Thermoset resin compositions including a compound of formula (I) having a working life and/or a pot life of at least 1 hour are provided. Copolymers prepared from the thermoset resin compositions are further provided. Methods of preparing and polymerizing the thermoset resin compositions are further provided. Delivery devices for preparing thermoset resin compositions are further provided.

Thermoset resin compositions including a compound of formula (I) having a working life and/or a pot life of at least 1 hour are provided. Copolymers prepared from the thermoset resin compositions are further provided. Methods of preparing and polymerizing the thermoset resin compositions are further provided. Delivery devices for preparing thermoset resin compositions are further provided.

To provide a monomer composition in which the solubility of the polymerization inhibitor in the cyclic monomer is good, the stability of the cyclic monomer during storage is good, and the cyclic monomer and the polymerization inhibitor are easily separated by distillation; and a method for producing a high molecular weight fluorinated polymer from the monomer composition. A monomer composition which comprises a specific cyclic monomer and a polymerization inhibitor, wherein the polymerization inhibitor is a polymerization inhibitor which satisfies (a) it is a 6-membered unsaturated cyclic hydrocarbon having from 1 to 4 substituents, (b) it has, as the substituent, at least one type selected from the group consisting of a t-butyl group, a methyl group, an isopropenyl group, an oxo group and a hydroxy group, (c) in a case where it has an oxo group as one type of the substituent, it has, as the substituent other than the oxo group, either one or both of a t-butyl group and a methyl group, and (d) in a case where it has a hydroxy group as the substituent, the number of the hydroxy group is only one.

The present disclosure provides a polymer represented by the following general formula (I): ##STR00001## wherein x and y each represent a repeating unit, and both x and y are positive integers; formula ##STR00002##
and formula ##STR00003##
are each independently selected from the group consisting of an aryl containing 5-40 ring atoms and a heteroaryl containing 5-40 ring atoms; formula ##STR00004##
is a linking group, and formula ##STR00005##
is selected from the group consisting of alkyl, alkoxy, amino, alkenyl, alkynyl, aralkyl, and heteroalkyl; and R2, R3 and R4 are each independently selected from the group consisting of H, D, F, CN, alkyl, fluoroalkyl, aryl, heteroaryl, amino, Si, germyl, alkoxy, aryloxy, fluoroalkoxy, siloxane, siloxy, deuterated alkyl, deuterated fluoroalkyl, deuterated aryl, deuterated heteroaryl, deuterated amino, deuterated silyl, deuterated germyl, deuterated alkoxy, deuterated aryloxy, deuterated fluoroalkoxy, deuterated siloxane, and deuterated siloxy.

Described herein are optically transparent and semipermeable windows composed of at least one layer of an amorphous crosslinked fluorinated copolymer. Also disclosed are a process and apparatus for three-dimensional continuous liquid interface production (CLIP) printing using the windows described herein. The amorphous crosslinked fluorinated copolymers have improved mechanical properties, thereby reducing the susceptibility of the window to brittle failures such as cracking and crack propagation. The gas permeable windows have superior durability and reliability compared with other available structures and compositions.

Described herein are optically transparent and semipermeable windows composed of at least one layer of an amorphous crosslinked fluorinated copolymer. Also disclosed are a process and apparatus for three-dimensional continuous liquid interface production (CLIP) printing using the windows described herein. The amorphous crosslinked fluorinated copolymers have improved mechanical properties, thereby reducing the susceptibility of the window to brittle failures such as cracking and crack propagation. The gas permeable windows have superior durability and reliability compared with other available structures and compositions.

The present disclosure describes functional oligomers or functional polymers. The functional oligomers or functional polymers may contain functional groups, e.g., —OH and/or —CHO. The functional oligomers or functional polymers may be obtained from hydrolyzing certain copolymers and may be soluble in commercially available solvents. The copolymers may be thermosetting polymers. The functional oligomers and functional polymers may be useful for recycling thermosetting polymers and may be useful as starting materials for preparing additional oligomers or polymers.

The present disclosure describes functional oligomers or functional polymers. The functional oligomers or functional polymers may contain functional groups, e.g., —OH and/or —CHO. The functional oligomers or functional polymers may be obtained from hydrolyzing certain copolymers and may be soluble in commercially available solvents. The copolymers may be thermosetting polymers. The functional oligomers and functional polymers may be useful for recycling thermosetting polymers and may be useful as starting materials for preparing additional oligomers or polymers.

A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.

A chemically amplified resist composition comprising a quencher containing an ammonium salt of an iodized or brominated phenol and an acid generator exerts a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having satisfactory resolution, LWR and CDU.