The present invention provides screening methods for identifying modifiers of chemosensory receptors and their ligands, e.g., by determining whether a test entity is suitable to interact with one or more interacting sites within the Venus flytrap domains of the chemosensory receptors as well as modifiers capable of modulating chemosensory receptors and their ligands.

The present disclosure provides new materials that combine the advantages of well-defined polymeric starting materials and the convenience of surface modification by physical methods into one package and, thus, offers a general and powerful platform suitable for use in numerous applications.

An electrode active material has a high energy density, high output, and a superior cycle property with little decrease in capacity even after repeated charge and discharge. An electrode and a secondary battery can include the electrode active material. An electrode active material which contains a compound having a dithiadiazine group, and is used as an active material of a secondary battery that repeats charge and discharge by a battery electrode reaction, and electrode containing the electrode active material and a conductive material. In addition, a secondary battery wherein the electrode active material is contained in any one of a reaction starting material, a product, and an intermediate product of at least a discharge reaction of the battery electrode reaction.

An electrode active material has a high energy density, high output, and a superior cycle property with little decrease in capacity even after repeated charge and discharge. An electrode and a secondary battery can include the electrode active material. An electrode active material which contains a compound having a dithiadiazine group, and is used as an active material of a secondary battery that repeats charge and discharge by a battery electrode reaction, and electrode containing the electrode active material and a conductive material. In addition, a secondary battery wherein the electrode active material is contained in any one of a reaction starting material, a product, and an intermediate product of at least a discharge reaction of the battery electrode reaction.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent LWR performance can be obtained, a resist film, a pattern forming method, a method for manufacturing an electronic device, a compound, and a method for producing the compound. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including a resin having a repeating unit having a group having a polarity that increases through decomposition by the action of an acid, in which the actinic ray-sensitive or radiation-sensitive resin composition further includes, in addition to the resin, a compound having at least one cation represented by General Formula (1), or the resin further has, in addition to the repeating unit, a repeating unit having the cation represented by General Formula (1).
(R.sup.d1).sub.m[X.sup.d1].sup.+-(L.sup.d1-Ar.sup.d1(SX.sup.d2).sub.p).sub.n (1)

Compounds of structure (I) are described wherein, R.sub.1, R.sub.2, R.sub.1a and R.sub.2a are independently selected from H, nitro, cyano, and an alkylsulfonyl, wherein at least two of R.sub.1, R.sub.2, R.sub.1a and R.sub.2a are independently selected from nitro, cyano, and an alkylsulfonyl, and X is not a halide, tosylate, trifluoromethylsulfonate, tetrafluoroborate, an aryl-substituted borates, hexafluorophosphate, hexafluoroarsenate, acetate, trifluoroacetate, methane sulfonate, C-2 to C-20 linear unsubstituted alkyl sulfonates, naphthalenesulfonate, and camphorsulfonate. Also described are EUV negative and positive chemically amplified photoresist compostions containing said compound and the process of using these photoresist to pattern a substrate.

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent ##STR00001##

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent ##STR00001##