The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): ##STR00001##
wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

Provided is a phenol compound represented by general formula (I), shown below. In general formula (I), R.sup.1 and R.sup.2 each indicate, independently of each other, a hydrogen atom or an alkyl group. ##STR00001##

Provided is a phenol compound represented by general formula (I), shown below. In general formula (I), R.sup.1 and R.sup.2 each indicate, independently of each other, a hydrogen atom or an alkyl group. ##STR00001##

The present embodiment provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1),

##STR00001##

wherein R.sup.1 represents a 2n-valent group having 1 to 60 carbon atoms, or a single bond, each R.sup.2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, a hydroxyl group, or a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, and may be the same or different in the same naphthalene ring or benzene ring, in which at least one R.sup.2 represents a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, n is an integer of 1 to 4, and structural formulae of n structural units in square brackets [ ] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each m.sup.2 is independently an integer of 0 to 7, provided that at least one m.sup.2 is an integer of 1 to 7, and each q is independently 0 or 1.

Provided are compounds of formulae provided herein. The compounds may include pathway-preferential estrogens (PaPEs) derivatives with tissue-selective activities. Also provided are pharmaceutical compositions comprising the compounds, as well as methods of treating a disease or condition including administering the compounds. The disease or condition may include postmenopausal symptoms, cardiovascular disease, stroke, vascular disease, bone disease, metabolic disease, arthritis, osteoporosis, obesity, vasomotor/hot flush, cognitive decline, cancer including breast cancer.

The present invention provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1),

##STR00001##

wherein R.sup.1 represents a 2n-valent group having a 1 to 60 carbon atoms, or a single bond, each R.sup.2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, or a hydroxyl group, and may be the same or different in the same naphthalene ring or benzene ring, n is an integer of 1 to 4, structural formulae of n's structural units in square brackets [ ] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each m2 is independently an integer of 0 to 7, in which at least one m.sup.2 is an integer of 1 to 7, and each q is independently 0 or 1, provided that at least one selected from the group consisting of R.sup.1 and R.sup.2 is a group having an iodine atom.

The present invention relates to novel compounds and their use in the prophylactic and/or therapeutic treatment of fibrosis and fibrosis-related conditions.

The present invention relates to novel compounds and their use in the prophylactic and/or therapeutic treatment of fibrosis and fibrosis-related conditions.

Process for reducing the water and carboxylic acid content of an alcohol composition containing at least one C.sub.1-4 alcohol, water and at least one C.sub.1-4 carboxylic acid by (a) forming a vapor phase alcohol composition A and a liquid phase alcohol composition B, (b) separating a second vapor phase alcohol composition C and an aqueous phase D from the liquid phase alcohol composition B, the aqueous phase D containing the majority of the carboxylic acid that was present in the liquid phase alcohol composition B; (c) passing the vapor phase alcohol composition A to a drying unit, (d) passing the vapor phase alcohol composition C to a drying unit; and (e) recovering an alcohol composition from the drying units of steps (c) and (d). The recovered alcohol composition of step (e) has a reduced water and carboxylic acid content.

Process for reducing the water and carboxylic acid content of an alcohol composition containing at least one C.sub.1-4 alcohol, water and at least one C.sub.1-4 carboxylic acid by (a) forming a vapor phase alcohol composition A and a liquid phase alcohol composition B, (b) separating a second vapor phase alcohol composition C and an aqueous phase D from the liquid phase alcohol composition B, the aqueous phase D containing the majority of the carboxylic acid that was present in the liquid phase alcohol composition B; (c) passing the vapor phase alcohol composition A to a drying unit, (d) passing the vapor phase alcohol composition C to a drying unit; and (e) recovering an alcohol composition from the drying units of steps (c) and (d). The recovered alcohol composition of step (e) has a reduced water and carboxylic acid content.