A memory device includes a memory die bonded to a logic die. A logic die that is bonded to a memory die via a wafer-on-wafer bonding process can receive signals indicative of input data from a global data bus of the memory die and through a bond of the logic die and memory die. The logic die can also receive signals indicative of kernel data from local input/output (LIO) lines of the memory die and through the bond. The logic die can perform a plurality of operations at a plurality of vector-vector (VV) units utilizing the signals indicative of input data and the signals indicative of kernel data.

A method for fabricating semiconductor device includes the steps of first providing a first substrate having a high-voltage (HV) region and a medium voltage (MV) region and a second substrate having a low-voltage (LV) region and a static random access memory (SRAM) region, in which the HV region includes a HV device, the MV region includes a MV device, the LV region includes a fin field-effect transistor (FinFET), and the SRAM region includes a SRAM device. Next, a bonding process is conducted by using hybrid bonding, through-silicon interposer (TSI) or redistribution layer (RDL) for bonding the first substrate and the second substrate.

A semiconductor package includes: a semiconductor chip; a package substrate below the semiconductor chip in a vertical direction; and a plurality of connection pads on a lower surface of the package substrate, wherein the plurality of connection pads include: a first group of connection pads having a first width, and a second group of connection pads having a second width smaller than the first width, and wherein the first group of connection pads are provided closer to an edge boundary of a contact surface between the semiconductor chip and the package substrate than the second group of connection pads.

A semiconductor structure includes a plurality of first wafers and a through-substrate via (TSV). The plurality of first wafers include a plurality of conductive connection lines. Each of the conductive connection lines is located in the corresponding first wafer. The through-substrate via passes through the plurality of first wafers and a plurality of end portions of the plurality of conductive connection lines. The plurality of end portions are embedded in the through-substrate via.

System-in-packages (SiPs) having vertically integrated processing units and combined high-bandwidth memory (HBM) devices, and associated devices and methods, are disclosed herein. In some embodiments, the SiP includes a processing unit and a HBM device carried by the processing unit. Further, the combined HBM device can include one or more volatile memory dies and one or more non-volatile memory dies. The SiP can also include a shared through silicon via (TSV) bus that electrically couples combined HBM device can also include a shared bus that is electrically coupled to each of the processing unit, the one or more volatile memory dies, and the one or more non-volatile memory dies to establish communication paths therebetween.

Methods of making a semiconductor device assembly are provided. The methods can comprise providing a first semiconductor device having a first dielectric material at a first surface, providing a carrier wafer having a second dielectric material at a second surface, and forming a dielectric-dielectric bond between the first dielectric material and the second dielectric material. At least one of the first surface and the second surface includes a region of hydrophobic material electrically isolated from any circuitry of the first semiconductor device and configured to have a reduced bonding strength to a facing region relative to the dielectric-dielectric bond. The method can further include stacking one or more second semiconductor devices over the first semiconductor device to form the semiconductor device assembly, and removing the semiconductor device assembly from the carrier wafer.

Provided is a semiconductor package including a plurality of first semiconductor chips respectively including a first semiconductor substrate and a plurality of first through electrodes penetrating the first semiconductor substrate, a second semiconductor chip on the plurality of first semiconductor chips, the second semiconductor chip including a second semiconductor substrate and a plurality of second through electrodes penetrating the second semiconductor substrate, a third semiconductor chip on the second semiconductor chip, the third semiconductor chip including a third semiconductor substrate and a plurality of third through electrodes penetrating the third semiconductor substrate, and a first encapsulation material on the plurality of first semiconductor chips, a planar shape of the second semiconductor chip is greater than a planar shape of each first semiconductor chip of the plurality of first semiconductor chips, and a planar shape of the third semiconductor chip is greater than the planar shape of the second semiconductor chip.

A semiconductor package includes a package substrate, a processor chip mounted on a first region of the package substrate, a plurality of memory chips mounted on a second region of the package substrate being spaced apart from the first region of the package substrate, a signal transmission device mounted on a third region of the package substrate between the first and second regions of the package substrate, and a plurality of first bonding wires connecting the plurality of memory chips to the signal transmission device. The signal transmission device includes upper pads connected to the plurality of first bonding wires, penetrating electrodes arranged in a main body portion of the signal transmission device and connected to the upper pads, and lower pads in a lower surface portion of the signal transmission device and connected to the penetrating electrodes and connected to the package substrate via bonding balls.

Representative techniques and devices including process steps may be employed to mitigate the potential for delamination of bonded microelectronic substrates due to metal expansion at a bonding interface. For example, a metal pad having a larger diameter or surface area (e.g., oversized for the application) may be used when a contact pad is positioned over a TSV in one or both substrates.

Various embodiments of fanout packages are disclosed. A method of forming a microelectronic assembly is disclosed. The method can include bonding a first surface of at least one microelectronic substrate to a surface of a carrier using a direct bonding technique without an intervening adhesive, the microelectronic substrate having a plurality of conductive interconnections on at least one surface of the microelectronic substrate. The method can include applying a molding material to an area of the surface of the carrier surrounding the microelectronic substrate to form a reconstituted substrate. The method can include processing the microelectronic substrate. The method can include singulating the reconstituted substrate at the area of the surface of the carrier and at the molding material to form the microelectronic assembly.