An electronic device comprises an electronic package with a glass core. The glass core includes a first surface and a second surface opposite the first surface, at least one through-glass via (TGV) extending through the glass core from the first surface to the second surface and including an electrically conductive material, and wherein the at least one TGV includes a first portion having a first sidewall and a second portion that includes a second sidewall, wherein the first sidewall includes seed metallization and the second sidewall excludes the seed metallization.

A circuit board according to an embodiment includes an insulating layer; a circuit pattern disposed on the insulating layer, and a first protective layer disposed on the insulating layer, wherein the first protective layer includes a first opening vertically overlapping at least a part of an upper surface of the circuit pattern; wherein an inner wall of the first protective layer constituting the first opening includes: a first portion having a first inclination, and a second portion disposed on the first portion and having a second inclination different from the first inclination, and wherein the first portion overlaps the circuit pattern in a horizontal direction.

An embodiment is a device including an integrated circuit die having an active side and a back side, the back side being opposite the active side, a molding compound encapsulating the integrated circuit die, and a first redistribution structure overlying the integrated circuit die and the molding compound, the first redistribution structure including a first metallization pattern and a first dielectric layer, the first metallization pattern being electrically coupled to the active side of the integrated circuit die, at least a portion of the first metallization pattern forming an inductor.

Embodiments disclosed herein include electronic packages In an embodiment, the electronic package comprises first substrate layers, and a core under the first substrate layers. In an embodiment, second substrate layers are under the core, and an interconnect is through the first substrate layers, the core, and the second substrate layers. In an embodiment, a portion of the interconnect through the second substrate layers comprises a pad, and a plurality of vias extending away from the pad.

Provided is a package structure and a method of forming the same. The package structure includes a semiconductor package, a stacked patch antenna structure, and a plurality of conductive connectors. The semiconductor package includes a die. The stacked patch antenna structure is disposed on the semiconductor package, and separated from the semiconductor package by an air cavity. The plurality of conductive connectors is disposed in the air cavity between the semiconductor package and the stacked patch antenna structure to connect the semiconductor package and the stacked patch antenna structure.

A semiconductor package includes a first rewiring layer; a lower semiconductor chip on the first rewiring layer; an upper semiconductor chip on the lower semiconductor chip; a heat dissipation structure on the upper semiconductor chip; a molding layer on the first rewiring layer so as to contact side surfaces of the lower semiconductor chip, the upper semiconductor chip, and the heat dissipation structure; a second rewiring layer on the heat dissipation structure; and one or more connection structures on the first rewiring layer and positioned adjacent to the side surfaces of the lower semiconductor chip and the upper semiconductor chip and configured to extend through the molding layer and connect the first rewiring layer to the second rewiring layer, wherein the upper semiconductor chip and the heat dissipation structure contact each other.

An optoelectronic device includes: (a) a substrate having (i) a surface, and (ii) a recess formed in the substrate that extends from the surface into the substrate, (b) an integrated circuit (IC) chip facing the surface of the substrate, (c) an optical connector mounted on the substrate, and (d) an optical chiplet embedded within the recess of the substrate. The optical chiplet being configured to exchange (i) optical signals with the optical connector, and (ii) electrical signals with the integrated circuit (IC) chip, and to convert between the optical signals and the electrical signals.

A package structure includes at least one integrated circuit component, an insulating encapsulation, and a redistribution structure. The at least one integrated circuit component includes a semiconductor substrate, an interconnection structure disposed on the semiconductor substrate, and signal terminals and power terminals located on and electrically connecting to the interconnection structure. The interconnection structure is located between the semiconductor substrate and the signal terminals and between the semiconductor substrate and the power terminals, and where a size of the signal terminals is less than a size of the power terminals. The insulating encapsulation encapsulates the at least one integrated circuit component. The redistribution structure is located on the insulating encapsulation and electrically connected to the at least one integrated circuit component.

A microelectronic assembly is provided, comprising: a first integrated circuit (IC) die having a first connection to a first serializer/deserializer (SERDES) circuit and a second connection to a second SERDES circuit; a second IC die having the first SERDES circuit; and a third IC die having the second SERDES circuit, in which the first IC die is in a first layer, the second IC die and the third IC die are in a second layer not coplanar with the first layer, the first layer and the second layer are coupled by interconnects having a pitch of less than 10 micrometers between adjacent ones of the interconnects, and the first SERDES circuit and the second SERDES circuit are coupled by a conductive pathway.

A method of forming a semiconductor structure is provided, and includes trimming a first substrate to form a recess on a sidewall of the first substrate. A conductive structure is formed in the first substrate. The method includes bonding the first substrate to a carrier. The method includes thinning down the first substrate. The method also includes forming a dielectric material in the recess and over a top surface of the thinned first substrate. The method further includes performing a planarization process to remove the dielectric material and expose the conductive structure over the top surface. In addition, the method includes removing the carrier from the first substrate.