A material includes one or more transparent substrates comprising two main faces, wherein one of the faces of one of the substrates is coated with a functional coating which can have an effect on solar radiation and/or infrared radiation, and a face not coated with the functional coating of one of the substrates includes a reflective color-adjustment coating comprising at least one dielectric layer including a reflective dielectric layer with a thickness of between 2 and 100 nm, all the dielectric layers of the reflective color-adjustment coating have a thickness of less than 100 nm.

Systems and methods are disclosed for depositing particles on a substrate, the method comprising generating a thermal bubble on a surface of a substrate submerged in a medium having suspended particles such that the thermal bubble deposits the particles on the substrate; and deflating the thermal bubble such that the deposited particles are pulled toward a central position to form an island of particles.

Disclosed herein are nanostructured plasmonic materials. The nanostructured plasmonic materials can include a first nanostructured layer comprising: a first layer of a first plasmonic material permeated by a first plurality of spaced-apart holes, wherein the first plurality of spaced apart holes comprise a first array; and a second nanostructured layer comprising a second layer of a second plasmonic material permeated by a second plurality of spaced-apart holes, wherein the second plurality of spaced apart holes comprise a second array; wherein the second nanostructured layer is located proximate the first nanostructured layer; and wherein the first principle axis of the first array is rotated at a rotation angle compared to the first principle axis of the second array.

A method of fabricating a metal thin film-on-glass structure. A glass substrate, on a top surface of which a layer is formed, is prepared. A local area of the glass substrate is etched from a bottom of the glass substrate to expose the layer downwardly, thereby forming an exposed area of the layer. The layer is a metal thin film. The etching includes first-etching the glass substrate to a depth less than a thickness of the glass substrate using a first etching solution containing hydrofluoric acid and at least one of nitric acid and sulfuric acid, resulting in a first-etched portion of the glass substrate; and second-etching the first-etched portion of the glass substrate using an etching solution containing hydrofluoric acid without nitric acid or sulfuric acid, so that the layer is exposed downwardly, whereby the metal thin film is supported by a remaining portion of the glass substrate.

It is demanded that a LTCC substrate composition capable of maintaining low relative permittivity k and high Q value without having a reactivity with a silver which is an electrode material and causing migration of the silver during a co-firing operation at a low temperature. Provided with a low temperature co-fired substrate composition containing 83 to 91 wt. % of CaO-B.sub.2O.sub.3-SiO.sub.2 based glass powder, 7.5 to 14 wt. % of two or more kinds of nanometer-sized SiO.sub.2 powders having different ranges of particle diameter and 1.5 to 3 wt. % of β-wollastonite powder as a crystallization agent wherein the glass powder contains 40.0 to 45.0 wt. % of CaO, 9.0 to 20.0 wt. % of B.sub.2O.sub.3 and 40.0 to 46.0 wt. % of SiO.sub.2.

It is demanded that a LTCC substrate composition capable of maintaining low relative permittivity k and high Q value without having a reactivity with a silver which is an electrode material and causing migration of the silver during a co-firing operation at a low temperature. Provided with a low temperature co-fired substrate composition containing 83 to 91 wt. % of CaO-B.sub.2O.sub.3-SiO.sub.2 based glass powder, 7.5 to 14 wt. % of two or more kinds of nanometer-sized SiO.sub.2 powders having different ranges of particle diameter and 1.5 to 3 wt. % of β-wollastonite powder as a crystallization agent wherein the glass powder contains 40.0 to 45.0 wt. % of CaO, 9.0 to 20.0 wt. % of B.sub.2O.sub.3 and 40.0 to 46.0 wt. % of SiO.sub.2.

A method of making a mirror substrate for a vehicular rearview mirror assembly includes providing a glass substrate having a planar front surface, a planar rear surface and a circumferential perimeter edge. The glass substrate is positioned at a fixture and the front perimeter edge portion of the glass substrate is ground by moving a grinding wheel around the periphery of the glass substrate to establish a rounded surface about and around the periphery of the glass substrate and between the planar front surface and a rear portion of the perimeter edge of the glass substrate. The rounded surface has a radius of curvature of at least 2.5 mm. The rounded surface provides a curved transition between the planar front surface of the glass substrate and the rear portion of the perimeter edge of the glass substrate. The planar rear surface of the glass substrate is coated with a coating.

A method of making a mirror substrate for a vehicular rearview mirror assembly includes providing a glass substrate having a planar front surface, a planar rear surface and a circumferential perimeter edge. The glass substrate is positioned at a fixture and the front perimeter edge portion of the glass substrate is ground by moving a grinding wheel around the periphery of the glass substrate to establish a rounded surface about and around the periphery of the glass substrate and between the planar front surface and a rear portion of the perimeter edge of the glass substrate. The rounded surface has a radius of curvature of at least 2.5 mm. The rounded surface provides a curved transition between the planar front surface of the glass substrate and the rear portion of the perimeter edge of the glass substrate. The planar rear surface of the glass substrate is coated with a coating.

A method of forming a glass electrochemical sensor is described. In some embodiments, the method may include forming a plurality of electrical through glass vias (TGVs) in an electrode substrate; filling each of the plurality of electrical TGVs with an electrode material; forming a plurality of contact TGVs in the electrode substrate; filling each of the plurality of contact TGVs with a conductive material; patterning the conductive material to connect the electrical TGVs with the contact TGVs; forming a cavity in a first glass layer; and bonding a first side of the first glass layer to the electrode substrate.

A method of forming a glass electrochemical sensor is described. In some embodiments, the method may include forming a plurality of electrical through glass vias (TGVs) in an electrode substrate; filling each of the plurality of electrical TGVs with an electrode material; forming a plurality of contact TGVs in the electrode substrate; filling each of the plurality of contact TGVs with a conductive material; patterning the conductive material to connect the electrical TGVs with the contact TGVs; forming a cavity in a first glass layer; and bonding a first side of the first glass layer to the electrode substrate.