the first tip of the first support part, and at a second temperature lower than the first temperature, the second support part becomes higher than the first tip, such that the substrate is supported by the second support part.

This invention relates to a wafer holder for providing even temperature distribution, which comprises a support assembly and a diffusion unit. The diffusion unit is made of a porous material and is disposed on a top surface of the support assembly. The diffusion unit includes a main body, a plurality of protrusions, and at least one diffusion channel, wherein the protrusions and the diffusion channel are disposed on a bearing surface of the main body. A gas is transmitted to the diffusion unit from an inlet pipeline of the support assembly, and then transmitted through pores of the diffusion unit to the bearing surface, and comes into contact with the wafer on the diffusion unit to adjust the temperature of the wafer, and is beneficial for improving the uniformity of the temperature distribution of the wafer.

An electronic structure includes: a substrate having a first surface; a functional element unit including a functional element having an electronic function, and a protector covering the functional element, the functional element unit having a second surface facing the first surface; a support disposed between the first surface and the second surface, the support supporting the second surface; and a projection disposed on a first surface side of the substrate, the projection projecting toward the functional element unit. The support has a third surface in contact with the second surface of the functional element unit, the third surface having an area smaller than an area of the second surface. The projection has a fourth surface in contact with or close to the functional element unit, the fourth surface having an area smaller than the area of the second surface, the projection being formed by a different material from the support.

A chip package includes a semiconductor substrate, a conductive pad, an isolation layer, and a redistribution layer. The semiconductor substrate has a first surface, a second surface facing away from the first surface, a through hole through the first and second surfaces, and a recess in the first surface. The conductive pad is located on the second surface of the semiconductor substrate and in the through hole. The isolation layer is located on the second surface of the semiconductor substrate and surrounds the conductive pad. The redistribution layer is located on the first surface of the semiconductor substrate, and extends into the recess, and extends onto the conductive pad in the through hole.

A protective member forming apparatus includes a resin film adhering unit which causes a resin film to adhere to a front surface of a substrate so as to conform to recesses and projections on the front surface of the substrate, a support table which supports the substrate, a liquid resin supplying unit which supplies a curable liquid resin, a pressing unit which covers the liquid resin supplied to the resin film with a cover film and presses the cover film by a pressing surface to spread the liquid resin over the resin film, and a curing unit which cures the liquid resin being spread. The support table includes an annular bank region having a height not exceeding a thickness of the substrate and housing the substrate therein, and the bank region prevents the liquid resin to be spread by the pressing unit from flowing out from the substrate.