A method of making a semiconductor device may include providing a large semiconductor die comprising conductive interconnects with a first encapsulant disposed over four side surfaces of the large semiconductor die, over the active surface of the large semiconductor die, and around the conductive interconnects. A first build-up interconnect structure may be formed over the large semiconductor die and over the first encapsulant. Vertical conductive interconnects may be formed over the first build-up interconnect structure and around an embedded device mount site. An embedded device comprising through silicon vias (TSVs) may be disposed over the embedded device mount site. A second encapsulant may be disposed over the build-up structure, and around at least five sides of the embedded device. A second build-up structure may be formed disposed over the planar surface and configured to be electrically coupled to the TSVs of the embedded device and the vertical conductive interconnects.

The present disclosure relates to methods and apparatus for forming a thin-form-factor semiconductor device package. In certain embodiments, a glass or silicon substrate is patterned by laser ablation to form structures for subsequent formation of interconnections therethrough. The substrate is thereafter utilized as a frame for forming a semiconductor device package, which may have one or more embedded double-sided dies therein. In certain embodiments, an insulating layer is formed over the substrate by laminating a pre-structured insulating film thereon. The insulating film may be pre-structured by laser ablation to form structures therein, followed by selective curing of sidewalls of the formed structures.

Consistent with aspects of the present disclosure, fabrication processes are provided for manufacturing 3-D stacked dies in a staggered pattern. Such processes yield device structures having adequate flatness and provide sufficient alignment for effective hybrid bonding in staggered 3-D die stacked package.

In one example, a semiconductor device comprises a first substrate comprising a first conductive structure, a first body over the first conductive structure and comprising an inner sidewall defining a cavity in the first body, a first interface dielectric over the first body, and a first internal interconnect in the first body and the first interface dielectric, and coupled with the first conductive structure. The semiconductor device further comprises a second substrate over the first substrate and comprising a second interface dielectric, a second body over the second interface dielectric, and a second conductive structure over the second body and comprising a second internal interconnect in the second body and the second interface dielectric. An electronic component is in the cavity, and the second internal interconnect is coupled with the first internal interconnect. Other examples and related methods are also disclosed herein.

A semiconductor package includes a lower interconnect structure. The lower interconnect structure includes a lower insulating layer and lower interconnect patterns. A first encapsulation layer is disposed on the lower interconnect structure. A pillar electrode penetrating the first encapsulation layer and connected to the lower interconnect patterns is provided. An upper interconnect structure disposed within the first encapsulation layer and having an upper insulating layer and upper interconnect patterns is provided. A distance between an upper surface of the lower interconnect structure and an uppermost end of the first encapsulation layer is larger than a distance between the upper surface of the lower interconnect structure and an uppermost end of the upper interconnect structure. A second encapsulation layer is disposed on the first encapsulation layer. A semiconductor chip disposed within the second encapsulation layer and connected to the pillar electrode and upper interconnect patterns is provided.

A semiconductor package includes a connector connected to a semiconductor chip; a first redistribution layer including a first redistribution pattern; a second redistribution layer including a second redistribution pattern; and an under-bump metallization (UBM) pad disposed on the second redistribution layer; the second redistribution pattern including a redistribution pad aligned with the UBM pad and a side surface extending beyond a side surface of the UBM pad in a first direction; the first redistribution pattern including first redistribution lines comprising a first line aligned with a first edge of the redistribution pad and a second line aligned with a second edge of the redistribution pad; a first side surface of the first line extending farther in the first direction than the first edge of the redistribution pad, and a first side surface of the second line extending farther in the first direction than the second edge of the redistribution pad.

A semiconductor device has a substrate formed on a first carrier. A semiconductor die is mounted on the substrate. An interconnect structure is formed on a second carrier. A copper pillar is formed on the substrate or interconnect structure. The interconnect structure is disposed over the substrate with the copper pillar and semiconductor die between the substrate and interconnect structure. The first carrier and second carrier are removed after disposing the interconnect structure over the substrate. A system-in-package (SiP) is mounted to the substrate opposite the semiconductor die after removing the first carrier.

A semiconductor package includes a first redistribution substrate comprising a plurality of upper substrate pads including a first upper substrate pad;, a first semiconductor device mounted on the first redistribution substrate and connected to the first redistribution substrate through bonding of the first upper substrate pad to a first connection terminal, a plurality of conductive through posts disposed on the first redistribution substrate outside of the first semiconductor device from a plan view, and a second redistribution substrate disposed on the first semiconductor device and the plurality of conductive through posts. The first upper substrate pad has a convex upper surface and has a coupling roughness formed on an upper surface thereof.

A package structure and a manufacturing method thereof are disclosed. The structure includes at least one semiconductor die, a redistribution layer disposed on the at least one semiconductor die, and connectors there-between. The connectors are disposed between the at least one semiconductor die and the redistribution layer, and electrically connect the at least one semiconductor die and the redistribution layer. The redistribution layer includes a dielectric layer with an opening and a metallic pattern layer disposed on the dielectric layer, and the metallic pattern layer includes a metallic via located inside the opening with a dielectric spacer surrounding the metallic via and located between the metallic via and the opening.

A method of forming a semiconductor device includes the following steps. A die and a first through via aside the die are formed. An encapsulant is formed to encapsulate the die and the first through via, wherein the encapsulant is physically connected to a sidewall of the first through via and a sidewall of the die. A warpage controlling layer is formed over the encapsulant and the die. A first conductive connector is formed on the first through via to electrically connect to the first through via.