Patent classifications
C07C25/18
Process for the manufacture of fluoroaryl compounds and derivatives
The invention relates to a new process for the manufacture of fluoroaryl compounds and derivatives thereof, in particular of fluorobenzenes and derivatives thereof, and especially wherein said manufacture relates to an environmentally friendly production of the said compounds. Thus, the present invention overcomes the disadvantages of the prior art processes, and in a surprisingly simple and beneficial manner, and as compared to the prior art processes, in particular, the invention provides a more efficient and energy saving processes, and also provides a more environmentally friendly process, for the manufacture of nuclear fluorinated aromatics, and preferably of nuclear fluorinated fluorobenzenes. Accordingly, in one aspect of the invention, an industrially beneficial process for preparing fluorobenzenes from halobenzene precursors using HF to form hydrogen halide is provided by the present invention. A beneficial and surprisingly simple use of chlorobenzene as an industrially interesting starting material in the manufacture of fluorobenzene is provided.
Iodonium salt, resist composition, and pattern forming process
A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.
Iodonium salt, resist composition, and pattern forming process
A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.
ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
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ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
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NOVEL COMPOUND, AND COMPOSITION FOR FORMING HOLE TRANSPORTING LAYER FOR PEROVSKITE SOLAR CELLS
Provided are: a composition for forming a hole transporting layer for perovskite solar cells, which is inexpensive and does not need to be used together with a dopant; and a compound which can be contained in a composition for forming a hole transporting layer. A compound represented by general formula (I) (wherein Ar represents an aryl group; A represents a structure represented by formula (II); Z's independently represent a hydrogen atom, a structure represented by general formula (III), or a structure represented by formula (IV), and maybe the same as or different from each other, wherein a case where each of Z's is a hydrogen atom is excluded; Y's independently represents at least one member selected from the group mentioned below; R.sup.1 and R.sup.2 independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R.sup.1 and R.sup.2 may together form a ring having one or two oxygen atoms; ×'s independently represent an alkyl group, an alkoxy group, an alkylthio group, a monoalkylamino group or a dialkylamino group each of which may be substituted by a halogen atom; k represents 0 or 1; l represents 2 or 3; m represents an integer of 1 to 6; and r represents 1 or 2; wherein, when k is 0, 1 is 3, m is 1 and all of three bonds of A are bonded to Z.
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NOVEL COMPOUND, AND COMPOSITION FOR FORMING HOLE TRANSPORTING LAYER FOR PEROVSKITE SOLAR CELLS
Provided are: a composition for forming a hole transporting layer for perovskite solar cells, which is inexpensive and does not need to be used together with a dopant; and a compound which can be contained in a composition for forming a hole transporting layer. A compound represented by general formula (I) (wherein Ar represents an aryl group; A represents a structure represented by formula (II); Z's independently represent a hydrogen atom, a structure represented by general formula (III), or a structure represented by formula (IV), and maybe the same as or different from each other, wherein a case where each of Z's is a hydrogen atom is excluded; Y's independently represents at least one member selected from the group mentioned below; R.sup.1 and R.sup.2 independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R.sup.1 and R.sup.2 may together form a ring having one or two oxygen atoms; ×'s independently represent an alkyl group, an alkoxy group, an alkylthio group, a monoalkylamino group or a dialkylamino group each of which may be substituted by a halogen atom; k represents 0 or 1; l represents 2 or 3; m represents an integer of 1 to 6; and r represents 1 or 2; wherein, when k is 0, 1 is 3, m is 1 and all of three bonds of A are bonded to Z.
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Process For Synthesizing Fluorinated Cyclic Aliphatic Compounds
The present invention relates to a novel method for producing fluorinated cycloaliphatic compounds from the analogous aromatic compounds by hydrogenation with an Rh-carbene catalyst system.
Process For Synthesizing Fluorinated Cyclic Aliphatic Compounds
The present invention relates to a novel method for producing fluorinated cycloaliphatic compounds from the analogous aromatic compounds by hydrogenation with an Rh-carbene catalyst system.
LIQUID CRYSTAL MIXTURE AND LIQUID CRYSTAL DISPLAY
The invention relates to a compound of formula I,
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R.sup.11, R.sup.21, A.sup.11, A, Z, X.sup.11, X.sup.21, Y.sup.11, Y.sup.12, Sp.sup.11, Sp.sup.21, o and p have one of the meanings as given in claim 1. The invention further relates to method of production of a compound of formula I, to the use of said compounds in LC media and to LC media comprising one or more compounds of formula I. Further, the invention relates to a method of production of such LC media, to the use of such media in LC devices, and to LC device comprising a LC medium according to the present invention. The present invention further relates to a process for the fabrication such liquid crystal display and to the use of the liquid crystal mixtures according to the invention for the fabrication of such liquid crystal display.