Patent classifications
C07D339/08
Salt, quencher, resist composition and method for producing resist pattern
A salt represented by formula (I), a quencher, and a resist composition including the same: ##STR00001## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each represent a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, —CH.sub.2— included in the hydrocarbon group may be replaced by —O— or —CO—; and m1, m2, m3 and m4 represent an integer of 0 to 4. When m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other. When m2 is 2 or more, a plurality of R.sup.2 may be the same or different from each other. When m3 is 2 or more, a plurality of R.sup.3 may be the same or different from each other. When m4 is 2 or more, a plurality of R.sup.4 may be the same or different from each other.
Preparation method for polythiol having improved storage stability
According to one embodiment, in producing polythiols in a manner similar to a conventional method, a polythiol having improved storage stability may be produced in a convenient manner by adjusting reaction conditions so as to prevent thiourea from remaining within products. In particular, the equivalent weight of thiourea to be used in a reaction may be adjusted to a predetermined range, thereby reducing the amount of unreacted thiourea, and thiourea may be removed once more in a sub sequent process, thereby effectively removing remaining thiourea while achieving a high yield. The polythiol thus produced does not contain residual thiourea, and thus does not show discoloration or cloudiness caused by precipitates even under prolonged storage or high-temperature conditions.
Preparation method for polythiol having improved storage stability
According to one embodiment, in producing polythiols in a manner similar to a conventional method, a polythiol having improved storage stability may be produced in a convenient manner by adjusting reaction conditions so as to prevent thiourea from remaining within products. In particular, the equivalent weight of thiourea to be used in a reaction may be adjusted to a predetermined range, thereby reducing the amount of unreacted thiourea, and thiourea may be removed once more in a sub sequent process, thereby effectively removing remaining thiourea while achieving a high yield. The polythiol thus produced does not contain residual thiourea, and thus does not show discoloration or cloudiness caused by precipitates even under prolonged storage or high-temperature conditions.
LOW MOLECULAR WEIGHT MODULATORS OF THE COLD MENTHOL RECEPTOR TRPM8 AND USE THEREOF
The invention relates to new types of modulators of the cold menthol receptor TRPM8, to methods of modulating the TRPM8 receptor using these modulators; and in particular the use of the modulators for inducing a sensation of coldness; and also the articles and compositions produced using these modulators.
LOW MOLECULAR WEIGHT MODULATORS OF THE COLD MENTHOL RECEPTOR TRPM8 AND USE THEREOF
The invention relates to new types of modulators of the cold menthol receptor TRPM8, to methods of modulating the TRPM8 receptor using these modulators; and in particular the use of the modulators for inducing a sensation of coldness; and also the articles and compositions produced using these modulators.
Salt, acid generator, resist composition and method for producing resist pattern
A salt having a group represented by formula (a): ##STR00001## wherein X.sup.a and X.sup.b each independently represent an oxygen atom or a sulfur atom, X.sup.1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.
Salt, acid generator, resist composition and method for producing resist pattern
A salt having a group represented by formula (a): ##STR00001## wherein X.sup.a and X.sup.b each independently represent an oxygen atom or a sulfur atom, X.sup.1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.
PHENOL DERIVATIVE, AND PREPARATION PROCESS AND USE THEREOF
A phenol derivative of the present invention has a structure as represented by the formula (I):
##STR00001##
The functional groups are defined in the description. The phenol derivative can be used as the antioxidant in lubricating oil, lubricating grease, plastic, rubber, or can be used as the base oil of the lubricating oil and the lubricating grease and the antiwear additive of the lubricating oil and the lubricating grease.
PHENOL DERIVATIVE, AND PREPARATION PROCESS AND USE THEREOF
A phenol derivative of the present invention has a structure as represented by the formula (I):
##STR00001##
The functional groups are defined in the description. The phenol derivative can be used as the antioxidant in lubricating oil, lubricating grease, plastic, rubber, or can be used as the base oil of the lubricating oil and the lubricating grease and the antiwear additive of the lubricating oil and the lubricating grease.
ACYLOXY SUBSTITUTED PHENYL DITHIANE DERIVATIVES
Para-acyl substituted diazacyclohexenes, medical formulations thereof and methods for making and using the same.