Patent classifications
C08F132/08
Fast photocurable polycycloolefin compositions as optical or 3D printing materials
Embodiments in accordance with the present invention encompass compositions encompassing a procatalyst, a photoacid generator, a photosensitizer and one or more monomers which undergo vinyl addition polymerization when said composition is exposed to suitable UV irradiation and heated to a temperature from 50° C. to 100° C. to form a substantially transparent film. The monomers employed therein have a range of refractive index from 1.4 to 1.6 and thus these compositions can be tailored to form transparent films of varied refractive indices. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as coatings, encapsulants, fillers, leveling agents, among others.
Dual UV blockers containing stable photoactive mass polymerizable polycycloolefin compositions as optical materials
Embodiments in accordance with the present invention encompass compositions encompassing a latent organo-ruthenium compound, a photosensitizer, one or more monomers which undergo ring open metathesis polymerization (ROMP) and at least two distinct types of UV blockers, where when said composition is exposed to suitable actinic radiation forms a substantially transparent film or a three dimensional object. Surprisingly, the compositions are very stable at ambient conditions to temperatures up to 80° C. for several weeks and undergo mass polymerization only when subjected to actinic radiation under inert atmosphere such as for example a blanket of nitrogen. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as 3D printing materials, coatings, encapsulants, fillers, leveling agents, among others.
Dual UV blockers containing stable photoactive mass polymerizable polycycloolefin compositions as optical materials
Embodiments in accordance with the present invention encompass compositions encompassing a latent organo-ruthenium compound, a photosensitizer, one or more monomers which undergo ring open metathesis polymerization (ROMP) and at least two distinct types of UV blockers, where when said composition is exposed to suitable actinic radiation forms a substantially transparent film or a three dimensional object. Surprisingly, the compositions are very stable at ambient conditions to temperatures up to 80° C. for several weeks and undergo mass polymerization only when subjected to actinic radiation under inert atmosphere such as for example a blanket of nitrogen. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as 3D printing materials, coatings, encapsulants, fillers, leveling agents, among others.
Highly efficient synthesis of Z-macrocycles using stereoretentive, ruthenium-based metathesis catalysts
A highly efficient, Z-selective ring-closing metathesis system for the formation of macrocycles using a stereoretentive, ruthenium-based catalyst supported by a dithiolate ligand is reported. This catalyst is demonstrated to be remarkably active as observed in initiation experiments showing complete catalyst initiation at −20° C. within 10 min. Using easily accessible diene starting materials bearing a Z-olefin moiety, macrocyclization reactions generated products with significantly higher Z-selectivity in appreciably shorter reaction times, in higher yield, and with much lower catalyst loadings than in previously reported systems. Macrocyclic lactones ranging in size from twelve-membered to seventeen-membered rings are synthesized in moderate to high yields (68-79% yield) with excellent Z-selectivity (95%-99% Z).
Hydrogenated cyclic polymer, method of producing same, and resin composition
Provided is a hydrogenated product of a cyclic polymer including a cyclic chain that includes a repeating unit of a ring-opened cycloolefin.
Hydrogenated cyclic polymer, method of producing same, and resin composition
Provided is a hydrogenated product of a cyclic polymer including a cyclic chain that includes a repeating unit of a ring-opened cycloolefin.
Circularly Recyclable Polymers Featuring Topochemically Elongated Carbon-Carbon Bonds
A topochemical approach for creating elongated C—C bonds with a bond length of 1.57˜1.70 Å between monomers in the solid state; and topochemically prepared highly crystalline polymers.
Circularly Recyclable Polymers Featuring Topochemically Elongated Carbon-Carbon Bonds
A topochemical approach for creating elongated C—C bonds with a bond length of 1.57˜1.70 Å between monomers in the solid state; and topochemically prepared highly crystalline polymers.
STABLE MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS AS 3D PRINTING MATERIALS AND A METHOD OF FABRICATION THEREOF
Embodiments in accordance with the present invention encompass compositions encompassing a latent organo-ruthenium compound, a pyridine compound, a photosensitizer and an ultra violet light blocking compound along with one or more monomers which undergo ring open metathesis polymerization (ROMP) when said composition is exposed to suitable actinic radiation to form a substantially transparent film or a three dimensional object. Surprisingly, the compositions are very stable at ambient conditions to temperatures up to 80° C. for several days and undergo mass polymerization only when subjected to actinic radiation under inert atmosphere such as for example a blanket of nitrogen. Accordingly, compositions of this invention are useful in various opto-electronic applications, including as 3D printing materials, coatings, encapsulants, fillers, leveling agents, among others.
Pneumatic tire
The present invention is directed to a pneumatic tire having a tread comprising a vulcanizable rubber composition comprising, based on 100 parts by weight of elastomer (phr), (A) 100 phr of a solution polymerized styrene-butadiene rubber having a glass transition temperature (Tg) ranging from −85° C. to −50° C.; (B) from 1 to 30 phr of a process oil; (C) from 20 to 80 phr of a hydrocarbon resin having a Tg of at least 30° C.; and (D) from 90 to 150 phr of silica.