Patent classifications
C03C2203/20
PREPARATION OF A QUARTZ GLASS BODY IN A STANDING SINTER CRUCIBLE
The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven comprises a standing sinter crucible. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.
NEAR INFRARED SHIELDING AND LASER-RESISTANT WINDOW
Near-infrared shielding includes a glass material. The shielding provides transmittance at wavelengths between 390 to 700 nm, but near infrared absorbing species are distributed throughout the glass material and the shielding blocks light in the near infrared range. Further, the glass material has a near zero or negative coefficient of thermal expansion, allowing the glass material to heat up when the shielding is blocking a near infrared laser, without expanding much.
TRANSPARENT GLASS HAVING PATTERN
The present invention relates to transparent glass having a pattern and, more specifically, to transparent glass having a pattern, and having the purpose of allowing a dotted, linear or wave-shaped uneven surface to be formed on the surface of glass at low cost and improving fingerprint resistance, contamination resistance, water repellency and light transmittance by forming a fingerprint-resistant coating layer thereon, such that an uneven surface (100), which has a pattern groove (102) of any one of a plurality of dots, a plurality of linear forms, and a plurality of wave forms, is formed on the surface of a glass substrate by a deposition process or an etching process, a primer layer (40) and a fingerprint-resistant coating layer (50) are formed on the uneven layer, and the width or area of the pattern groove and the spacing distance between the pattern grooves are constant, thereby allowing the uneven surface to be systematically arranged.
Glass
A glass has a density of 2.60 g/cm.sup.3 or lower, a Young's modulus of 88 GPa or more, a strain point of 650 to 720 C., a temperature T.sub.4 at which a glass viscosity reaches 10.sup.4 dPa.Math.s of 1,320 C. or lower, a glass surface devitrification temperature (T.sub.c) of T.sub.4+20 C. or lower, and an average coefficient of thermal expansion of 3010.sup.7 to 4310.sup.7/ C. at 50 to 350 C. The glass contains, as represented by mol % based on oxides, 50 to 80% of SiO.sub.2, 8 to 20% of Al.sub.2O.sub.3, 0 to 0.5% in total of at least one kind of alkali metal oxide selected from the group consisting of Li.sub.2O, Na.sub.2O and K.sub.2O, and 0 to 1% of P.sub.2O.sub.5.
METHOD FOR MANUFACTURING A FIRE-RESISTANT MATERIAL BASED ON HOMOGENEOUS FOAM PRODUCTS
The object of the present invention is a method for producing a fire retardant on the basis of homogeneous foam products. In such a method, a glass is first reacted with an aqueous alkali metal hydroxide solution at temperatures above 50 C. The reaction product is extracted as a viscous mass, granulated, and cooled until a solid granulated product is obtained. According to the invention, the granules are furnished with a hydrophobic coating having a layer thickness of about. 20 m to 500 m and are particularly 50 m to 200 m and preferably 50 m to 100 m and are incorporated in a construction material as a fire retardant additive.
CHEMICALLY STRENGTHENED GLASS
The present invention relates to a chemically strengthened glass having a first surface and a second surface facing the first surface, and having a compressive stress layer provided on the first surface and the second surface, in which a depth of compressive stress DOL.sub.1 (m) of the first surface is larger than a depth of compressive stress DOL.sub.2 (m) of the second surface, and a stress distribution in a sheet thickness direction of the chemically strengthened glass satisfies the following relational expression (1) and the following relational expression (3):
CT.sub.1/CT.sub.20.8(1)
and
CT.sub.1L.sup.1/230 (MPa.Math.mm.sup.1/2)(3).
GLASS
A glass has a density of 2.60 g/cm.sup.3 or lower, a Young's modulus of 88 GPa or more, a strain point of 650 to 720 C., a temperature T.sub.4 at which a glass viscosity reaches 10.sup.4 dPa.Math.s of 1,320 C. or lower, a glass surface devitrification temperature (T.sub.c) of T.sub.4+20 C. or lower, and an average coefficient of thermal expansion of 3010.sup.7 to 4310.sup.7/ C. at 50 to 350 C. The glass contains, as represented by mol % based on oxides, 50 to 80% of SiO.sub.2, 8 to 20% of Al.sub.2O.sub.3, 0 to 0.5% in total of at least one kind of alkali metal oxide selected from the group consisting of Li.sub.2O, Na.sub.2O and K.sub.2O, and 0 to 1% of P.sub.2O.sub.5.
Glass-ceramic cover glass, process for production thereof and use thereof, and digital display device comprising such a cover glass
A cover glass is provided that includes a silica based glass ceramic with a thickness between 0.4 mm and 0.85 mm. The glass ceramic has a transmittance of more than 80% from 380 nm to 780 nm and a stress attribute selected from: an overall compressive stress (CS) of at least 250 MPa and at most 1500 MPa, a compressive stress at a depth of 30 m (CS30) from one of the two faces of at least 160 MPa and at most 525 MPa, a depth of the compression layer (DoCL) of at least 0.2 times the thickness and less than 0.5 times the thickness, and any combinations thereof. The glass ceramic has at least one silica based crystal phase having in a near-surface layer a unit cell volume of at least 1% by volume larger than that of a core where the crystal phase has minimum stresses.
GLASS SUBSTRATES COMPRISING SILICA-BASED GLASS WITH INCREASED HYDROXYL GROUP UNIFORMITY, AND METHODS OF FORMING THE SAME
A glass substrate including a silica-based glass, the silica-based glass includes silica and from 0 wt. % to 15 wt. % titania. A first portion of the silica-based glass has a height of 1.0 mm and a first cross-section having an area greater than or equal to 50.0 cm.sup.2. A first sub-portion of the first portion has a height of 1.0 mm, a length of 40.0 mm, a width of 40.0 mm, and a second cross-section. A peak-to-valley difference of a hydroxyl group concentration of the first sub-portion is less than or equal to 15 ppm, as measured at the second cross-section. A method of forming a glass substrate includes heating a molded precursor mass. The molded precursor mass includes soot particles. The heating includes exposing the molded precursor mass to a consolidation environment containing steam, and maintaining the molded precursor mass in the consolidation environment while reducing the consolidation temperature.
Substrate for transferring microstructures and method for manufacturing the same
Provided is a substrate for transferring microstructures such as a micro LED including an engraved mark. The substrate for transferring microstructures is less likely to cause a recognizing error of the engraved mark to occur in a reading device, and makes it possible to stably and continuously read the engraved mark. A substrate for transferring microstructures includes a synthetic quartz glass substrate and a silicone pressure-sensitive adhesive agent layer provided on a front surface of the synthetic quartz glass substrate. The substrate includes an engraved mark provided in the from surface.