A structure includes a first core substrate; an adhesive layer on the first core substrate; a second core substrate on the adhesive layer, wherein the second core substrate includes a first cavity; a first semiconductor device within the first cavity; a first insulating film extending over the second core substrate, over a top surface of the first semiconductor device, and within the first cavity; a through via extending through the first insulating film, the first core substrate, and the second core substrate; a first routing structure on the first core substrate and electrically connected to the through via; and a second routing structure on the first insulating film and electrically connected to the through via and the first semiconductor device.

A high voltage semiconductor package includes a semiconductor device. The semiconductor device includes a high voltage semiconductor transistor chip having a front side and a backside. A low voltage load electrode and a control electrode are disposed on the front side of the semiconductor transistor chip. A high voltage load electrode is disposed on the backside of the semiconductor transistor chip. The semiconductor package further includes a dielectric inorganic substrate. The dielectric inorganic substrate includes a pattern of first metal structures running through the dielectric inorganic substrate and connected to the low voltage load electrode, and at least one second metal structure running through the dielectric inorganic substrate and connected to the control electrode. The front side of the semiconductor transistor chip is attached to the dielectric inorganic substrate by a wafer bond connection, and the dielectric inorganic substrate has a thickness of at least 50 m.

A semiconductor device includes: an insulated circuit substrate including a base plate, a resin layer on the base plate, and a circuit pattern on the resin layer; a semiconductor chip that is rectangular and is bonded to the circuit pattern such that a side edge of the semiconductor chip is spaced inwardly from an outer peripheral edge of the circuit pattern by a predetermined distance; a case on the resin layer and surrounds the circuit pattern and the semiconductor chip; and a sealing material that covers the insulated circuit substrate and semiconductor chip and is surrounded by the case. The predetermined distance and thickness of the circuit pattern are greater than or equal to 0.1 of a length of one side of the semiconductor chip. A peripheral region of the case and a peripheral region of the resin layer are connected to each other via an adhesive layer.

A power module includes a first end power semiconductor element and a second end power semiconductor element. A first sum is a sum of a path length between the gate electrode of the first end power semiconductor element and a first control terminal and a path length between the source electrode of the first end power semiconductor element and a first detection terminal. A second sum is a sum of a path length between the gate electrode of the second end power semiconductor element and the first control terminal and a path length between the source electrode of the second end power semiconductor element and the first detection terminal. The power module includes a first control layer connected to the gate electrode. The first control layer includes a first detour portion that detours the path to reduce a difference between the first sum and the second sum.

A semiconductor device includes channel region, first and second two-dimensional metallic contacts, a gate structure, and first and second metal contacts. The channel region includes a two-dimensional semiconductor material. The first two-dimensional metallic contact is disposed at a side of the channel region and includes a two-dimensional metallic material. The second two-dimensional metallic contact is disposed at an opposite side of the channel region and includes the two-dimensional metallic material. The gate structure is disposed on the channel region in between the first and second two-dimensional metallic contacts. The first metal contact is disposed at an opposite side of the first two-dimensional metallic contact with respect to the channel region. The second metal contact is disposed at an opposite side of the second two-dimensional metallic contact with respect to the channel region. The first and second two-dimensional metallic contacts contact sideways the channel region to form lateral semiconductor-metallic junctions.

In an embodiment, a device includes: a substrate having a first side and a second side opposite the first side; an interconnect structure adjacent the first side of the substrate; and an integrated circuit device attached to the interconnect structure; a through via extending from the first side of the substrate to the second side of the substrate, the through via being electrically connected to the integrated circuit device; an under bump metallurgy (UBM) adjacent the second side of the substrate and contacting the through via; a conductive bump on the UBM, the conductive bump and the UBM being a continuous conductive material, the conductive bump laterally offset from the through via; and an underfill surrounding the UBM and the conductive bump.

In some examples, a sensor package includes a semiconductor die having a sensor; a mold compound covering a portion of the semiconductor die; and a cavity formed in a top surface of the mold compound, the sensor being in the cavity. The sensor package includes an adhesive abutting the top surface of the mold compound, and a semi-permeable film abutting the adhesive and covering the cavity. The semi-permeable film is approximately flush with at least four edges of the top surface of the mold compound.

Technologies for conformal power delivery structures near high-speed signal traces are disclosed. In one embodiment, a dielectric layer may be used to keep a power delivery structure spaced apart from high-speed signal traces, preventing deterioration of signals on the high-speed signal traces due to capacitive coupling to the power delivery structure.

Embodiments of the disclosure relate to a power electronics apparatus. The power electronics apparatus includes at least a first electrically conductive element and a second electrically conductive element. The elements are intended to be at a first electrical potential and at a second electrical potential, respectively. At least a first and second power electronics components are mounted on the first and second elements, respectively, a first portion and a second portion of a sink are mounted on the first conductive element and on the second conductive element, respectively, so as to permit the transfer of heat from each power component to the corresponding portion of the sink through the corresponding conductive element. An electrical insulator is present between each portion of the sink so as to prevent the risk of flashover between the two portions.

A semiconductor device includes a package substrate below a chip, the package substrate including upper build-up layer including a first plurality of power planes (VDD) and ground planes (GND) and a plurality of vias stacked vertically, a core layer, and lower build-up layers including a second plurality of VDD and GND, and a heat spreader layer over the chip. The heat spreader contacts the package substrate on both ends of the package substrate.