Patent classifications
C08F222/10
METHOD OF PREPARING VINYL CHLORIDE-BASED COPOLYMER AND VINYL CHLORIDE-BASED COPOLYMER PREPARED THEREBY
The present invention relates to a method of preparing a vinyl chloride-based copolymer having excellent plasticity and processability, a vinyl chloride-based copolymer prepared thereby, a thermoplastic resin composition including the vinyl chloride-based copolymer, and a thermoplastic resin molded article prepared from the composition. Since the preparation method may improve copolymerizability with a vinyl chloride-based monomer by continuously adding or dividedly adding an unsaturated fatty acid ester mixture used as a comonomer during the time of specific polymerization conversion rate, the unreacted unsaturated fatty acid ester mixture may be reduced, and, as a result, the conversion rate of the vinyl chloride-based copolymer may be significantly improved. Thus, plasticity and processability of a vinyl chloride-based copolymer prepared by the above method may be significantly improved.
METHOD OF PREPARING VINYL CHLORIDE-BASED COPOLYMER AND VINYL CHLORIDE-BASED COPOLYMER PREPARED THEREBY
The present invention relates to a method of preparing a vinyl chloride-based copolymer having excellent plasticity and processability, a vinyl chloride-based copolymer prepared thereby, a thermoplastic resin composition including the vinyl chloride-based copolymer, and a thermoplastic resin molded article prepared from the composition. Since the preparation method may improve copolymerizability with a vinyl chloride-based monomer by continuously adding or dividedly adding an unsaturated fatty acid ester mixture used as a comonomer during the time of specific polymerization conversion rate, the unreacted unsaturated fatty acid ester mixture may be reduced, and, as a result, the conversion rate of the vinyl chloride-based copolymer may be significantly improved. Thus, plasticity and processability of a vinyl chloride-based copolymer prepared by the above method may be significantly improved.
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED SUBSTRATE, OPTICAL COMPONENT, CIRCUIT BOARD, ELECTRONIC COMPONENT AND IMPRINT MOLD
A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound and a component (e1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a surface tension of a composition of components of the curable composition (A1) except a solvent being higher than a surface tension a composition of components of the curable composition (A2) except a solvent.
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED SUBSTRATE, OPTICAL COMPONENT, CIRCUIT BOARD, ELECTRONIC COMPONENT AND IMPRINT MOLD
A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound and a component (e1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing, a surface tension of a composition of components of the curable composition (A1) except a solvent being higher than a surface tension a composition of components of the curable composition (A2) except a solvent.
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED SUBSTRATE, OPTICAL COMPONENT, CIRCUIT BOARD, ELECTRONIC COMPONENT AND IMPRINT MOLD
A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) as a polymerizable compound and a component (c1) as a surfactant on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a component (a2) as a polymerizable compound and a component (c2) as a surfactant dropwise discretely onto the layer formed of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) containing at least 0.5 wt % or more of the component (c1), the curable composition (A2) containing at least 0.5 wt % or more of the component (c2).
PATTERN FORMING METHOD AS WELL AS PRODUCTION METHODS FOR PROCESSED SUBSTRATE, OPTICAL COMPONENT, CIRCUIT BOARD, ELECTRONIC COMPONENT AND IMPRINT MOLD
A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) as a polymerizable compound and a component (c1) as a surfactant on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a component (a2) as a polymerizable compound and a component (c2) as a surfactant dropwise discretely onto the layer formed of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) containing at least 0.5 wt % or more of the component (c1), the curable composition (A2) containing at least 0.5 wt % or more of the component (c2).
CURABLE COMPOSITION FOR OPTICAL MATERIALS, AND OPTICAL MATERIAL
The present invention relates to a curable composition for an optical material, containing (A) 100 parts by mass of a radical polymerizable monomer, (B) 0.005 to 0.5 parts by mass of a tetraazaporphyrin compound having a maximum absorption wavelength in a range of 560 nm or more and 620 nm or less, and (C) 0.1 to 10 parts by mass of an ultraviolet absorber having a maximum absorption wavelength in a range of 330 nm or more and 350 nm or less. According to the present invention, it is possible to provide a curable composition for an optical material, capable of being suitably used as a coating material that can easily provide an optical material having good antiglare properties and excellent weather resistance.
Waterborne curable resin composition
To provide a waterborne curable resin composition that is advantageous for environmental protection measures, can be applied without use of a film-forming assistant and can improve the dispersion stability of the emulsion, and also improve physical properties of the coat such as curability, durability, and stain resistance. A waterborne curable resin composition having an acrylic emulsion produced by emulsion polymerization, wherein the acrylic emulsion contains a curable monomer and/or oligomer in emulsion particles.
Photopolymerizable composition, photopolymerizable inkjet ink, and ink cartridge
A photopolymerizable composition, which includes a photoradical polymerization initiator and photopolymerizable monomers containing glycerol dimethacrylate, where an amount of the glycerol dimethacrylate in the photopolymerizable monomers is 25% by mass or greater, and pencil hardness of a cured product is F or harder, where the cured product is formed by curing a coating film through irradiation with light of a wavelength region corresponding to a UVA region, with a light to dose of 800 mJ/cm.sup.2, where the coating film is formed by coating the photopolymerizable composition on a base so as to have an average thickness of 30 μm.
Polymerizable compound, polymerizable composition, polymer, and optically anisotropic substance
The present invention relates to: a polymerizable compound represented by a formula (I); a polymerizable composition comprising the polymerizable compound and an initiator; a polymer obtained by polymerizing the polymerizable compound or the polymerizable composition; and an optically anisotropic article comprising the polymer [in the formula, Y.sup.1 to Y.sup.8 are a chemical single bond, —O—, —O—C(═O)—, —C(═O)—O—, or the like; G.sup.1 and G.sup.2 are a divalent aliphatic group having 1 to 20 carbon atoms, or the like; Z.sup.1 and Z.sup.2 are an alkenyl group having 2 to 10 carbon atoms, or the like; A.sup.1 is a tetravalent aromatic group, or the like; A.sup.2 and A.sup.3 are a divalent alicyclic hydrocarbon group having 3 to 30 carbon atoms, or the like; A.sup.4 and A.sup.5 are a divalent aromatic group having 4 to 30 carbon atoms, or the like; A.sup.x1 and A.sup.x2 are an organic group having 2 to 30 carbon atoms that includes an aromatic ring, or the like; A.sup.y1 and A.sup.y2 are a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; Q.sup.1 and Q.sup.2 are a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; and m and n are 0 or 1]. According to the present invention, a polymerizable compound, a polymerizable composition, and a polymer that have a practical low melting point, exhibit excellent solubility in a general-purpose solvent, can be produced at low cost, and can produce an optical film that achieves uniform conversion of polarized light over a wide wavelength band, and also provide an optically anisotropic article. ##STR00001##