The present invention relates to an amorphous polyolefinic ionomer and a process for the preparation of an amorphous polyolefinic ionomer.

The present invention relates to an amorphous polyolefinic ionomer and a process for the preparation of an amorphous polyolefinic ionomer.

The present invention relates to an ethylene and propylene ionomer and a process for the preparation of an ethylene and propylene ionomer.

The present invention relates to an ethylene and propylene ionomer and a process for the preparation of an ethylene and propylene ionomer.

The present invention relates to a process for the manufacture of a functionalized ethylene and propylene copolymer composition. The invention further relates to such functionalized ethylene and propylene copolymer composition.

The present invention relates to a process for the manufacture of a functionalized ethylene and propylene copolymer composition. The invention further relates to such functionalized ethylene and propylene copolymer composition.

An object of the present invention is to provide an underlayer film-forming composition capable of forming an underlayer film which remains with a high proportion in an organic solvent, has a low UV reflectivity, and is excellent in etching resistance. The present invention relates to an underlayer film-forming composition, which contains a copolymer and an organic solvent and is used for patterning, wherein the copolymer contains: (a) a unit derived from a sugar derivative; (b) a unit derived from a compound having a light antireflection function; and (c) a unit derived from a compound capable of cross-coupling the copolymer, the unit derived from a sugar derivative (a) is at least one selected from a unit derived from a pentose derivative and a unit derived from a hexose derivative, and the underlayer film-forming composition is used for metal introduction.

The present invention relates to an ethylene copolymer obtained by radical polymerisation through a high-pressure process comprising (i) 78.0 and 99.99 mole % of recurring units derived from ethylene; (it) 0.01 and 22.0 mole % of recurring units derived from comonomer A according to Formula (I), wherein R1 is composed of a saturated aliphatic moiety comprising 5-40 carbon atoms or R1 is composed of a saturated aliphatic moiety and consists of hydrogen atoms and 5-40 carbon atoms; R2 is selected from H or CH.sub.3; R3 is selected from O, (CO)(NH) or (CO)O; n=0 or 1 The ethylene copolymers have a reduced peak melting temperature and reduced enthalpy of fusion, indicating that these ethylene copolymers have a reduced degree of crystallinity and improved clarity, combined with a desired melt mass-flow rate.

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The present invention provides a copolymer of an olefin and an unsaturated carboxylic acid or an unsaturated carboxylic acid derivative, said copolymer being a spherical and/or spherical-like polymer. The copolymer provided by the invention exhibits a good morphology and has good prospects in industrial use.

The present invention concerns a composition being an inverse emulsion comprising cross-linked anionic, organic polymeric microparticles, said microparticles having an unswollen z-average particle size diameter of less than 0.75 m, wherein the organic polymeric microparticles are formed from a monomer mixture comprising (a) an ethylenically unsaturated carboxylic acid, or a salt thereof; (b) an ethylenically unsaturated non-ionic monomer; and (c) from 1 to 10 mole % of 2-acrylamido-2-methylpropanesulphonic acid, or a salt thereof.

The invention also provides a process for preparing the composition, the use of the composition in a paper or paperboard making process and methods of making paper or paperboard employing said composition.