Patent classifications
C08F222/10
Composition for electrode protective film of electrostatic capacitance-type input device, electrode protective film of electrostatic capacitance-type input device, transfer film, laminate, electrostatic capacitance-type input device, and image display device
A composition for an electrode protective film of an electrostatic capacitance-type input device including (a) a binder polymer, (b) a photopolymerizable compound having an ethylenic unsaturated group, (c) a photopolymerization initiator, and (d) a compound capable of reacting with acidic groups or alcoholic hydroxy groups by heating, in which (b) the photopolymerizable compound having an ethylenic unsaturated group includes (b1) a photopolymerizable compound in which a value obtained by dividing a weight-average molecular weight by an average number of polymerizable groups is 270 or more can be used to form electrode protective films of electrostatic capacitance-type input devices having favorable bending resistance; an electrode protective film of an electrostatic capacitance-type input device; a transfer film; a laminate; an electrostatic capacitance-type input device; and an image display device.
Composition for electrode protective film of electrostatic capacitance-type input device, electrode protective film of electrostatic capacitance-type input device, transfer film, laminate, electrostatic capacitance-type input device, and image display device
A composition for an electrode protective film of an electrostatic capacitance-type input device including (a) a binder polymer, (b) a photopolymerizable compound having an ethylenic unsaturated group, (c) a photopolymerization initiator, and (d) a compound capable of reacting with acidic groups or alcoholic hydroxy groups by heating, in which (b) the photopolymerizable compound having an ethylenic unsaturated group includes (b1) a photopolymerizable compound in which a value obtained by dividing a weight-average molecular weight by an average number of polymerizable groups is 270 or more can be used to form electrode protective films of electrostatic capacitance-type input devices having favorable bending resistance; an electrode protective film of an electrostatic capacitance-type input device; a transfer film; a laminate; an electrostatic capacitance-type input device; and an image display device.
Latex polymers made using metallic-base-neutralized surfactant and blush-resistant coating compositions containing such polymers
An aqueous coating composition is provided that is preferably substantially free of bisphenol A. The coating composition is preferably a latex-based coating composition that includes a latex polymer formed from ingredients including an anionic and/or zwitterionic surfactant that includes one or more acid groups neutralized with a metallic base. The coating composition is useful in coating metal substrates such as, for example, interior and/or exterior surfaces of food or beverage containers.
HIGH PURITY 1,1-DICARBONYL SUBSTITUTED-1-ALKENES AND METHODS FOR THEIR PREPARATION
A composition comprising about 97 mole percent or greater of one or more 1,1-dicarbonyl substituted-1-ethylenes and about 3 mole percent or less of one or more 1,1-dicarbonyl substituted-methanes. A process comprising: contacting in a fluid state one or more 1,1-dicarbonyl substituted-1,1 hydroxymethyl-methanes and greater than 200 ppm to about 1000 ppm of one or more strong acids based on the weight of the one or more 1,1-dicarbonyl substituted-1,1 hydroxymethyl-methanes with a zeolite catalyst at a temperature of about 180° C. to about 220° C. for a sufficient time to convert about 96 percent or greater of the one or more 1,1-dicarbonyl substituted-1,1 hydroxymethyl-methanes to one or more 1,1-dicarbonyl substituted-1-ethylenes.
HIGH PURITY 1,1-DICARBONYL SUBSTITUTED-1-ALKENES AND METHODS FOR THEIR PREPARATION
A composition comprising about 97 mole percent or greater of one or more 1,1-dicarbonyl substituted-1-ethylenes and about 3 mole percent or less of one or more 1,1-dicarbonyl substituted-methanes. A process comprising: contacting in a fluid state one or more 1,1-dicarbonyl substituted-1,1 hydroxymethyl-methanes and greater than 200 ppm to about 1000 ppm of one or more strong acids based on the weight of the one or more 1,1-dicarbonyl substituted-1,1 hydroxymethyl-methanes with a zeolite catalyst at a temperature of about 180° C. to about 220° C. for a sufficient time to convert about 96 percent or greater of the one or more 1,1-dicarbonyl substituted-1,1 hydroxymethyl-methanes to one or more 1,1-dicarbonyl substituted-1-ethylenes.
METHOD OF FORMING A PHOTO-CURED LAYER
A method of forming a photo-cured layer on a substrate can comprise using a first photocurable composition and a second photocurable composition, wherein both photocurable compositions may contain the same types of polymerizable monomers but in different concentration ratios. The concentration ratios of the monomers in each of the two photocurable compositions can be adapted that the uneven loss of one type of monomer from the first photocurable composition due to unwanted evaporation in certain regions of the substrate may be compensated by the second photocurable composition, which contains a higher amount of said monomer. The two photocurable compositions can further be adapted to easily merge to a combined layer with a very even distribution of the polymerizable monomers. This may allow forming photo-cured layers having an excellent homogeneous material structure throughout the layer.
Photocurable composition
A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise 10-40 wt % of a mono-functional monomer of formula (1), with R1 being H or C.sub.1-C.sub.6 alkyl, and R2 and R3 being one or more substitutions of C.sub.1-C.sub.10 alkyl or alkyl-aryl, and R4, R5 being H or C.sub.1-C.sub.10 alkyl, ##STR00001##
The photocurable composition can have a viscosity of not greater than 15 mPa.Math.s, and a photo-cured layer of the photocurable composition can have a low thermal shrinkage if subjected to a high temperature baking treatment, and a carbon content of at least 74%.
ORGANIC-INORGANIC POLYMERIC COMPOSITIONS, RELATED ARTICLES, AND RELATED METHODS
The disclosure relates to an organic-inorganic hybrid (OIH) polymeric composition and related methods for forming the same. The disclosure also relates to a polymeric composition as disclosed herein and related methods for forming the same. The OIH polymeric composition and the polymeric composition can be formed by UV-irradiating a corresponding composition including a Michael-addition (MA) acceptor compound, a Michael-addition (MA) donor compound, a silane compound, when present, and a photo-latent base initiator to form a corresponding base catalyst and catalyze the reactions forming the networked polymer. The OIH polymeric composition and the polymeric composition can be used as a coating on any of a variety of substrates or as an interlayer in an additive manufacturing process.
HARD COATING COMPOSITION, AND HARD COATING FILM, WINDOW FILM AND DISPLAY DEVICE COMPRISING THE SAME
Described is a hard coating composition composed of a silazane compound, a polyfunctional (meth)acryl-based dendrimer compound or a polyfunctional urethane (meth)acrylate having a cyclohexyl group, a photoinitiator and a solvent, and to a hard coating film, a window film, and a display device including the same, thus exhibiting superior scratch resistance, hardness and flexibility.
HARD COATING COMPOSITION, AND HARD COATING FILM, WINDOW FILM AND DISPLAY DEVICE COMPRISING THE SAME
Described is a hard coating composition composed of a silazane compound, a polyfunctional (meth)acryl-based dendrimer compound or a polyfunctional urethane (meth)acrylate having a cyclohexyl group, a photoinitiator and a solvent, and to a hard coating film, a window film, and a display device including the same, thus exhibiting superior scratch resistance, hardness and flexibility.