A method of forming a dissolvable part of amorphous borate includes: preparing a mixture comprising one or more boron compounds and one or more alkali compounds, at least one of the one or more boron compounds and the one or more alkali compounds being hydrous; heating the mixture to a melting temperature for a predetermined time to melt the mixture and release water from the mixture to form an anhydrous boron compound that is moldable, wherein the amount of alkali compound being selected to achieve an alkali oxide content of between about 10 to 25%; with the anhydrous boron compound at a molding temperature, molding the anhydrous boron compound in a mold; and cooling the anhydrous boron compound to form a solid.

A method of forming a dissolvable part of amorphous borate includes: preparing a mixture comprising one or more boron compounds and one or more alkali compounds, at least one of the one or more boron compounds and the one or more alkali compounds being hydrous; heating the mixture to a melting temperature for a predetermined time to melt the mixture and release water from the mixture to form an anhydrous boron compound that is moldable, wherein the amount of alkali compound being selected to achieve an alkali oxide content of between about 10 to 25%; with the anhydrous boron compound at a molding temperature, molding the anhydrous boron compound in a mold; and cooling the anhydrous boron compound to form a solid.

A mixed raw material producing method for producing a mixed raw material includes preparing a glass raw material and an aqueous solution of sodium hydroxide; causing the aqueous solution to absorb carbon dioxide gas, to deposit sodium hydrogen carbonate in the aqueous solution; and mixing the sodium hydrogen carbonate with the glass raw material, to obtain a mixed raw material to be charged into a melting furnace.

A mixed raw material producing method for producing a mixed raw material includes preparing a glass raw material and an aqueous solution of sodium hydroxide; causing the aqueous solution to absorb carbon dioxide gas, to deposit sodium hydrogen carbonate in the aqueous solution; and mixing the sodium hydrogen carbonate with the glass raw material, to obtain a mixed raw material to be charged into a melting furnace.

A glassware manufacturing system, waste handling system, and method are disclosed. The glassware manufacturing system, in accordance with one aspect of the disclosure, comprises an architectural installation having a forming floor and no basement beneath the forming floor; a glassware forming machine carried on the forming floor; a molten glass feeder configured to provide molten glass to the glassware forming machine; and a glassware manufacturing waste handling system including a sump pit in the forming floor, and a waste liquid trench substantially surrounding the glassware forming machine and flowing to the sump pit. Also, a cullet material handler and/or a molten waste glass sluice may be configured to receive molten glass and unused molten glass streams from the molten glass feeder and hot glassware rejects from the glassware forming machine.

A glassware manufacturing system, waste handling system, and method are disclosed. The glassware manufacturing system, in accordance with one aspect of the disclosure, comprises an architectural installation having a forming floor and no basement beneath the forming floor; a glassware forming machine carried on the forming floor; a molten glass feeder configured to provide molten glass to the glassware forming machine; and a glassware manufacturing waste handling system including a sump pit in the forming floor, and a waste liquid trench substantially surrounding the glassware forming machine and flowing to the sump pit. Also, a cullet material handler and/or a molten waste glass sluice may be configured to receive molten glass and unused molten glass streams from the molten glass feeder and hot glassware rejects from the glassware forming machine.

Provided are: a glass substrate that achieves a high strain point while having a low devitrification temperature; and a method for producing said glass substrate. This glass substrate for a display is made of a glass comprising SiO.sub.2 and Al.sub.2O.sub.3, comprising 0% or more to less than 3% B.sub.2O.sub.3 and from 5 to 14% BaO in mass %, and substantially devoiding Sb.sub.2O.sub.3, wherein the devitrification temperature is 1235° C. or lower and the strain point is 720° C. or higher. Alternatively, this glass substrate for a display is made of a glass comprising SiO.sub.2 and Al.sub.2O.sub.3, comprising 0% or more to less than 3% B.sub.2O.sub.3, 1.8% or more MgO, and from 5 to 14% BaO in mass %, and substantially devoiding Sb.sub.2O.sub.3, wherein (SiO.sub.2+MgO+CaO)—(Al.sub.2O.sub.3+SrO+BaO) is less than 42%, the devitrification temperature is 1260° C. or lower, and the strain point is 720° C. or higher. This method for producing said glass substrate for a display comprises: a melting step for melting, by using at least direct electrical heating, a glass material prepared to have a predetermined composition; a forming step for forming, into a flat glass sheet, the molten glass that has been melted in the melting step; and an annealing step for annealing the flat glass sheet, wherein a condition for cooling the flat glass sheet is controlled so as to reduce the heat shrinkage rate of the flat glass sheet.

Provided are: a glass substrate that achieves a high strain point while having a low devitrification temperature; and a method for producing said glass substrate. This glass substrate for a display is made of a glass comprising SiO.sub.2 and Al.sub.2O.sub.3, comprising 0% or more to less than 3% B.sub.2O.sub.3 and from 5 to 14% BaO in mass %, and substantially devoiding Sb.sub.2O.sub.3, wherein the devitrification temperature is 1235° C. or lower and the strain point is 720° C. or higher. Alternatively, this glass substrate for a display is made of a glass comprising SiO.sub.2 and Al.sub.2O.sub.3, comprising 0% or more to less than 3% B.sub.2O.sub.3, 1.8% or more MgO, and from 5 to 14% BaO in mass %, and substantially devoiding Sb.sub.2O.sub.3, wherein (SiO.sub.2+MgO+CaO)—(Al.sub.2O.sub.3+SrO+BaO) is less than 42%, the devitrification temperature is 1260° C. or lower, and the strain point is 720° C. or higher. This method for producing said glass substrate for a display comprises: a melting step for melting, by using at least direct electrical heating, a glass material prepared to have a predetermined composition; a forming step for forming, into a flat glass sheet, the molten glass that has been melted in the melting step; and an annealing step for annealing the flat glass sheet, wherein a condition for cooling the flat glass sheet is controlled so as to reduce the heat shrinkage rate of the flat glass sheet.

Disclosed is a cellular glass product having a density D at ambient temperature of at most 200 kg/m.sup.3 and a process for the production of a cellular glass product having a density D at ambient temperature of at most 200 kg/m.sup.3. The process comprises the steps of: a) contacting glass powder with foaming agent to form a dry mixture, b) thermally treating the mixture in a foaming furnace, thereby forming cellular glass, and c) annealing the cellular glass of step b) in an annealing lehr, wherein the concentration of at least one of the reagents in the dry mixture of step a) that are necessary for enabling the foaming reaction is at least 150% of the concentration corresponding to the theoretical minimum requirement for obtaining the density D.

Disclosed is a cellular glass product having a density D at ambient temperature of at most 200 kg/m.sup.3 and a process for the production of a cellular glass product having a density D at ambient temperature of at most 200 kg/m.sup.3. The process comprises the steps of: a) contacting glass powder with foaming agent to form a dry mixture, b) thermally treating the mixture in a foaming furnace, thereby forming cellular glass, and c) annealing the cellular glass of step b) in an annealing lehr, wherein the concentration of at least one of the reagents in the dry mixture of step a) that are necessary for enabling the foaming reaction is at least 150% of the concentration corresponding to the theoretical minimum requirement for obtaining the density D.