Patent classifications
C07F7/02
COMPOSITION, PHOTOELECTRIC CONVERSION ELEMENT, AND IMAGING DEVICE
A composition contains a naphthalocyanine derivative represented by the following formula:
##STR00001##
where R.sub.1 to R.sub.8 are independently an alkyl group and R.sub.9 to R.sub.12 are independently an aryl group, and at least one hydrogen atom in at least one selected from the group consisting of R.sub.9, R.sub.10, R.sub.11, and R.sub.12 is substituted by an electron-withdrawing group.
PRECURSORS AND METHODS FOR PREPARING SILICON-CONTAINING FILMS
Provided are certain liquid silicon precursors useful for the deposition of silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, silicon carbide, carbon-doped silicon nitride, or carbon-doped silicon oxynitride. Also provided are methods for forming such films utilizing vapor deposition techniques.
Tris(disilanyl)amine
A method for making tris(disilanyl)amine. The method comprises steps of: (a) contacting a disilanyl(alkyl)amine with ammonia to make bis(disilanyl)amine; and (b) allowing bis(disilanyl)amine to produce tris(disilanyl)amine and ammonia.
CYCLIC SILOXANES, COMPOSITIONS, METHODS, AND ARTICLES
A cyclic siloxane compound, composition, method, and an article including the siloxane, wherein the cyclic siloxane has the following Formula (I): wherein: each R.sup.1 and R.sup.2 is independently a (C1-C4)alkyl; each L.sup.1 and L.sup.2 is independently a single bond, an alkylene, or an alkylene bonded to a group selected from oxy, thio, carbonyl, —NH—, and combinations thereof; each R3 is independently a linear (C14-C100)alkyl; each R4 is independently a (C1-C30)alkyl, a (C2-C30)heteroalkyl having at least one oxygen, sulfur, or —NH— group, or a (C1-C30)alkyl substituted with a fluoro, thiol, isocyanato, cyanato, hydroxyl, glycidoxy, or epoxy group; with the proviso that L.sup.1, L2, and R.sup.4 are selected such that each Si atom is directly bonded to an alkylene or an alkyl; m is an integer of at least 2; n is an integer of 0 or above; m+n is an integer of at least 3; and the cyclic siloxane compound is a solid at 25° C.
CYCLIC SILOXANES, COMPOSITIONS, METHODS, AND ARTICLES
A cyclic siloxane compound, composition, method, and an article including the siloxane, wherein the cyclic siloxane has the following Formula (I): wherein: each R.sup.1 and R.sup.2 is independently a (C1-C4)alkyl; each L.sup.1 and L.sup.2 is independently a single bond, an alkylene, or an alkylene bonded to a group selected from oxy, thio, carbonyl, —NH—, and combinations thereof; each R3 is independently a linear (C14-C100)alkyl; each R4 is independently a (C1-C30)alkyl, a (C2-C30)heteroalkyl having at least one oxygen, sulfur, or —NH— group, or a (C1-C30)alkyl substituted with a fluoro, thiol, isocyanato, cyanato, hydroxyl, glycidoxy, or epoxy group; with the proviso that L.sup.1, L2, and R.sup.4 are selected such that each Si atom is directly bonded to an alkylene or an alkyl; m is an integer of at least 2; n is an integer of 0 or above; m+n is an integer of at least 3; and the cyclic siloxane compound is a solid at 25° C.
Si-containing film forming precursors and methods of using the same
Methods for halogenation of a hydrosilazane include contacting the hydrosilazane with a halogenating agent in a liquid phase to produce the halosilazane having a formula
(SiH.sub.a(NR.sub.2).sub.bX.sub.c).sub.(n+2)N.sub.n(SiH.sub.(2−d)X.sub.d).sub.(n−1),
wherein each a, b, c is independently 0 to 3; a+b+c=3; d is 0 to 2 and n≥1; wherein X is selected from a halogen atom selected from F, Cl, Br or I; each R is selected from H, a C.sub.1-C.sub.6 linear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR′.sub.3]; further wherein each R′ of the [SiR′.sub.3] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C.sub.1-C.sub.4 saturated or unsaturated hydrocarbyl group, a C.sub.1-C.sub.4 saturated or unsaturated alkoxy group, or an amino group [—NR.sup.1R.sup.2] with each R.sup.1 and R.sup.2 being further selected from H or a C.sub.1-C.sub.6 linear or branched, saturated or unsaturated hydrocarbyl group.
Biocompatible siloxanes for formulation of microorganisms
Compositions containing at least one siloxane and at least one active microbiological ingredient are useful for the treatment of plants, of seeds or of soils, as biostimulant or as probiotic food supplement or animal feed additive, or as probiotic medicament. In addition, the siloxane improves the storage stability of an active microbiological ingredient.
Triphenylene-based materials for organic electroluminescent devices
The present invention relates to compounds of the formula (1) and (2) which are suitable for use in electro¬nic devices, in particular organic electroluminescent devices.
Bifunctional absorptive material capable of absorbing both cations and anions in aqueous phase
This present invention discloses a bifunctional adsorptive material capable of adsorbing both cations and anions in aqueous phase, obtainable by synthesizing aluminum ion doped SBA-15 molecular sieves from P123 triblock copolymers, tetraethoxysilane, and aluminum isopropoxide to obtain multiple cationic active adsorption sites, and by grafting large sterically hindered organic groups onto the surface of Al-SBA-15 to obtain multiple anionic active adsorption sites. This kind of adsorptive material has two types of adsorption sites for ions of opposite charges. The large sterically hindered organic groups prevent spontaneous recombination reaction between the two types of adsorption sites, enabling the adsorptive material to have excellent adsorption capacity for wastewater treatment involving both cations and anions.
N-alkyl substituted cyclic and oligomeric perhydridosilazanes, methods of preparation thereof, and silicon nitride films formed therefrom
Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.