C07D209/56

Kit, method, and reagent for measuring measurement target substance

An object of the present invention is to provide a kit, a method, and a reagent which prevent the problem of false positive due to nonspecific adsorption, suppress the increase in noise to be generated, and are capable of achieving high-precision measurement of a measurement target substance in a wide concentration range from a low concentration to a high concentration. According to the present invention, there is provided a kit for measuring a measurement target substance, the kit including: a first particle having a label and modified with a first binding substance capable of specifically binding to a measurement target substance; a second particle having no label and modified with a second binding substance incapable of specifically binding to the measurement target substance; a flow channel for flowing the first particle and the second particle; and a substrate having a third binding substance capable of specifically binding to the measurement target substance or a substance capable of binding to the first binding substance, in which the first particle having a label is a luminescent labeled particle containing at least one kind of compound represented by Formula (1) and a particle. ##STR00001## Each symbol in Formula (1) has the meaning described in the present specification.

N-type semiconductor composition, and thin film, organic photoelectric device, image sensor, and electronic device including the same

Disclosed are an N-type semiconductor composition including fullerene or a fullerene derivative; and fullerene subunit derivative represented by Chemical Formula 1, and a thin film, an organic photoelectric device, an image sensor and an electronic device including the same. ##STR00001## In Chemical Formula 1, X, Cy and R.sup.1 to R.sup.8 are the same as defined in the detailed description.

N-type semiconductor composition, and thin film, organic photoelectric device, image sensor, and electronic device including the same

Disclosed are an N-type semiconductor composition including fullerene or a fullerene derivative; and fullerene subunit derivative represented by Chemical Formula 1, and a thin film, an organic photoelectric device, an image sensor and an electronic device including the same. ##STR00001## In Chemical Formula 1, X, Cy and R.sup.1 to R.sup.8 are the same as defined in the detailed description.

Resist composition, method of forming resist pattern, compound, and acid generator

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx.sup.1 to Rx.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry.sup.1 to Ry.sup.2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz.sup.1 to Rz.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx.sup.1 to Rx.sup.4, Ry.sup.1 to Ry.sup.2 and Rz.sup.1 to Rz.sup.4 has an anion group, M.sub.1.sup.m+ represents a sulfonium cation having a sulfonyl group, R.sup.001 to R.sup.003 each independently represent a monovalent organic group; provided that at least one of R.sup.001 to R.sup.003 is an organic group having an acid dissociable group; and M.sub.3.sup.m+ represents an m-valent organic cation having an electron-withdrawing group. ##STR00001##

Resist composition, method of forming resist pattern, compound, and acid generator

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx.sup.1 to Rx.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry.sup.1 to Ry.sup.2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz.sup.1 to Rz.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx.sup.1 to Rx.sup.4, Ry.sup.1 to Ry.sup.2 and Rz.sup.1 to Rz.sup.4 has an anion group, M.sub.1.sup.m+ represents a sulfonium cation having a sulfonyl group, R.sup.001 to R.sup.003 each independently represent a monovalent organic group; provided that at least one of R.sup.001 to R.sup.003 is an organic group having an acid dissociable group; and M.sub.3.sup.m+ represents an m-valent organic cation having an electron-withdrawing group. ##STR00001##

ANTIOXIDANT INFLAMMATION MODULATORS: OLEANOLIC ACID DERIVATIVES WITH AMINO AND OTHER MODIFICATIONS AT C-17

This invention provides, but is not limited to, novel oleanolic acid derivatives having the formula:

##STR00001##

wherein the variables are defined herein. Also provided are pharmaceutical compositions, kits and articles of manufacture comprising such compounds, methods and intermediates useful for making the compounds, and methods of using the compounds and compositions.

PLURALITY OF HOST MATERIALS AND ORGANIC ELECTROLUMINESCENT DEVICE COMPRISING THE SAME

The present disclosure relates to three different types of host materials, and an organic electroluminescent device comprising the same, and it is possible to provide an organic electroluminescent device having higher luminous efficiency and/or improved lifetime properties compared to a conventional organic electroluminescent device.

PLURALITY OF HOST MATERIALS AND ORGANIC ELECTROLUMINESCENT DEVICE COMPRISING THE SAME

The present disclosure relates to three different types of host materials, and an organic electroluminescent device comprising the same, and it is possible to provide an organic electroluminescent device having higher luminous efficiency and/or improved lifetime properties compared to a conventional organic electroluminescent device.

AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

A resist composition comprising a quencher in the form of an amine compound having a highly polar lactone or sultone ring and an acid labile group in a common molecule is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

A resist composition comprising a quencher in the form of an amine compound having a highly polar lactone or sultone ring and an acid labile group in a common molecule is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.