The present disclosure relates to a tantalum carbide-coated carbon material and a method for manufacturing the same, and an aspect of the present disclosure provides a tantalum carbide-coated carbon material including: a carbon substrate; and a tantalum carbide coating layer formed on the carbon substrate by a CVD method, wherein microcracks included in the tantalum carbide coating layer have a maximum width of 1.5 ?m to 2.6 ?m.

Provided is a hexagonal boron nitride powder that can achieve higher thermal conductivity when added as a filler to resin. A plasma treatment method of plasma-treating a hexagonal boron nitride powder under reduced pressure comprises: storing the hexagonal boron nitride powder in a treatment container; supplying a plasma generating gas into the treatment container and maintaining inside of the treatment container at a pressure lower than atmospheric pressure; applying high frequency waves to an electrode installed outside the treatment container while rotating the treatment container about a central axis of the treatment container as a rotation axis in a state in which the rotation axis of the treatment container is inclined with respect to horizontal, to plasma-treat the hexagonal boron nitride powder in the treatment container; and cooling one or both of the treatment container and the electrode during the plasma treatment.

Provided is a hexagonal boron nitride powder that can achieve higher thermal conductivity when added as a filler to resin. A plasma treatment method of plasma-treating a hexagonal boron nitride powder under reduced pressure comprises: storing the hexagonal boron nitride powder in a treatment container; supplying a plasma generating gas into the treatment container and maintaining inside of the treatment container at a pressure lower than atmospheric pressure; applying high frequency waves to an electrode installed outside the treatment container while rotating the treatment container about a central axis of the treatment container as a rotation axis in a state in which the rotation axis of the treatment container is inclined with respect to horizontal, to plasma-treat the hexagonal boron nitride powder in the treatment container; and cooling one or both of the treatment container and the electrode during the plasma treatment.

To form, on a ceramic member or a metal member, a thermal spray ceramic coating film which achieves both the quality of a ceramic coating film and gas barrier property, and with which a composite oxide having a melting point lower than the ambient temperature will not form when used as a coating film on a ceramic member or a metal member constituting a glass article manufacturing apparatus.

A ceramic coating film-provided member comprising a ceramic member or a metal member and a thermal spray ceramic coating film formed on at least a part of the surface of the ceramic member or the metal member, wherein the thermal spray ceramic coating film contains Al.sub.2O.sub.3 and 12CaO.7Al.sub.2O.sub.3, and the weight ratio of CaO to Al.sub.2O.sub.3 (CaO/Al.sub.2O.sub.3) is more than 0.11 to 0.50.

The present invention relates to a dental zirconia material of which the surface is modified by plasma treatment, an implant, and a method for preparing same. The zirconia material and the implant prepared according to the present invention have improved cell adhesion and anti-bacterial effect, and thus can exhibit improved biocompatibility and minimize an inflammatory response of a user and the like.

Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB.sub.6, M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm.sup.2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.

The application provides a plasma-assisted ceramic sintering device and method. The plasma-assisted ceramic sintering device includes an enclosed container receiving ceramic green body and defining a gas outlet. A plasma jet device includes a working power supply and a plasma generation chamber. The plasma generation chamber defines a gas input port, and a gas output port located in the enclosed container. The plasma generation chamber includes a working electrode having a first end and a second end. The first end electrically connects the working power supply, and the second end is adjacent to the gas output port. A gas output device connects the gas input port for inputting working gas into the plasma generation chamber. A power supply device can electrically connect and apply voltage to the ceramic green body, obtaining the ceramic by sintering. The sintering device of the application provides plasma-assisted sintering and optimizes properties of ceramic materials.

A method of manufacturing a ceramic element for a timepiece is provided, including forming a body made of oxide-based ceramic; exposing at least one portion of the external surface of the body to a reduction reaction, to remove oxygen atoms to a predetermined depth in order to make the at least one portion electrically conductive; depositing a metallic material starting from the at least one electrically conductive portion; and machining the body and/or the metallic material in order to provide the element with an aesthetic finish.

A method of manufacturing a ceramic element for a timepiece is provided, including forming a body made of oxide-based ceramic; exposing at least one portion of the external surface of the body to a reduction reaction, to remove oxygen atoms to a predetermined depth in order to make the at least one portion electrically conductive; depositing a metallic material starting from the at least one electrically conductive portion; and machining the body and/or the metallic material in order to provide the element with an aesthetic finish.

The present invention relates to a dental 3Y-TZP zirconia material whose surface is modified by plasma treatment, an implant and a manufacturing method thereof. The 3Y-TZP zirconia material and implant manufactured according to the present invention have improved cell adhesion and antibacterial effects, thereby improving biocompatibility and minimizing inflammatory reactions of the user.