The invention relates to the use of special polymer layers as barriers, in particular as barrier layers in composite materials. Suitable polymers for the polymer layer are copolymers consisting of ethylene and vinyl alcohol or consisting of ethylene and carbon monoxide or consisting of ethylene and carbon monoxide and propylene. These barrier layers exhibit a selective barrier effect with respect to different gases, the barrier effect being especially effective with respect to HFOs. On account of these properties, such barrier layers can positively affect insulating properties, for example in thermally insulated pipes.

The invention relates to the use of special polymer layers as barriers, in particular as barrier layers in composite materials. Suitable polymers for the polymer layer are copolymers consisting of ethylene and vinyl alcohol or consisting of ethylene and carbon monoxide or consisting of ethylene and carbon monoxide and propylene. These barrier layers exhibit a selective barrier effect with respect to different gases, the barrier effect being especially effective with respect to HFOs. On account of these properties, such barrier layers can positively affect insulating properties, for example in thermally insulated pipes.

A waterborne one-component coating composition capable of self-crosslinking and exhibiting a gloss and hardness improvement when cured that is similar to a solventborne two-component composition. The composition includes a urethane phase including a polyurethane polymer with at least polyester diol monomer units, polycarbonate diol monomer units, and ketone-functionalized diol monomer units. The composition may include an optional acrylic phase including an acrylic polymer having monomer units selected from one of alkyl (meth)acrylate monomer units, vinyl acetate monomer units, styrene monomer units, ketone-functional vinyl monomer units, or combinations thereof. The composition includes a hydrazine-functionalized crosslinking agent configured to crosslink one of the ketone-functionalized diol monomer units, the ketone-functional vinyl monomer units, or both. The composition further includes one or more tertiary amine reaction moderators or neutralizing agents.

A waterborne one-component coating composition capable of self-crosslinking and exhibiting a gloss and hardness improvement when cured that is similar to a solventborne two-component composition. The composition includes a urethane phase including a polyurethane polymer with at least polyester diol monomer units, polycarbonate diol monomer units, and ketone-functionalized diol monomer units. The composition may include an optional acrylic phase including an acrylic polymer having monomer units selected from one of alkyl (meth)acrylate monomer units, vinyl acetate monomer units, styrene monomer units, ketone-functional vinyl monomer units, or combinations thereof. The composition includes a hydrazine-functionalized crosslinking agent configured to crosslink one of the ketone-functionalized diol monomer units, the ketone-functional vinyl monomer units, or both. The composition further includes one or more tertiary amine reaction moderators or neutralizing agents.

A manufacturing method of a liquid crystal display panel and a liquid crystal medium composition are provided. A photoinitiator and flexible branched chains-containing active monomers are added into the liquid crystal material, and a special process condition is used. Thus, a traditional alignment film process can be omitted, and liquid crystal alignment is accomplished. Furthermore, impurity ions are prevented from diffusing into a liquid crystal layer, and quality of the liquid crystal display panel is greatly enhanced.

In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

The present disclosure relates to a resin that includes a first repeat unit as defined by Structure (I) ##STR00001##
where A is either a methyl group or a hydrogen atom, R.sup.1 is a first bridging group, and is a covalent bond.

The present disclosure relates to a resin that includes a first repeat unit as defined by Structure (I) ##STR00001##
where A is either a methyl group or a hydrogen atom, R.sup.1 is a first bridging group, and is a covalent bond.

The present disclosure relates to a resin that includes a first repeat unit as defined by Structure (I) ##STR00001##
where A is either a methyl group or a hydrogen atom, R.sup.1 is a first bridging group, and is a covalent bond.