The invention provides novel methods for preparing indolinobenzodiazepine dimer compounds and their synthetic precursors.

The invention provides novel methods for preparing indolinobenzodiazepine dimer compounds and their synthetic precursors.

An object of the present invention is to provide a novel method for producing a fluorine-containing methylene compound. The above object can be achieved by a method for producing a compound represented by formula (1): ##STR00001##
wherein R.sup.1 represents an organic group, R.sup.A represents hydrogen or fluorine, R.sup.4a represents hydrogen or an organic group, R.sup.4b represents hydrogen or an organic group, R.sup.5a represents hydrogen or an organic group, R.sup.5b represents hydrogen or an organic group, and
R.sup.2 represents hydrogen or an organic group; R.sup.2 is optionally connected to R.sup.4a to form a ring; the method comprising step A of reacting a compound represented by formula (2): ##STR00002##
wherein X.sup.1 represents a leaving group, and other symbols are as defined above, with a compound represented by formula (3): ##STR00003##
wherein X.sup.2 represents a leaving group, and other symbols are as defined above, in the presence of a reducing agent as desired, under light irradiation.

An object of the present invention is to provide a novel method for producing a fluorine-containing methylene compound. The above object can be achieved by a method for producing a compound represented by formula (1): ##STR00001##
wherein R.sup.1 represents an organic group, R.sup.A represents hydrogen or fluorine, R.sup.4a represents hydrogen or an organic group, R.sup.4b represents hydrogen or an organic group, R.sup.5a represents hydrogen or an organic group, R.sup.5b represents hydrogen or an organic group, and
R.sup.2 represents hydrogen or an organic group; R.sup.2 is optionally connected to R.sup.4a to form a ring; the method comprising step A of reacting a compound represented by formula (2): ##STR00002##
wherein X.sup.1 represents a leaving group, and other symbols are as defined above, with a compound represented by formula (3): ##STR00003##
wherein X.sup.2 represents a leaving group, and other symbols are as defined above, in the presence of a reducing agent as desired, under light irradiation.

Provided herein are molecules and salts thereof, arrays containing molecules and salts thereof, solid supports containing molecules and salts thereof, kits containing molecules or salts thereof, and methods of determining alignment of photolithographic masks comprising molecules or salts thereof.

Provided herein are molecules and salts thereof, arrays containing molecules and salts thereof, solid supports containing molecules and salts thereof, kits containing molecules or salts thereof, and methods of determining alignment of photolithographic masks comprising molecules or salts thereof.

Provided herein are molecules and salts thereof, arrays containing molecules and salts thereof, solid supports containing molecules and salts thereof, kits containing molecules or salts thereof, and methods of determining alignment of photolithographic masks comprising molecules or salts thereof.

The fluorene derivative of the present disclosure is represented by the following formula (1):

##STR00001##

Wherein R.sup.1 represents a substituent, k denotes an integer of 0 to 8, R.sup.2a, R.sup.2b, R.sup.2c, and R.sup.2d each represent a hydrogen atom or a substituent, R.sup.3a and R.sup.3b each represent a hydrogen atom or a substituent, and X.sup.1a and X.sup.1b each represent a group defined in the following formula (X1):

##STR00002##

wherein R.sup.4 and R.sup.5 each represent a hydrogen atom or an aliphatic hydrocarbon group, provided that the case where both R.sup.4 and R.sup.5 are a hydrogen atom is excluded; or R.sup.4 and R.sup.5 bond together to form a heterocyclic ring containing the nitrogen atom adjacent to R.sup.4 and R.sup.5. The present disclosure provides a novel fluorene derivative useful as an additive for improving the properties of a resin, a method for producing the same and a use thereof.

The fluorene derivative of the present disclosure is represented by the following formula (1):

##STR00001##

Wherein R.sup.1 represents a substituent, k denotes an integer of 0 to 8, R.sup.2a, R.sup.2b, R.sup.2c, and R.sup.2d each represent a hydrogen atom or a substituent, R.sup.3a and R.sup.3b each represent a hydrogen atom or a substituent, and X.sup.1a and X.sup.1b each represent a group defined in the following formula (X1):

##STR00002##

wherein R.sup.4 and R.sup.5 each represent a hydrogen atom or an aliphatic hydrocarbon group, provided that the case where both R.sup.4 and R.sup.5 are a hydrogen atom is excluded; or R.sup.4 and R.sup.5 bond together to form a heterocyclic ring containing the nitrogen atom adjacent to R.sup.4 and R.sup.5. The present disclosure provides a novel fluorene derivative useful as an additive for improving the properties of a resin, a method for producing the same and a use thereof.

Disclosed are methods for preparing compounds of Formula 1 and 1A. The first method utilizes a benzyl carbamate amine protecting group and an intermediate of Formula 4. The second method utilizes a tert-butyl carbamate amine protecting group and an intermediate of Formula 7. The third method utilizes a dibenzyl amine protecting group. ##STR00001## Also disclosed is a compound, phenylmethyl N-[2-oxo-2-[(2,2,2-trifluoroethyl)amino]ethyl]carbamate (a compound of Formula 4). Further disclosed is a method for preparing a compound of Formula 14 from a compound of Formula 15 and a compound of Formula 1 or 1A. ##STR00002##