Described herein are manufacturing techniques and packages that enable wafer-scale heterogenous integration of electronic integrated circuits (EIC) with photonic integrated circuits (PIC) using a reconstitution-based fabrication approach. Wafer-scale photonic devices are formed by assembling strips of known-good dies (KGD). Such strips include arrays of adjacent reticles that have been singulated from a wafer. A strip can include a single row (or column) of reticles singulated from a wafer or multiple rows (or columns) that are adjacent to one another, enabling two-dimensional assembly and increased coverage. Wafer reconstitution involves transferring and bonding one or more strips of KGDs to a target substrate. A KGD is a reticle that is not part of an exclusion zone and has been verified to work properly. Thus, a reconstituted wafer includes strips that have verified to be fully functional.

A semiconductor package according to an embodiment includes a substrate; a protective layer disposed on the substrate; a first adhesive member disposed on the protective layer and having an open loop shape along a circumferential direction of an upper surface of the protective layer; and a cover member disposed on the first adhesive member, wherein a lower surface of the cover member includes: a first lower surface that contacts the first adhesive member, and a second lower surface that does not contact the first adhesive member, and the protective layer includes a first opening that vertically overlaps the second lower surface of the cover member and does not vertically overlap the first adhesive member.

A semiconductor package including a package substrate defining a cavity therein; a first semiconductor chip on the package substrate; a first bump between the package substrate and the first semiconductor chip, the first bump electrically connecting the package substrate and the first semiconductor chip; a second semiconductor chip on the package substrate, the second semiconductor chip being at least partially in the cavity; a first bonding wire electrically connecting the package substrate and the second semiconductor chip; and an underfill layer covering the first bump and at least a portion of the first bonding wire.

An IC structure includes a memory stack including semiconductor dies horizontally separate with each other, wherein each semiconductor die has a top surface, a bottom surface, four sidewalls, and a plurality of edge pads arranged along a sidewall. The IC structure further includes a memory controller under the first memory stack and electrically connected to the edge pads of each semiconductor die, a processor circuit disposed over and electrically connected to the memory controller, and a packaging substrate under and electrically connected to the memory controller. A die area of the memory controller is larger than the sum of a horizontal cross-section area of the memory stack and a die area of the processor circuit. There is no interposer between the packaging substrate and the memory controller, and there is no TSV in each semiconductor die.

An embodiment semiconductor device may include a semiconductor die; one or more redistribution layers formed on a surface of the semiconductor die and electrically coupled to the semiconductor die; and an active or passive electrical device electrically coupled to the one or more redistribution layers. The active or passive electrical device may include a silicon substrate and a through-silicon-via formed in the silicon substrate. The active or passive electrical device may be configured as an integrated passive device including a deep trench capacitor or as a local silicon interconnect. The semiconductor device may further include a molding material matrix formed on a surface of the one or more redistribution layers such that the molding material matrix partially or completely surrounds the active or passive electrical device.

Performance of a semiconductor device is enhanced. A loss of a circuit device using a semiconductor device as a switch is reduced. A semiconductor device includes: a first semiconductor chip having a first MOSFET of p-type and a first parasitic diode; and a second semiconductor chip having a second MOSFET of n-type and a second parasitic diode. On front surfaces of the first and second semiconductor chips, a first source electrode and a first gate wiring and a second source electrode and a second gate wiring are formed, respectively. On back surfaces of the first and second semiconductor chips, first and second drain electrodes are formed, respectively. The second back surface and the first front surface face each other such that the second drain electrode and the first source electrode come into contact with each other via a conductive paste.

A display device includes an active panel including a display area including a plurality of pixels and a non-display area surrounding the display area, the non-display area including an adjacent area adjacent to the display area and bending areas spaced from the display area by the adjacent area, the bending areas including a connection electrode and a first driving panel in contact with a first bending area of the active panel by a first connection member, and electrically coupled to the active panel. Each of the bending areas is bent in a direction perpendicular to a plane formed by the display area, and the active panel includes an opening in the first bending area exposing the connection electrode, and the first connection member is configured to couple a first signal from the first driving panel to the active panel through the connection electrode.

An electronic device is provided. The electronic device includes an electronic device includes an electronic component, and an interposer. The interposer is coupled to the electronic component, which includes first signal transmission vias, power transmission structures, and a circuit within the interposer. The circuit includes an active component, a passive component, or both.

Methods, systems, and devices for die side interconnect are described. A semiconductor assembly may include a stack of first dies (e.g., memory dies) coupled with a second die (e.g., a logic die) using a sideways architecture. For example, the semiconductor assembly may include multiple first dies, where a top surface of one the first dies is coupled with a bottom surface of another of the first dies to form the stack. The first dies each have a side surface coupled with an upper surface of the second die. The first dies each include a conductive via extending from the top surface of the respective first die at least partially towards the bottom surface of the respective first die. The first dies each include a redistribution layer coupled with the conductive via and extending parallel with the top surface of the respective first die.

Microelectronic assemblies with a die stack positioned such that a face of each die in the stack is orthogonal to a face of a base are disclosed. Each die has a first face and a second face opposite the first face. The die stack includes multiple dies, with the faces of each die parallel to the faces of the other dies in the die stack. The die stack is positioned on the base such that the faces of each die are substantially orthogonal to the face of the base. Each die in the die stack can have a corresponding conductive contact, and the conductive contact on each die in the die stack can be coupled to a conductive contact on the base via an interconnect. The interconnect can be a solder joint, such as a solder bump or solder ball.