A microelectronic device includes a die with input/output (I/O) terminals, and a dielectric layer on the die. The microelectronic device includes electrically conductive pillars which are electrically coupled to the I/O terminals, and extend through the dielectric layer to an exterior of the microelectronic device. Each pillar includes a column electrically coupled to one of the I/O terminals, and a head contacting the column at an opposite end of the column from the I/O terminal. The head extends laterally past the column in at least one lateral direction. Methods of forming the pillars and the dielectric layer are disclosed.

An embodiment is a device including an integrated circuit die having an active side and a back side, the back side being opposite the active side, a molding compound encapsulating the integrated circuit die, and a first redistribution structure overlying the integrated circuit die and the molding compound, the first redistribution structure including a first metallization pattern and a first dielectric layer, the first metallization pattern being electrically coupled to the active side of the integrated circuit die, at least a portion of the first metallization pattern forming an inductor.

Example embodiments are directed to a semiconductor device including a substrate, a substrate pad placed on the substrate, a substrate insulation layer configured to surround at least a portion of the substrate pad, a passivation layer placed on the substrate insulation layer and a bump pad placed on the passivation layer, electrically connected to the substrate pad and including solder bumps. The bump pad includes a connector recessed toward the substrate, and the connector, when viewed in a first direction perpendicular to a surface of the substrate, includes a shape, in order to reduce or lower a defect occurring in solder bumps when a degree of expansion and contraction varies due to differences in the coefficient of thermal expansion (CTE).

A semiconductor structure includes a metal-insulator-metal (MIM) structure sandwiched between first passivation layers over a substrate. The semiconductor structure also includes via structures through the MIM structure and the first passivation layers. The semiconductor structure further includes redistribution layer (RDL) structures over the via structures. In addition, the semiconductor structure includes a second passivation layer between and over the RDL structures. A bottom surface of the second passivation layer is lower than a topmost surface of the passivation layers.

A die includes a substrate, a conductive pad, a connector a protection layer, and a passivation layer. The conductive pad is disposed over the substrate. The connector is disposed on the conductive pad. The connector comprises a seed layer and a conductive post on the seed layer. The protection layer laterally covers the connector. The passivation layer is disposed between the protection layer and the conductive pad. The conductive post is separated from the passivation layer and the protection layer by the seed layer.

A three-dimensional integrated circuit structure including: a first die including a first power delivery network, a first substrate, a first device layer, and a first metal layer; a second die on the first die, the second die including a second power delivery network, a second substrate, a second device layer, and a second metal layer; a first through electrode extending from the first power delivery network to a top surface of the first metal layer; and a first bump on the first through electrode, the second power delivery network including: lower lines to transfer power to the second device layer; and a pad connected to a lowermost one of the lower lines, the first bump is interposed between and connects the first through electrode and the pad, and the first power delivery network is connected to the second power delivery network through the first bump and the first through electrode.

An IC package includes one or more microelectronic devices, a plurality of package bumps disposed at a first side, and a metal structure electrically connecting at least a first device contact pad of a first microelectronic device and at least a first package bump of the plurality of package bumps. The metal structure includes an RDL trace extending between a first region aligned with the first device contact pad and a second region aligned with the first package bump, wherein the first package bump is mechanically and electrically connected directly to the second region of the RDL trace. The metal structure further includes a first via extending between the first region of the RDL trace and the first device contact pad and further includes a set of one or more support studs extending from the second region to a support surface facing the first side.

A wafer-level package includes a first integrated circuit die having pads on its front side and a second integrated circuit die having pads on its front side, with a back side of the second die attached to the front side of the first die by an adhesive layer. A resin layer containing an activatable catalyst material is disposed across the front side of the first die, along edge sides of the second die, and across the front side of the second die. Selected portions of the resin layer are activated by laser radiation and metallized to form a redistribution layer providing electrical interconnection between the dies. A solder resist layer is formed over the resin layer, and solder balls are connected to metallized portions of the redistribution layer. The laser-direct-structuring process enables formation of conductive interconnects extending over die edges without conventional drilling or photo-patterning.

A semiconductor package may include: a device layer including a first semiconductor chip; a second semiconductor chip on the device layer; and a third semiconductor chip on the second semiconductor chip, wherein the device layer further includes: a molding layer surrounding the first semiconductor chip; a redistribution layer on the molding layer; and a conductive post beside the first semiconductor chip, the conductive post vertically penetrating the molding layer and connecting to the redistribution layer, wherein the redistribution layer includes: a first insulating pattern; a power delivery network (PDN) pattern in the first insulating pattern; and a redistribution pad exposed through an upper surface of the first insulating pattern, wherein the second semiconductor chip includes a first chip pad at an inactive surface of the second semiconductor chip, and wherein the PDN pattern is electrically connected to the second semiconductor chip through the redistribution pad and the first chip pad.

A process for manufacturing electroacoustic modules including: forming an assembly with a redistribution structure and a plurality of dice arranged in a dielectric region; forming a wafer with a semiconductor body and a plurality of respective unit portions laterally staggered, each of which includes a respective supporting region, set in contact with the semiconductor body, and a number of actuators; reducing the thickness of the semiconductor body and then selectively removing portions of the semiconductor body so as to singulate, starting from the wafer, a plurality of transduction structures, each including a semiconductor substrate, which contacts a corresponding supporting region and is traversed by cavities delimited by portions of the supporting region that form membranes mechanically coupled to the actuators; and then coupling the transduction structures to the redistribution structure of the assembly.