A bonded structure can include a first reconstituted element comprising a first element and having a first side comprising a first bonding surface and a second side opposite the first side. The first reconstituted element can comprise a first protective material disposed about a first sidewall surface of the first element. The bonded structure can comprise a second reconstituted element comprising a second element and having a first side comprising a second bonding surface and a second side opposite the first side. The first reconstituted element can comprise a second protective material disposed about a second sidewall surface of the second element. The second bonding surface of the first side of the second reconstituted element can be directly bonded to the first bonding surface of the first side of the first reconstituted element without an intervening adhesive along a bonding interface.

An image sensor includes a stack structure including an active pixel region of pixels, and a pad region. The stack structure further includes a first substrate including a photoelectric conversion region and a floating diffusion region, a first semiconductor substrate, a first front structure arranged on a first surface of the first semiconductor substrate, a second substrate attached to the first front structure and including pixel gates, a second semiconductor substrate, and a second front structure, a third substrate attached to the second substrate and including a logic transistor for driving the pixels, and a pad arranged in the pad region. A side surface and a bottom surface of the pad are surrounded by the second front structure, and at least a portion of a top surface of the pad is exposed through a pad opening penetrating the first substrate and extending into the second substrate.

Methods for fabricating flexible interposers for providing electrical connection between devices mounted at different vertical positions with respect to a substrate or a planar interposer. A bonded structure may comprise a bent flexible interposer extending from a first interposer portion between a main device on the substrate or the planar interposer and a second interposer portion above the main device and above or below a device positioned above the main device and electrically connected to the main device via a bent portion of the flexible interposer.

A package construction includes: a die pad, and a suspension lead remaining portion connected to the die pad. Here, an offset portion is provided from a peripheral edge portion of the die pad to the suspension lead remaining portion. Also, the suspension lead remaining portion has: a first end portion connected to the die pad, and a second end portion opposite the first end portion. Further, the second end portion of the suspension lead remaining portion is exposed from the side surface of the sealing body at a position spaced apart from each of the upper surface and the lower surface.

A microelectronic structure with through substrate vias (TSVs) and method for forming the same is disclosed. The microelectronic structure can include a bulk semiconductor with a via structure. The via structure can have a first and second conductive portion. The via structure can also have a barrier layer between the first conductive portion and the bulk semiconductor. The structure can have a second barrier layer between the first and second conductive portions. The second conductive portion can extend from the second barrier layer to the upper surface of the bulk semiconductor. The microelectronic structure containing TSVs is configured so that the microelectronic structure can be bonded to a second element or structure.

A device package includes a first die directly bonded to a second die at an interface, wherein the interface comprises a conductor-to-conductor bond. The device package further includes an encapsulant surrounding the first die and the second die and a plurality of through vias extending through the encapsulant. The plurality of through vias are disposed adjacent the first die and the second die. The device package further includes a plurality of thermal vias extending through the encapsulant and a redistribution structure electrically connected to the first die, the second die, and the plurality of through vias. The plurality of thermal vias is disposed on a surface of the second die and adjacent the first die.

The technology relates to a system on chip (SoC). The SoC may include a plurality of network layers which may assist electrical communications either horizontally or vertically among components from different device layers. In one embodiment, a system on chip (SoC) includes a plurality of network layers, each network layer including one or more routers, and more than one device layers, each of the plurality of network layers respectively bonded to one of the device layers. In another embodiment, a method for forming a system on chip (SoC) includes forming a plurality of network layers in an interconnect, wherein each network layer is bonded to an active surface of a respective device layer in a plurality of device layer.

A microelectronic structure with through substrate vias (TSVs) and method for forming the same is disclosed. The microelectronic structure can include a bulk semiconductor with a via structure. The via structure can have a first and second conductive portion. The via structure can also have a barrier layer between the first conductive portion and the bulk semiconductor. The structure can have a second barrier layer between the first and second conductive portions. The second conductive portion can extend from the second barrier layer to the upper surface of the bulk semiconductor. The microelectronic structure containing TSVs is configured so that the microelectronic structure can be bonded to a second element or structure.

Disclosed is an integrated circuit device. In some aspects, a device includes a first wafer including a first dielectric layer, a first set of bonding pads disposed in the first dielectric layer and a first circuit disposed on the first dielectric layer, and a second wafer including a second dielectric layer, a second set of bonding pads disposed in the second dielectric layer and a second circuit disposed on the second dielectric layer. The device further includes through-vias including at least one power via in the second wafer, and a backside power distribution network (BSPDN) layer disposed on the second wafer. The first set of bonding pads is bonded with the second set of bonding pads.

An image sensor device includes capacitor structures in multiple semiconductor dies of the image sensor device. The capacitor structures may be located on a frontside of the sensor die, on a frontside of an application specific integrated circuit (ASIC) die directly bonded to the sensor die, and on a backside of the ASIC die, among other examples. Including capacitor structures on the frontside and on the backside of the ASIC die enables more efficient use of the die area of the ASIC die for integration of the capacitor structures, which may enable the density of capacitor structures in the image sensor device to be increased without sacrificing area on the sensor die for the photodiodes of the pixel sensors.