The present disclosure is directed to conductive structures that may be utilized in a radio-frequency (RF) switch. The embodiments of the conductive structures of the present disclosure are formed to balance the on resistance (R.sub.on) and the off capacitance (C.sub.off) such that the R.sub.on.Math.C.sub.off value is optimized such that the conductive structures are relatively efficient as compared to conventional conductive structures within conventional RF switches. For example, the conductive structures include various metallization layers that are stacked on each other and spaced apart in a selected manner to balance the R.sub.on and the C.sub.off as to optimize the R.sub.on.Math.C.sub.off figure of merit as a lower R.sub.on.Math.C.sub.off is preferred.

Techniques are provided herein for forming backend memory structures with airgaps in an interconnect region above semiconductor devices. The airgaps may be provided between conductive features, such as wordlines, to reduce parasitic capacitance. An interconnect region above a plurality of semiconductor devices includes any number of interconnect layers. A first interconnect layer includes first conductive layers (e.g., wordlines) extending in a first direction with airgaps between adjacent first conductive layers. A second interconnect layer over the first interconnect layer includes at least portions of memory cells over corresponding first conductive layers. A third interconnect layer over the second interconnect layer includes a second conductive layer (e.g., bitline) extending in a second direction over one or more of the at least portions of memory cells. The presence of airgaps between the first conductive layers allows for a tighter pitch between memory cells and reduced total energy consumption among the memory cells.

A semiconductor device structure and method for forming the same are provided. The semiconductor device structure includes a first conductive layer formed over a substrate, and an air gap structure adjacent to the first conductive layer. The semiconductor device structure includes a support layer formed over the air gap structure, and a sidewall surface of the support layer is aligned with a sidewall surface of the air gap structure.

A semiconductor device structure, along with methods of forming such, are described. The semiconductor device structure includes a device, a first dielectric material disposed over the device, and an opening is formed in the first dielectric material. The semiconductor device structure further includes a conductive structure disposed in the opening, and the conductive structure includes a first sidewall. The semiconductor device structure further includes a surrounding structure disposed in the opening, and the surrounding structure surrounds the first sidewall of the conductive structure. The surrounding structure includes a first spacer layer and a second spacer layer adjacent the first spacer layer. The first spacer layer is separated from the second spacer layer by an air gap.

A semiconductor device includes a substrate, a first interlayer insulating layer disposed on the substrate, a first trench formed inside the first interlayer insulating layer, a contact plug disposed inside the first trench, a first wiring pattern disposed on the contact plug, a second wiring pattern which is disposed on the first interlayer insulating layer and spaced apart from the first wiring pattern in a horizontal direction, a second interlayer insulating layer which is disposed on the first interlayer insulating layer and surrounds each of side walls of the first wiring pattern and each of side walls of the second wiring pattern, and a first air gap formed on the contact plug inside the first trench.

A laminated wiring has a first conductor which connects first terminals of one or more capacitors and each positive terminal of a plurality of semiconductor modules, a second conductor which connects second terminals of the one or more capacitors and each negative terminal of the plurality of semiconductor modules, and an insulator. Slits are cut in at least one of the first conductor and the second conductor (in both of them in the example of FIG. 1). By doing so, among the plurality of semiconductor modules, a variation in the total of respective inductance values between respective first terminals and one positive terminal closest to the respective first terminals and respective inductance values between respective negative terminals to one second terminal closest to the respective negative terminals becomes smaller than or equal to 10 nH.

Various embodiments of the present disclosure are directed towards an integrated circuit (IC) in which cavities separate wires of an interconnect structure. For example, a conductive feature overlies a substrate, and an intermetal dielectric (IMD) layer overlies the conductive feature. A first wire and a second wire neighbor in the IMD layer and respectively have a first sidewall and a second sidewall that face each other while being separated from each other by the IMD layer. Further, the first wire overlies and borders the conductive feature. A first cavity and a second cavity further separate the first and second sidewalls from each other. The first cavity separates the first sidewall from the IMD layer, and the second cavity separates the second sidewall from the IMD layer. The cavities reduce parasitic capacitance between the first and second wires and hence resistance-capacitance (RC) delay that degrades IC performance.

A semiconductor structure includes a first dielectric layer, a first metallic feature over the first dielectric layer, an air gap over the first dielectric layer and adjacent to the first metallic feature, a second dielectric layer disposed above the air gap and on a sidewall of the first metallic feature, and a third dielectric layer disposed above the air gap and on a sidewall of the second dielectric layer. A lower portion of the first metallic feature is exposed in the air gap. The third and the second dielectric layers are substantially co-planar.

To provide a superconducting device capable of more accurately arranging a non-contact coupling circuit of a superconducting integrated circuit chip and a non-contact coupling circuit of a circuit board. The chip has a first electrode made of a first superconducting material and a first non-contact coupling circuit on a surface thereof. The board has a second electrode made of a second superconducting material and a second non-contact coupling circuit on a surface thereof, and is arranged to face the chip. The second electrode has a protrusion protruding toward the chip. The protrusion includes a flat upper surface. The first electrode has a flat surface and a first recess. The first recess is arranged to face the upper surface to be located inside the upper surface of the protrusion. A third superconducting material connecting the upper surface and the first recess.

The present application discloses a semiconductor device and a method for fabricating the semiconductor device. The semiconductor device includes a substrate; a bottom interconnector layer positioned in the substrate; a bottom dielectric layer positioned on the bottom glue layer; an interconnector structure positioned along the bottom dielectric layer and the bottom glue layer, positioned on the bottom interconnector layer, and positioned on the bottom dielectric layer; a top glue layer conformally positioned on the bottom dielectric layer and the interconnector structure; a top dielectric layer positioned surrounding the top glue layer. A top surface of the top glue layer and a top surface of the top dielectric layer are substantially coplanar. The top dielectric layer is porous.