C01G41/02

ELECTROMAGNETIC WAVE ABSORBING PARTICLE DISPERSOID AND ELECTROMAGNETIC WAVE ABSORBING LAMINATED TRANSPARENT BASE MATERIAL

An electromagnetic wave absorbing laminated transparent base material includes a plurality of sheets of transparent base materials; and an electromagnetic wave absorbing particle dispersoid including at least electromagnetic wave absorbing particles and a thermoplastic resin. The electromagnetic wave absorbing particles contain hexagonal tungsten bronze having oxygen deficiency. The tungsten bronze is expressed by a general formula: M.sub.xWO.sub.3−y (where one or more elements M include at least one or more species selected from among K, Rb, and Cs, 0.15≤x≤0.33, and 0<y≤0.46). Oxygen vacancy concentration N.sub.V in the electromagnetic wave absorbing particles is greater than or equal to 4.3×10.sup.14 cm.sup.−3 and less than or equal to 8.0×10.sup.21 cm.sup.−3. The electromagnetic wave absorbing particle dispersoid is arranged between the plurality of sheets of the transparent base materials.

TUNGSTEN OXIDE SPUTTERING TARGET

A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.38 or less, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.55 or more, and an area ratio of W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.

TUNGSTEN OXIDE SPUTTERING TARGET

A W.sub.18O.sub.49 peak is confirmed by X-ray diffraction analysis of a sputtering surface and a cross section orthogonal to the sputtering surface, a ratio I.sub.S(103)/I.sub.S(010) of a diffraction intensity I.sub.S(103) of a (103) plane to a diffraction intensity I.sub.S(010) of a (010) plane of W.sub.18O.sub.49 of the sputtering surface is 0.38 or less, a ratio I.sub.C(103)/I.sub.C(010) of a diffraction intensity I.sub.C(103) of the (103) plane to a diffraction intensity I.sub.C(010) of the (010) plane of W.sub.18O.sub.49 of the cross section is 0.55 or more, and an area ratio of W.sub.18O.sub.49 phase of a surface parallel to the sputtering surface is 37% or more.

Surface-treated infrared absorbing fine particles, surface-treated infrared absorbing fine powder, infrared absorbing fine particle dispersion liquid using the surface-treated infrared absorbing fine particles, infrared absorbing fine particle dispersion body and method for producing them

Surface-treated infrared-absorbing fine particles with excellent moisture and heat resistance and excellent infrared-absorbing properties, surface-treated infrared absorbing fine particle powder containing the surface-treated infrared absorbing fine particles, an infrared absorbing fine particle dispersion liquid and an infrared absorbing fine particle dispersion body using the surface-treated infrared absorbing fine particles, and a method for producing them, wherein a surface of infrared absorbing particles is coated with a coating layer containing at least one selected from hydrolysis product of a metal chelate compound, polymer of hydrolysis product of a metal chelate compound, hydrolysis product of a metal cyclic oligomer compound, and polymer of hydrolysis product of a metal cyclic oligomer compound.

INFRARED ABSORBING MATERIAL FINE PARTICLE DISPERSION LIQUID AND PRODUCING METHOD THEREOF

An infrared absorbing material fine particle dispersion liquid including infrared absorbing material fine particles and a solvent, the infrared absorbing material fine particles containing fine particles of composite tungsten oxide represented by a general formula MxWOy, the solvent containing water, wherein an absolute value of a zeta potential of the infrared absorbing material fine particle dispersion liquid is 5 mV or more and 100 mV or less.

INFRARED ABSORBING MATERIAL FINE PARTICLE DISPERSION LIQUID AND PRODUCING METHOD THEREOF

An infrared absorbing material fine particle dispersion liquid including infrared absorbing material fine particles and a solvent, the infrared absorbing material fine particles containing fine particles of composite tungsten oxide represented by a general formula MxWOy, the solvent containing water, wherein an absolute value of a zeta potential of the infrared absorbing material fine particle dispersion liquid is 5 mV or more and 100 mV or less.

Electromagnetic-wave-absorbing particles, electromagnetic-wave-absorbing particle dispersion liquids, and manufacturing methods of electromagnetic-wave-absorbing particles

Electromagnetic wave absorbing particles are provided that include hexagonal tungsten bronze having oxygen deficiency, wherein the tungsten bronze is expressed by a general formula: M.sub.xWO.sub.3-y(where one or more elements M include at least one or more species selected from among K, Rb, and Cs, 0.15≤x≤0.33, and 0<y≤0.46), and wherein oxygen vacancy concentration N.sub.v in the electromagnetic wave absorbing particles is greater than or equal to 3×10.sup.14 cm.sup.−3 and less than or equal to 8.0×10.sup.21 cm.sup.−3.

Electromagnetic-wave-absorbing particles, electromagnetic-wave-absorbing particle dispersion liquids, and manufacturing methods of electromagnetic-wave-absorbing particles

Electromagnetic wave absorbing particles are provided that include hexagonal tungsten bronze having oxygen deficiency, wherein the tungsten bronze is expressed by a general formula: M.sub.xWO.sub.3-y(where one or more elements M include at least one or more species selected from among K, Rb, and Cs, 0.15≤x≤0.33, and 0<y≤0.46), and wherein oxygen vacancy concentration N.sub.v in the electromagnetic wave absorbing particles is greater than or equal to 3×10.sup.14 cm.sup.−3 and less than or equal to 8.0×10.sup.21 cm.sup.−3.

METHOD FOR DETECTING AN OKADAIC ACID BASED ON A NEAR-INFRARED PHOTOELECTRIC COMPOSITE MATERIAL

The present application proposes a method for detecting an okadaic acid based on a near-infrared photoelectric composite material, which includes the following steps: synthesizing NaYF.sub.4: Yb, Tm up-conversion nanoparticles (UCNPs) and a semiconductor material flower-like tungsten oxide (WO.sub.3) by a simple high-temperature solvothermal method; coupling the UCNPs with an okadaic acid monoclonal antibody through a classic amidation reaction to construct a competitive near-infrared photoelectrochemical immunosorbent assay (cNIR-PECIA) for okadaic acid detection. In addition, the present application employs a screen-printed carbon electrode (SPE) as the working electrode, and thus only requires a small amount of electrolytes, which is low-cost and maintenance-free.

METHOD FOR DETECTING AN OKADAIC ACID BASED ON A NEAR-INFRARED PHOTOELECTRIC COMPOSITE MATERIAL

The present application proposes a method for detecting an okadaic acid based on a near-infrared photoelectric composite material, which includes the following steps: synthesizing NaYF.sub.4: Yb, Tm up-conversion nanoparticles (UCNPs) and a semiconductor material flower-like tungsten oxide (WO.sub.3) by a simple high-temperature solvothermal method; coupling the UCNPs with an okadaic acid monoclonal antibody through a classic amidation reaction to construct a competitive near-infrared photoelectrochemical immunosorbent assay (cNIR-PECIA) for okadaic acid detection. In addition, the present application employs a screen-printed carbon electrode (SPE) as the working electrode, and thus only requires a small amount of electrolytes, which is low-cost and maintenance-free.