A cyclopentadienyl nickel complex compound represented by a formula (I): Ni(R.sup.1.sub.nC.sub.5H.sub.5-n).sub.2 (I), where R.sup.1 is each independently a C1-4 alkyl group, and n is 2, 3, or 4.

Mixed metal metal-organic frameworks (MM-MOFs) of copper-1,3,5-benzenetricarboxylate (BTC), M—Cu-BTC, wherein M is Zn(II), Ni(II), Co(II), and/or Fe(II) may be made using post-synthetic exchange (PSE) with metal ions. Such MM-MOFs may be used in H.sub.2 storage, especially Ni(II) and Co(II) MM-MOFs. Selected metal exchanged materials can provide gravimetric H.sub.2 uptake around 1.63 wt. % for Zn—Cu-BTC, around 1.61 wt. % for Ni—Cu-BTC, around 1.63 wt. % for Fe—Cu-BTC, and around 1.12 wt. % for Co—Cu-BTC.

Mixed metal metal-organic frameworks (MM-MOFs) of copper-1,3,5-benzenetricarboxylate (BTC), M—Cu-BTC, wherein M is Zn(II), Ni(II), Co(II), and/or Fe(II) may be made using post-synthetic exchange (PSE) with metal ions. Such MM-MOFs may be used in H.sub.2 storage, especially Ni(II) and Co(II) MM-MOFs. Selected metal exchanged materials can provide gravimetric H.sub.2 uptake around 1.63 wt. % for Zn—Cu-BTC, around 1.61 wt. % for Ni—Cu-BTC, around 1.63 wt. % for Fe—Cu-BTC, and around 1.12 wt. % for Co—Cu-BTC.

Provided is an ionic solid having pores for incorporating a substance therein.

Provided is an ionic solid having pores for incorporating a substance therein.

This disclosure relates to tertiary amine solutions of metal precursors used for chemical vapor deposition or atomic layer deposition. The tertiary amine solutions have many advantages. They dissolve high concentrations of non-polar precursors without reacting with them. They do not supply impurities such as oxygen or halogens to the material being produced, nor do they etch or corrode them. Vaporization rates can be chosen so that the solute and solvent may be evaporated simultaneously, have high flash points, and low flammability. Small droplets may be formed easily which facilitate rapid evaporation without decomposition of he dissolved metal precursor to supply vapors for chemical vapor deposition or atomic layer deposition processes.

To provide a method for producing an amidinate metal complex which is represented by [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM in cost saving and simple manner.

A method for producing an amidinate metal complex represented by [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM including: a first step in which R.sup.3X is reacted with a metal Li in a solvent to obtain R.sup.3Li solution with LiX suspended therein; a second step in which the R.sup.3Li solution with LiX existing therein is reacted with R.sup.1—N═C═N—R.sup.2 to obtain a [R.sup.1—N—C(R.sup.3)—N—R.sup.2]Li solution with the LiX suspended therein; a third step in which the [R.sup.1—N—C(R.sup.3)—N—R.sup.2]Li solution with the LiX existing therein is reacted with MX to obtain an amidinate metal complex solution, represented by the [R.sup.1—N—C(R.sup.3)—N—R.sup.2]nM, with the LiX suspended therein; and a fourth step for removing the LiX in the solution obtained by the third step.

A pyrazole metal complex for absorption of carbon dioxide, a method for preparing the pyrazole metal complex, and a method for absorbing carbon dioxide are provided; wherein the product produced by reacting pyrazole metal complex and carbon dioxide may be transformed into several economically valuable compounds.

The present invention relates to a metal-organic framework and an energy storage system having the same, and more specifically, to an energy storage system that is capable of providing excellent electrical conductivity and electrochemical capacity properties, especially excellent electrochemical performance at low temperatures, by means of a novel one-dimensional metal-organic framework having thianthrene-based organic ligands.

The present invention relates to particles of a compound of formula M (I), wherein M is selected from Ni, Pd and Pt, X.sup.1 and X.sup.2 are each independently of each other sulfur or oxygen, R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently selected from an unsubstituted, or substituted al- kyl group, an unsubstituted, or substituted cycloalkyl group, an unsubstituted or substi- tuted aryl group and an unsubstituted or substituted heteroaryl group, wherein the particles have a median particle size (D.sub.50) in the range of from 30 nm to 90 nm, preferably from 40 nm to 80 nm, more preferably 50 to 70 nm with D10 being greater than 20 nm, especially greater than 25 nm, very especially greater than 30 nm, their use as almost colourless IR absorbers, for optical filter applications, especially for plasma display panels, or for laser welding of plastics. The compounds may be used in compositions for inks, paints and plastics, especially in a wide variety of printing systems and are particularly well-suited for security applications.