The present invention relates to a crystallized glass including a crystalline phase consisting of Ba—Si—O, in which the crystallized glass includes Li, and crystallinity of Li-based crystals contained in the crystalline phase is 20% or lower as represented by weight %, a high-frequency substrate including the crystallized glass, and a manufacturing method for a crystallized glass including a crystalline phase consisting of Ba—Si—O, the method including: obtaining an amorphous glass by melt-shaping a material containing BaO and SiO.sub.2; and crystallizing the amorphous glass by holding the amorphous glass at a treatment temperature of 600° C. or higher and lower than 1,000° C.

The present invention relates to a crystallized glass including a crystalline phase consisting of Ba—Si—O, in which the crystallized glass includes Li, and crystallinity of Li-based crystals contained in the crystalline phase is 20% or lower as represented by weight %, a high-frequency substrate including the crystallized glass, and a manufacturing method for a crystallized glass including a crystalline phase consisting of Ba—Si—O, the method including: obtaining an amorphous glass by melt-shaping a material containing BaO and SiO.sub.2; and crystallizing the amorphous glass by holding the amorphous glass at a treatment temperature of 600° C. or higher and lower than 1,000° C.

Disclosed herein is a glass composition that includes, based on a total weight of the glass composition, 55 wt % to 64 wt % of SiO.sub.2, 15 wt % to 22 wt % of Al.sub.2O.sub.3, 0.1 wt % to 4 wt % of CaO, 2.1 wt % to 10 wt % of MgO, 0 wt % to 8 wt % of ZnO, greater than 0 wt % and less than 7 wt % of CuO, and greater than 13.1 wt % and less than 18 wt % of B.sub.2O.sub.3. Also disclosed herein are a glass fiber and a glass article including the glass composition.

The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40≤SiO.sub.2≤60, 25≤B.sub.2O.sub.3≤45, 0≤Al.sub.2O.sub.3≤18, 0<R.sub.2O≤5, and 0≤RO≤12, and satisfies at least one of: i) SiO.sub.2+B.sub.2O.sub.3≥80 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9; and ii) SiO.sub.2+B.sub.2O.sub.3≥78, SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9, and 0<RO<10. Another glass composition provided includes SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, R.sub.2O, and 3<RO<8 at the same contents as the above, and satisfies SiO.sub.2+B.sub.2O.sub.3≥75 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3<97, where R.sub.2O═Li.sub.2O+Na.sub.2O+K.sub.2O and RO═MgO+CaO+SrO.

The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40≤SiO.sub.2≤60, 25≤B.sub.2O.sub.3≤45, 0≤Al.sub.2O.sub.3≤18, 0<R.sub.2O≤5, and 0≤RO≤12, and satisfies at least one of: i) SiO.sub.2+B.sub.2O.sub.3≥80 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9; and ii) SiO.sub.2+B.sub.2O.sub.3≥78, SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9, and 0<RO<10. Another glass composition provided includes SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, R.sub.2O, and 3<RO<8 at the same contents as the above, and satisfies SiO.sub.2+B.sub.2O.sub.3≥75 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3<97, where R.sub.2O═Li.sub.2O+Na.sub.2O+K.sub.2O and RO═MgO+CaO+SrO.

Provided is a glass substrate with which it is possible to reduce dielectric loss in high-frequency signals, and which also has excellent thermal shock resistance. This invention satisfies the relation {Young's modulus (GPa)×average thermal expansion coefficient (ppm/° C.) at 50-350° C.}≤300 (GPa.Math.ppm/° C.), wherein the relative dielectric constant at 20° C. and 35 GHz does not exceed 10, and the dielectric dissipation factor at 20° C. and 35 GHz does not exceed 0.006.

The present disclosure provides a novel glass filler that has a low permittivity and is suitable for mass production. A glass filler provided includes a glass composition that includes, in wt %, for example, 40≤SiO.sub.2≤60, 25≤B.sub.2O.sub.3≤45, 0<Al.sub.2O.sub.3≤18, 0<R.sub.2O≤5, and 0≤RO≤12, and satisfies at least one of: i) SiO.sub.2+B.sub.2O.sub.3≥80 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9; and ii) SiO.sub.2+B.sub.2O.sub.3≥78, SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9, and 0<RO<10. Another glass filler provided includes a glass composition that includes SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, R.sub.2O, and 3<RO<8 at the same contents as the above, and satisfies SiO.sub.2+B.sub.2O.sub.3≥75 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3<97, where R.sub.2O=Li.sub.2O+Na.sub.2O+K.sub.2O and RO=MgO+CaO+SrO.

An alkali-free glass includes, as represented by mol % based on oxides: 50 to 80% of SiO.sub.2; 2 to 6% of Al.sub.2O.sub.3; 18 to 35% of B.sub.2O.sub.3; 1 to 6% of MgO; 0 to 6% of CaO; 0 to 6% of SrO; and 0 to 3% of BaO. A formula (A) is [MgO]+[CaO]+[SrO]+[BaO], and a value of the formula (A) is 2% or more and 6% or less. A formula (B) is [Al.sub.2O.sub.3]—([MgO]+[CaO]+[SrO]+[BaO]), and a value of the formula (B) is −3% or more and 2% or less.

An alkali-free glass includes, as represented by mol % based on oxides: 50 to 80% of SiO.sub.2; 2 to 6% of Al.sub.2O.sub.3; 18 to 35% of B.sub.2O.sub.3; 1 to 6% of MgO; 0 to 6% of CaO; 0 to 6% of SrO; and 0 to 3% of BaO. A formula (A) is [MgO]+[CaO]+[SrO]+[BaO], and a value of the formula (A) is 2% or more and 6% or less. A formula (B) is [Al.sub.2O.sub.3]—([MgO]+[CaO]+[SrO]+[BaO]), and a value of the formula (B) is −3% or more and 2% or less.

The present disclosure provides a novel glass composition that has a low permittivity and is suitable for mass production. A glass composition provided satisfies, in wt %, for example, 40≤SiO.sub.2≤60, 25≤B.sub.2O.sub.3≤45, 0<Al.sub.2O.sub.3≤18, 0<R.sub.2O≤5, and 0≤RO≤12, and satisfies at least one of: i) SiO.sub.2+B.sub.2O.sub.3≥80 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9; and ii) SiO.sub.2+B.sub.2O.sub.3≥78, SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3≤99.9, and 0<RO<10. Another glass composition provided includes SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, R.sub.2O, and 3<RO<8 at the same contents as the above, and satisfies SiO.sub.2+B.sub.2O.sub.3≥75 and SiO.sub.2+B.sub.2O.sub.3+Al.sub.2O.sub.3<97, where R.sub.2O=Li.sub.2O+Na.sub.2O+K.sub.2O and RO=MgO+CaO+SrO.