An electronic device package includes a circuit layer, a first semiconductor die, a second semiconductor die, a plurality of first conductive structures and a second conductive structure. The first semiconductor die is disposed on the circuit layer. The second semiconductor die is disposed on the first semiconductor die, and has an active surface toward the circuit layer. The first conductive structures are disposed between a first region of the second semiconductor die and the first semiconductor die, and electrically connecting the first semiconductor die to the second semiconductor die. The second conductive structure is disposed between a second region of the second semiconductor die and the circuit layer, and electrically connecting the circuit layer to the second semiconductor die.

A display panel includes a circuit substrate, pixel structures and a molding layer. The circuit substrate has first pad structures and second pad structures. The pixel structures are disposed above a display region of the circuit substrate. Each of at least a portion of the pixel structures includes a first light emitting diode, a first conductive block, and a first conductive connection structure. The first light emitting diode is disposed on a corresponding first pad structure. The first conductive block is disposed on a corresponding second pad structure. The first conductive connection structure electrically connects the first light emitting diode to the first conductive block. The molding layer is located above the circuit substrate and surrounds the first light emitting diode and the first conductive block. The first conductive connection structure is located on the molding layer.

A light-emitting element includes a core comprising a first semiconductor layer, a second semiconductor layer disposed on the first semiconductor layer, and an emissive layer disposed between the first semiconductor layer and the second semiconductor layer, an interlayer dielectric film surrounding a side surface of the core, a first element insulating film surrounding an outer surface of the interlayer dielectric film, and a second element insulating film surrounding an outer surface of the first element insulating film. The interlayer dielectric film includes an oxide insulating material having a dielectric constant of about 10 or more, and the interlayer dielectric film has a thickness of less than or equal to about 5 nm.

A display panel manufacturing apparatus and a display panel manufacturing method are provided. A display panel manufacturing apparatus manufactures a display panel which is on a lower stage and includes light emitting elements. The display panel manufacturing apparatus includes: a power supply for supplying an alignment voltage for aligning the light emitting elements on the display panel; and an upper stage including a probe unit to provide the alignment voltage to the display panel and magnetic sensors to sense an alignment state of the light emitting elements.

A stacked semiconductor device includes first chips and a second chip. The first chips are arranged in an array, and includes first and second type through vias, an internal wire layer, a redistribution line and conductive pins. The internal wire layer is disposed on and electrically connected to the first and second type through vias. The redistribution line is disposed on and electrically connected to the second type through vias and the internal wire layer, wherein the redistribution line extends from a top surface of the second type through vias to a position non-overlapped with the second type through vias. The conductive pins are disposed on and electrically connected to the redistribution line. The second chip is stacked on the first chips, wherein the second chip includes connection pins, and the second chip is connected to the first chips by bonding the connection pins to the conductive pins.

Techniques for signal routing between a host and dynamic random-access memory (DRAM) are provided. In an example, a routing layer for a dynamic random-access memory die (DRAM can include multiple through silicon via (TSV) terminations configured to electrically couple with TSVs of the DRAM, an intermediate interface area, and multiple routing traces. the multiple TSV terminations can be arranged in multiple TSV areas. The multiple TSV areas can be arranged in two columns. The intermediate interface area can include multiple micro-pillar bump terminations configured to couple, via a micro-pillar bump, with corresponding micro-pillar bump terminations of a semiconductor interposer. The multiple routing traces can couple control TSV terminations of the multiple TSV areas with a corresponding micro-pillar bump termination of the intermediate interface.

A structure includes a substrate having a frontside and a backside. A first electrode is in a first insulator layer and is adjacent to the frontside of the substrate. The first electrode is part of a redistribution layer (RDL). A second electrode is between the substrate and the first electrode. A dielectric-filled trench in the substrate is under the first electrode and the second electrode, the dielectric-filled trench may extend fully to the backside of the substrate. The structure provides a galvanic isolation that exhibits less parasitic capacitance to the substrate from the lower electrode.

A display device includes a first conductive layer including a first voltage line and a second voltage line, a buffer layer, a semiconductor layer including a first active layer and a second active layer, a first gate insulating layer, a second conductive layer including a first gate electrode overlapping the first active layer and a second gate electrode overlapping the second active layer, a passivation layer, a via layer, a bank pattern layer including a first bank pattern and a second bank pattern partially spaced apart from each other, a third conductive layer including a first electrode and a second electrode spaced apart from each other, and light emitting elements. The passivation layer includes silicon nitride (SiN.sub.x), and a ratio of a number of silicon-hydrogen bonds (SiH) to a number of nitrogen-hydrogen bonds (NH) in the silicon nitride (SiN.sub.x) is in a range of about 1:0.6 to about 1:1.5.

A display device includes a substrate, a plurality of light-emitting elements and a plurality of transistors provided to the substrate, a first organic insulating film that is provided covering the transistors and is in direct contact with at least one of a source electrode and a drain electrode of the transistors, an anode electrode provided on the first organic insulating film and electrically coupled to each of the light-emitting elements, a cavity formed in the first organic insulating film and recessed toward the substrate, and a reflective layer provided covering a side and a bottom of the cavity formed in the first organic insulating film.

A display device includes: a substrate; a plurality of pixel columns on the substrate, each of the plurality of pixel columns including a plurality of pixel groups each including a first pixel and a second pixel arranged along a first direction; and a bank enclosing a perimeter of each of the plurality of pixel groups, the bank including a first opening corresponding to each of the plurality of pixel groups, and a second opening located between two pixel groups adjacent to each other in the first direction among the plurality of pixel groups.