In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

An unsaturated deoxybenzoin compound has the structure (I) ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, and n are defined herein. A polymer including at least one group derived from a deoxybenzoin compound having structure (I), (II), or a combination thereof ##STR00002##
is also described, wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, and n are defined herein.

An unsaturated deoxybenzoin compound has the structure (I) ##STR00001##
wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, and n are defined herein. A polymer including at least one group derived from a deoxybenzoin compound having structure (I), (II), or a combination thereof ##STR00002##
is also described, wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, and n are defined herein.

Curable adhesive compositions are provided that can be cured using ultraviolet or visible light radiation. These curable adhesive compositions, which contain a curable (meth)acrylate copolymer, have a creep compliance that is less than 5(10.sup.4) inverse Pascals at 25 C., a creep compliance that is greater than 1(10.sup.3) inverse Pascals at 70 C., and a shear storage modulus greater than 40 kiloPascals when measured at 25 C. at a frequency of 1 radian/second.

Curable adhesive compositions are provided that can be cured using ultraviolet or visible light radiation. These curable adhesive compositions, which contain a curable (meth)acrylate copolymer, have a creep compliance that is less than 5(10.sup.4) inverse Pascals at 25 C., a creep compliance that is greater than 1(10.sup.3) inverse Pascals at 70 C., and a shear storage modulus greater than 40 kiloPascals when measured at 25 C. at a frequency of 1 radian/second.

The present invention relates to a polymer composition which contains (A) a photosensitive side-chain polymer that exhibits liquid crystallinity in a predetermined temperature range and has a repeating unit comprising a vertically aligning group, and (B) an organic solvent. The present invention provides: a liquid crystal alignment film which has excellent tilt angle characteristics, while being provided with alignment controllability with high efficiency; a polymer composition which enables the achievement of this liquid crystal alignment film; a twisted nematic liquid crystal display element; and a vertical field switching mode liquid crystal display element.

Acido-basic properties of a system containing a polymer obtained by decomposing by oxidative cleavage of a carbon-carbon double bond, and a trifunctional molecule having an alkoxysilyl group in the structure as represented by the formula (A) are changed such that the system is changed into a basic system when the system is acidic and the system is changed into an acidic system when the system is basic to combine the decomposed polymer and the trifunctional molecule, thereby introducing the alkoxysilyl group into the main chain. Furthermore, acido-basic properties of a system containing a polymer obtained by decomposing by oxidative cleavage of a carbon-carbon double bond to decrease the molecular weight, and a functional molecule having an alkoxysilyl group as represented by the formula (a) are changed in the same manner as above to combine the decomposed polymer and the functional molecule, thereby introducing the alkoxysilyl group in a molecular terminal. ##STR00001##