A method for producing reinforced glass, reinforced glass and an electronic device are provided. The method for producing reinforced glass includes: subjecting glass to a first reinforcing treatment; detecting a first stress parameter of the glass subjected to the first reinforcing treatment, and determining whether the glass subjected to the first reinforcing treatment is qualified according to the first stress parameter; subjecting the glass to a second reinforcing treatment when the glass subjected to the first reinforcing treatment is qualified; detecting a second stress parameter of the glass subjected to the second reinforcing treatment, and determining whether the glass subjected to the second reinforcing treatment is qualified according to the second stress parameter; and subjecting the glass to a touch-polishing treatment when the glass subjected to the second reinforcing treatment is qualified, so as to obtain the reinforced glass.

The present invention relates to a chemically strengthened glass including alkali metal ions, having a thickness of 0.20 mm or smaller, and having a pair of major surfaces that are opposed to each other and have been subjected to a chemically strengthening treatment, in which at least one of the pair of major surfaces has a core roughness depth Sk of 0.90 nm or smaller and a mean summit curvature Ssc of 13.0×10.sup.−4/nm or smaller.

The surface-treated glass cloth includes a surface treatment layer on a surface, and the surface treatment layer includes: a first silane coupling agent containing at least one amine selected from the group consisting of a primary amine, a secondary amine and a tertiary amine and containing no quaternary ammonium cation; a second silane coupling agent containing at least one quaternary ammonium cation; an organic acid; and a surfactant. A total content of the first silane coupling agent and the second silane coupling agent is 0.05 to 1.20 mass% based on the total amount of the surface-treated glass cloth, a ratio of a molar content of the first silane coupling agent to a molar content of the second silane coupling agent is 1.1 to 10.0, and a content of the organic acid is 50 to 300 ppm based on the total amount of the surface-treated glass cloth.

Synthetic quartz glass substrates are prepared by furnishing a synthetic quartz glass block, coating two opposed surfaces of the glass block with a liquid having a transmittance of at least 99.0%/mm at a birefringence measuring wavelength, measuring a birefringence of the glass block by directing light thereacross, determining a slice thickness on the basis of the birefringence measurement and the dimensions of the substrate, and slicing the glass block at the determined slice thickness.

A method of manufacturing a quartz glass fibre includes producing a quartz glass primary preform by modified chemical vapor deposition (MCVD) in a quartz glass substrate tube and inserting the quartz glass primary preform into a glass jacketing tube. Defect-generating UV radiation is irridiated into the cross-sectional area of the glass jacketing tube while combining the quartz glass primary preform with the glass jacketing tube in the jacketing process to form a cladding layer to a secondary preform. A quartz glass fibre is pulled from the secondary preform.

The present disclosure relates to a device and method for degrading chlorinated hydrocarbon (CHC) in polluted groundwater. A preparation method for each of glass tubes and the method for degrading CHCs are as follows: uniformly mixing 55-85 wt % of Bi.sub.2O.sub.3, 5-15 wt % of B.sub.2O.sub.3, and 10-30 wt % of SrCO.sub.3, putting into a corrosion resistant crucible, holding at 1,050-1,300° C. for 15-45 min, forming into a glass tube, and holding the glass tube at 200-400° C. for 1-3 h, followed by annealing; soaking the inner wall of the glass tube for 10-30 min with a HCl solution with a concentration of 0.02-0.2 mol/L, washing with water, and providing an ultraviolet lamp to obtain a self-cleaning glass tube; guiding CHC-containing groundwater to the self-cleaning glass tube, turning on the ultraviolet lamp, and carrying out ultraviolet irradiation for 1-8 h, thereby effectively removing the CHCs.

Chemically toughened glass is provided that has a depth of compressive stress for potassium of at least 4 μm and at most 8 μm; a compressive stress at a depth of 30 μm due to sodium exchange of at most 200 MPa and a minimum amount of at least 90 MPa where the thickness is 0.5 mm, at least 100 MPa where the thickness is 0.55 mm, at least 110 MPa in where the thickness is 0.6 mm, at least 120 MPa where the thickness is 0.7 mm, and at least 140 MPa where the thickness is 1 mm; a ratio of sodium exchange depth, in μm, to the thickness, in mm, that is greater than 0.130; and a normalized integral of tensile stress that is a storable tensile stress of at least 20.6 MPa and at most 30 MPa.

A laminate according to an embodiment of the present invention includes at least one glass sheet and at least one resin layer, a relative dielectric constant of the glass sheet at 25° C. and a frequency of 2.45 GHz being 5 or less, and a dielectric loss tangent of the glass sheet at 25° C. and a frequency of 2.45 GHz being 0.003 or less.

A method of manufacturing a scintillator material includes providing a substrate made of a quartz glass and having a recess formed therein; filling the recess with a raw material powder obtained by mixing an iodide raw material and SiO.sub.2 fine particles; after filling the recess, disposing a lid on the substrate to cover the recess; and after disposing the lid, heating the substrate, thereby forming a nanocomposite layer in which an iodide phosphor is introduced into a cristobalite structure.

Provided is a method of manufacturing a tempered glass, including an etching step of etching a plate-shaped or sheet-shaped chemically tempered glass having a compressive stress layer in a surface thereof. The method further includes a step of preparing, as the chemically tempered glass before the etching, a chemically tempered glass, which has in at least part thereof a bendable thin portion having a thickness tla, in which the thickness t1a is 150 .Math.m or less, in which a maximum compressive stress CSa in the compressive stress layer before the etching is 1,100 MPa or less, and in which a depth DOLa of the compressive stress layer before the etching is less than 15 .Math.m. The etching step includes etching the chemically tempered glass so that an etching amount Δt on one surface of the chemically tempered glass is 0.25 .Math.m or more and 3 .Math.m or less.