Patent classifications
C04B41/0036
METHOD FOR PREPARING INFRARED RADIATION CERAMIC MATERIAL
A method for preparing an infrared radiation ceramic material includes mixing and ball milling raw materials of Fe.sub.2O.sub.3, MnO.sub.2 and CuO in a mass ratio to obtain a mixed powder; pressing the mixed powder; adjusting laser spot, laser power and laser sintering time of a laser; irradiating or sintering by a first laser the pressed mixed powder in a crucible for a high-temperature solid-phase reaction to obtain an AB.sub.2O.sub.4 type ferrite powder; obtaining a first mixture by mixing the AB.sub.2O.sub.4 type ferrite powder and a cordierite powder in a mass ratio; adding a sintering aid and a nucleating agent for ball milling; obtaining a second mixture by mixing the first mixture and a binder for aging; pressing the second mixture; and irradiating or sintering the pressed second mixture by a second laser to obtain the infrared radiation ceramic material.
Method of forming a plurality of gratings
Embodiments of the present application generally relate to methods for forming a plurality of gratings. The methods generally include depositing a material over one or more protected regions of a waveguide combiner disposed on a substrate, the material having a thickness inhibiting removal of a grating material disposed on the waveguide combiner when an ion beam is directed toward the substrate, and directing the ion beam toward the substrate. The methods disclosed herein allow for formation of a plurality of gratings in one or more unprotected regions, while no gratings are formed in the protected regions.
SURFACE STRUCTURE FORMING METHOD FOR ZIRCONIA-BASED CERAMICS, AND ZIRCONIA-BASED CERAMICS
Provided herein is a method for forming a periodic microstructure on a surface of zirconia-based ceramics, which are not easily mechanically workable, without causing thermal adverse effects. A zirconia-based ceramic having a surface periodic microstructure is also provided. A linearly or circularly polarized laser beam is irradiated to a zirconia-based ceramic surface, and periodic irregularities are formed in a spot of the laser beam. Stripe-pattern irregularities parallel to the direction of polarization can be formed in a spot of a laser beam by irradiating a linearly polarized ultrashort pulsed-laser beam to a zirconia-based ceramic surface. A mesh-like raised region and a dot-like recessed region can be periodically formed by irradiating a circularly polarized ultrashort pulsed-laser beam to a ceramic surface.
Implantable medical device and method for laser processing
Various methods for laser welding biocompatible material for use in implantable medical devices are disclosed. A method for laser processing includes applying a laser beam to a biocompatible material comprising at least 85% by weight zirconium oxide (ZrO.sub.2) or “zirconia” in an oxygen-free environment and depleting the material of oxygen. The depletion of oxygen converts the zirconium oxide to elemental zirconium at an interface where the material is applied to the elemental zirconium. In one embodiment, the present invention provides for an implantable medical device or component thereof made of a biocompatible material comprising zirconium oxide. The device includes a substrate that has an intrinsic conductive pathway comprising elemental zirconium that extends from a first surface to a second surface of the substrate.
Nanoscale Etching of Light Absorbing Materials using Light and an Electron Donor Solvent
A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays.
Nanoscale Etching of Light Absorbing Materials using Light and an Electron Donor Solvent
A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays.
METHOD OF TREATING CERAMICS AND CERAMIC MEMBER
A ceramic member is produced by performing a laser treatment on a ceramic substrate as a pretreatment for a surface treatment such that grooves that can be substantially uniformly filled with a surface treatment material are formed in the surface of the ceramic substrate. Through laser irradiation of the surface grooves with recessed surfaces formed to extend in at least one direction are provided. Flat surfaces are formed at areas between the grooves that are adjacent to each other. Pitches between the adjacent grooves are set to a range of 0.05 mm to 0.30 mm. One of the grooves has a width that progressively decreases as the depth increases and is opened on one side in the depth direction at a maximum width. The one of the grooves has an aspect ratio in a range of 0.5 to 1.3 and an opening ratio of equal to or greater than 70%.
METHOD OF TREATING CERAMICS AND CERAMIC MEMBER
A ceramic member is produced by performing a laser treatment on a ceramic substrate as a pretreatment for a surface treatment such that grooves that can be substantially uniformly filled with a surface treatment material are formed in the surface of the ceramic substrate. Through laser irradiation of the surface grooves with recessed surfaces formed to extend in at least one direction are provided. Flat surfaces are formed at areas between the grooves that are adjacent to each other. Pitches between the adjacent grooves are set to a range of 0.05 mm to 0.30 mm. One of the grooves has a width that progressively decreases as the depth increases and is opened on one side in the depth direction at a maximum width. The one of the grooves has an aspect ratio in a range of 0.5 to 1.3 and an opening ratio of equal to or greater than 70%.
METHOD OF REPAIRING CERAMIC COMPOSITE ARTICLES
A method of repairing an article including cleaning a repair area, wherein the repair area comprises a ceramic matrix composite; and depositing a ceramic material in the cleaned repair area using laser assisted chemical vapor deposition. Also disclosed is a repaired ceramic composite produced by this method.
METHOD OF REPAIRING CERAMIC COMPOSITE ARTICLES
A method of repairing an article including cleaning a repair area, wherein the repair area comprises a ceramic matrix composite; and depositing a ceramic material in the cleaned repair area using laser assisted chemical vapor deposition. Also disclosed is a repaired ceramic composite produced by this method.