C07D339/08

γ-diketones as Wnt/β-catenin signaling pathway activators

The present disclosure provides γ-diketones or analogs thereof, that activate Wnt/β-catenin signaling and thus treat or prevent diseases related to signal transduction, such as osteoporosis and osteoarthropathy; osteogenesis imperfecta, bone defects, bone fractures, periodontal disease, otosclerosis, wound healing, craniofacial defects, oncolytic bone disease, traumatic brain injuries or spine injuries, brain atrophy/neurological disorders related to the differentiation and development of the central nervous system, including Parkinson's disease, strokes, ischemic cerebral disease, epilepsy, Alzheimer's disease, depression, bipolar disorder, schizophrenia; otic disorders like cochlear hair cell loss; eye diseases such as age related macular degeneration, diabetic macular edema or retinitis pigmentosa and diseases related to differentiation and growth of stem cell, such as hair loss, hematopoiesis related diseases and tissue regeneration related diseases.

Polymerizable compound and optically anisotropic object

The present invention aims to provide a polymerizable compound that has high storage stability without causing crystal precipitation when added to a polymerizable composition and to provide a polymerizable composition containing the polymerizable compound. A polymer film produced by polymerization of the polymerizable composition has a low haze, high thickness uniformity, low occurrence of nonuniform orientation, high surface hardness, high adhesiveness, and good appearances and fewer orientation defects even after ultraviolet irradiation. The present invention also aims to provide a polymer produced by polymerization of the polymerizable composition and an optically anisotropic body produced from the polymer.

Polymerizable compound and optically anisotropic object

The present invention aims to provide a polymerizable compound that has high storage stability without causing crystal precipitation when added to a polymerizable composition and to provide a polymerizable composition containing the polymerizable compound. A polymer film produced by polymerization of the polymerizable composition has a low haze, high thickness uniformity, low occurrence of nonuniform orientation, high surface hardness, high adhesiveness, and good appearances and fewer orientation defects even after ultraviolet irradiation. The present invention also aims to provide a polymer produced by polymerization of the polymerizable composition and an optically anisotropic body produced from the polymer.

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion ##STR00001##

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

A resist composition including a compound represented by formula (b1) in which R.sup.b1 represents an aryl group which may have a substituent; R.sup.b2 and R.sup.b3 each independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a halogen atom, and at least one of the aryl group represented by R.sup.b1 and the aryl group or the alkyl group represented by R.sup.b2 or R.sup.b3 has a substituent containing a sulfonyl group; and X.sup.− represents a counteranion ##STR00001##

Chiral imidodiphosphates and derivatives thereof

The invention relates to chiral imidodiphosphates and derivatives thereof having the general formula I, ##STR00001## The compounds are suitable as chiral Brønsted acid catalysts, phase-transfer catalysts, chiral anions for organic salts, metal salts or metal complexes for catalysis.

Chiral imidodiphosphates and derivatives thereof

The invention relates to chiral imidodiphosphates and derivatives thereof having the general formula I, ##STR00001## The compounds are suitable as chiral Brønsted acid catalysts, phase-transfer catalysts, chiral anions for organic salts, metal salts or metal complexes for catalysis.

POLYCYCLIC PHOTOINITIATORS
20170240755 · 2017-08-24 ·

Compounds of the formula (I) (I), wherein X is O, S, a direct bond or CR.sub.16R.sub.17; Y is O or S; R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 for example are hydrogen, halogen, C.sub.1-C.sub.4alkyl, or a group of formula (II) or (III) (II) (III) provided that either (i) one of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 or R.sub.8 is a group of formula (II) or (III); or (ii) one of R.sub.1, R.sub.2, R.sub.3 Or R.sub.4 is a group of formula (II) or (III) and one of R.sub.5, R.sub.6, R.sub.7 or R.sub.8 is a group of formula (II) or (III); R.sub.9 and R.sub.10 independently of each other are C.sub.1-C.sub.4alkyl or together with the C atom to which they are attached form a 5-membered, 6-membered or 7-membered carbocyclic ring; R.sub.11 is hydrogen, C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7cycloalkyl, 2-tetrahydropyranyl or Si(C.sub.1-C.sub.4alkyl).sub.3; R.sub.12 and R.sub.13 for example are C.sub.1-C.sub.4alkyl, C.sub.2-C.sub.2alkenyl, phenyl-C.sub.1-C.sub.4alkyl, phenyl-C.sub.1-C.sub.4alkyl which is substituted by C.sub.1-C.sub.4alkyl, R.sub.14 and R.sub.15 independently of each other are C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7cycloalkyl, or together with the N atom to which they are attached form a 5-membered, 6-membered or 7-membered ring, which may contain additional heteroatoms O, S or N; R.sub.16 and R.sub.17 for example are hydrogen, C.sub.1-C.sub.5alkyl, C.sub.5-C.sub.7cycloalkyl, phenyl-C.sub.1-C.sub.4alkyl, phenyl; are effective photoinitiators.

##STR00001##

POLYCYCLIC PHOTOINITIATORS
20170240755 · 2017-08-24 ·

Compounds of the formula (I) (I), wherein X is O, S, a direct bond or CR.sub.16R.sub.17; Y is O or S; R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 for example are hydrogen, halogen, C.sub.1-C.sub.4alkyl, or a group of formula (II) or (III) (II) (III) provided that either (i) one of R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 or R.sub.8 is a group of formula (II) or (III); or (ii) one of R.sub.1, R.sub.2, R.sub.3 Or R.sub.4 is a group of formula (II) or (III) and one of R.sub.5, R.sub.6, R.sub.7 or R.sub.8 is a group of formula (II) or (III); R.sub.9 and R.sub.10 independently of each other are C.sub.1-C.sub.4alkyl or together with the C atom to which they are attached form a 5-membered, 6-membered or 7-membered carbocyclic ring; R.sub.11 is hydrogen, C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7cycloalkyl, 2-tetrahydropyranyl or Si(C.sub.1-C.sub.4alkyl).sub.3; R.sub.12 and R.sub.13 for example are C.sub.1-C.sub.4alkyl, C.sub.2-C.sub.2alkenyl, phenyl-C.sub.1-C.sub.4alkyl, phenyl-C.sub.1-C.sub.4alkyl which is substituted by C.sub.1-C.sub.4alkyl, R.sub.14 and R.sub.15 independently of each other are C.sub.1-C.sub.4alkyl, C.sub.5-C.sub.7cycloalkyl, or together with the N atom to which they are attached form a 5-membered, 6-membered or 7-membered ring, which may contain additional heteroatoms O, S or N; R.sub.16 and R.sub.17 for example are hydrogen, C.sub.1-C.sub.5alkyl, C.sub.5-C.sub.7cycloalkyl, phenyl-C.sub.1-C.sub.4alkyl, phenyl; are effective photoinitiators.

##STR00001##

Salt, quencher, resist composition and method for producing resist pattern

A salt represented by formula (I), a quencher, and a resist composition including the same: ##STR00001## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, —CH.sub.2— included in the hydrocarbon group may be replaced by —O— or —CO—; and m1, m2, m3 and m4 represent an integer of 0 to 4. When m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other. When m2 is 2 or more, a plurality of R.sup.2 may be the same or different from each other. When m3 is 2 or more, a plurality of R.sup.3 may be the same or different from each other. When m4 is 2 or more, a plurality of R.sup.4 may be the same or different from each other.