This disclosure provides methods of manufacturing a controlled pore glass, including: (a) adding an acidic solution to a column containing borosilicate glass; (b) flushing the column from step (a) with an aqueous solution until the pH of the effluent is greater than about 6; (c) adding a basic solution to the column from step (b); and (d) flushing the column from step (c) with an aqueous solution until the pH of the effluent is less than about 9 to produce a controlled pore glass.

A method for preparing an optically transparent, superomniphobic glass composition is described. In one aspect, the present disclosure provides a method for preparing a glass composition, including heating a borosilicate glass comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide to form a phase-separated glass comprising an interpenetrating network of silicon oxide domains and boron oxide domains. The method includes removing at least a portion of the boron oxide domains from the phase-separated glass and depositing a hydrophobic silane to provide a porous glass having a hydrophobic silane layer disposed on a portion of the surface thereof, a total pore volume of 15-50 vol. %, and an average pore diameter of 20-300 nm. The method includes, within at least a portion of the volume of the porous glass, forming an aerogel precursor, and converting at least a portion of the aerogel precursor to an aerogel.

An optical member including a porous glass layer on a base member is provided, wherein the reflectance is reduced and a ripple is suppressed. The optical member is provided with a base member and a glass layer holding a transparent material in the inside of a porous structure disposed on the base member, wherein in the thickness direction of the glass layer, the porosity in the base member side with respect to the center line of the glass layer in the thickness direction is smaller than the porosity in the side opposite to the base member with respect to the center line of the glass layer in the thickness direction.

A method for preparing an optically transparent, superomniphobic glass composition is described. In one aspect, the present disclosure provides a method for preparing a glass composition, including heating a borosilicate glass comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide to form a phase-separated glass comprising an interpenetrating network of silicon oxide domains and boron oxide domains. The method includes removing at least a portion of the boron oxide domains from the phase-separated glass and depositing a hydrophobic silane to provide a porous glass having a hydrophobic silane layer disposed on a portion of the surface thereof, a total pore volume of 15-50 vol. %, and an average pore diameter of 20-300 nm. The method includes, within at least a portion of the volume of the porous glass, forming an aerogel precursor, and converting at least a portion of the aerogel precursor to an aerogel.

A vacuum insulated structure for use in an appliance includes an inner liner and an outer wrapper coupled to the inner liner. A vacuum insulated cavity is defined therebetween. An insulation material is disposed in the vacuum insulated cavity. The insulation material includes porous glass flakes.

Provided is an alkali-resistant porous glass member suitable as a gas sensor element. A porous glass member contains, in terms of % by mass, over 0% ZrO.sub.2+TiO.sub.2+Al.sub.2O.sub.3+BeO+Cr.sub.2O.sub.3+Ga.sub.2O.sub.3+CeO.sub.2 and has a light transmittance of over 1% at any one of wavelengths from 200 to 2600 nm at a thickness of 0.5 mm.

A glass includes a first glass portion and a second glass portion. The first glass portion has a higher ion packing density than the second glass portion (has a composition that forms a glass in which, out of plastic deformation characteristics, plastic flow is dominant). The second glass has a lower ion packing density than the first glass portion (has a composition that forms a glass in which, out of the plastic deformation characteristics, densification is dominant).

An article including an optically transparent, superomniphobic coating that is durable and relatively easy to keep clean, is disclosed. In one aspect, the present disclosure provides an article comprising a substrate and a graded layer, the graded layer having a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, and opposed the first side, a second side comprising at least 45 wt. % silicon oxide, no more than 5 wt. % boron oxide, and 10-50 wt. % aerogel, the aerogel present in the graded layer as a plurality of distinct domains.

A method for preparing an optically transparent, superomniphobic coating on a substrate, such as an optical substrate, is disclosed. The method includes providing a glass layer disposed on a substrate, the glass layer having a first side adjacent the substrate and an opposed second side, the glass layer comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, such that a glass layer has a composition in a spinodal decomposition region. The method further includes heating the second side of the glass layer to form a phase-separated portion of the layer, the phase-separated portion comprising an interpenetrating network of silicon oxide domains and boron oxide domains, and removing at least a portion of the boron oxide domains from the phase-separated portion to provide a graded layer disposed on the substrate. The graded layer has a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide, and opposite the first side, a porous second side comprising at least 45 wt. % silicon oxide and no more than 5 wt. % boron oxide.

An article including an optically transparent, superomniphobic coating that is durable and relatively easy to keep clean, is disclosed. In one aspect, the present disclosure provides an article comprising a substrate and a graded layer, the graded layer having a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, and opposed the first side, a second side comprising at least 45 wt. % silicon oxide, no more than 5 wt. % boron oxide, and 10-50 wt. % aerogel, the aerogel present in the graded layer as a plurality of distinct domains.