C03C15/02

GLASS POLISHING APPARATUS AND GLASS POLISHING METHOD USING THE SAME
20220088741 · 2022-03-24 ·

A glass polishing apparatus includes a jig that holds a glass structure. The glass polishing apparatus includes a first flat portion, a second flat portion opposite to the first flat portion, and a curved portion connecting the first flat portion to the second flat potion The jig and includes a first holding surface holding the first flat portion, a second holding surface disposed opposite to the first holding surface and holding the second flat portion, and a third holding surface connecting the first holding surface to the second holding surface and holding the curved portion. At least a portion of a roller unit having a cylindrical shape is inserted between the first flat portion and the second flat portion.

TEXTURED GLASS ARTICLES AND METHODS OF MAKING THE SAME

A textured glass article that includes: a glass substrate comprising a thickness, a primary surface and a bulk composition at the midpoint of the thickness; and a textured region defined by the primary surface and comprising a textured region composition. The textured region comprises a sparkle of 2% or less. Further, the bulk composition comprises about 40 mol % to 80 mol % silica and the textured region composition comprises at least about 40 mol % silica.

TEXTURED GLASS ARTICLES AND METHODS OF MAKING THE SAME

A textured glass article that includes: a glass substrate comprising a thickness, a primary surface and a bulk composition at the midpoint of the thickness; and a textured region defined by the primary surface and comprising a textured region composition. The textured region comprises a sparkle of 2% or less. Further, the bulk composition comprises about 40 mol % to 80 mol % silica and the textured region composition comprises at least about 40 mol % silica.

GLASS SOLID ELECTROLYTE LAYER, METHODS OF MAKING GLASS SOLID ELECTROLYTE LAYER AND ELECTRODES AND BATTERY CELLS THEREOF

Battery component structures and manufacturing methods for solid-state battery cells include a unitary Li ion conducting sulfide glass solid electrolyte structure that serves as the basic building block around which a solid-state battery cell can be fabricated. The unitary glass structure approach can leverage precision controlled high throughput processes from the semiconductor industry that have been inventively modified as disclosed herein for processing a sulfide glass solid electrolyte substrate into a unitary Li ion conducting glass structure, for example, by using etching and lithographic photoresist formulations and methods. The glass substrate may be precision engineered to effectuate a dense glass portion and a porous glass portion that can be characterized as sublayers having predetermined thicknesses. The porous glass sublayer includes a plurality of discrete substantially vertical closed-end holes or trenches that are precision engineered into one or both major substrate surfaces using microfabrication processes.

SURFACE TREATMENT OF A SULFIDE GLASS SOLID ELECTROLYTE LAYER

Chemically treating ionically conductive sulfide glass solid electrolyte separators or separator layers can improve performance. In particular, treatment involving chemically etching a surface or surface region of the sulfide glass separator to blunt, lessen or remove edge defects or surface flaws, and/or to enhance surface smoothness is cost effective, reliable and well suited for high production environments compared to physical methods of removing scratches or smoothing surfaces, such as mechanical grinding and polishing.

SURFACE TREATMENT OF A SULFIDE GLASS SOLID ELECTROLYTE LAYER

Chemically treating ionically conductive sulfide glass solid electrolyte separators or separator layers can improve performance. In particular, treatment involving chemically etching a surface or surface region of the sulfide glass separator to blunt, lessen or remove edge defects or surface flaws, and/or to enhance surface smoothness is cost effective, reliable and well suited for high production environments compared to physical methods of removing scratches or smoothing surfaces, such as mechanical grinding and polishing.

METHOD AND APPARATUS FOR FORMING SUBSTRATE SURFACES WITH EXPOSED CRYSTAL LATTICE USING ACCELERATED NEUTRAL ATOM BEAM

A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.

Method for improving the resistance to laser flux of an optical component

A method for improving the properties of resistance to laser flux of an optical component, comprising a step consisting in bringing the component into contact with an aqueous solution comprising at least one hydroxide of an alkaline metal or an alkaline earth metal in a quantity of between 5 and 30 mass % and having a temperature T of between 50 and 100° C.

Method for improving the resistance to laser flux of an optical component

A method for improving the properties of resistance to laser flux of an optical component, comprising a step consisting in bringing the component into contact with an aqueous solution comprising at least one hydroxide of an alkaline metal or an alkaline earth metal in a quantity of between 5 and 30 mass % and having a temperature T of between 50 and 100° C.

POLISHING SLURRY, METHOD FOR POLISHING GLASS, AND METHOD FOR MANUFACTURING GLASS
20210269676 · 2021-09-02 · ·

Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.