C08F267/06

REVERSIBLE STRESS-RESPONSIVE MATERIAL, PREPARATION METHOD, AND USE THEREOF

A reversible stress-responsive material, a preparation method, and a use thereof are provided. The reversible stress-responsive material prepared by the present disclosure has the property of real-time reversible force response at room temperature. When used with crosslinked plastic (high Tg) and rubber (low Tg) polymer materials, the reversible stress-responsive material can significantly enhance the mechanical strength and ductility of covalently cross-linked polymers. In the present disclosure, the triazolinedione (TAD)-indole click chemistry with the force-induced reversible property is used to construct a force-reversible crosslinked polymer material, and such a force-induced reversible crosslinking method can achieve the breakage and re-forming of covalent crosslinking points at room temperature in a solid state without any external stimuli other than the ambient temperature. This room-temperature force-induced reversible C—N covalent crosslinking can be regarded as an innovative approach to designing a high-toughness polymer material.

Photocurable resin composition, ink and coating material

Provided is a photocurable resin composition containing an allylic polymer (A) which has excellent adhesion to plastic substrates. The present invention relates to a photocurable resin composition containing an allylic polymer (A), the allylic polymer (A) being produced by polymerization of an allylic compound represented by the following formula (I): ##STR00001##

Photocurable resin composition, ink and coating material

Provided is a photocurable resin composition containing an allylic polymer (A) which has excellent adhesion to plastic substrates. The present invention relates to a photocurable resin composition containing an allylic polymer (A), the allylic polymer (A) being produced by polymerization of an allylic compound represented by the following formula (I): ##STR00001##

Actinic-ray-curable coating material composition and layered product

Provided is a coating material composition which is capable of forming an undercoat layer for metallic vapor deposition, the layer being excellent in terms of adhesion to various bases and appearance. The actinic-ray-curable coating material composition according to the present invention comprises one or more resins A, a (meth)acrylate B, and a silane coupling agent C, wherein the resins A comprise a polymer A1 having a hydroxyl group with a hydroxyl value of 20-200 mg-KOH/g and/or an alkyd resin A2, the proportion of the resins A and that of the (meth)acrylate B are 20-60 mass % and 40-80 mass %, respectively, with respect to the total amount, which is taken as 100 mass %, of the resins A and the (meth)acrylate B, and the amount of the silane coupling agent C is 0.3-15 parts by mass per 100 parts by mass of the total amount of the resins A and the (meth)acrylate B.

Actinic-ray-curable coating material composition and layered product

Provided is a coating material composition which is capable of forming an undercoat layer for metallic vapor deposition, the layer being excellent in terms of adhesion to various bases and appearance. The actinic-ray-curable coating material composition according to the present invention comprises one or more resins A, a (meth)acrylate B, and a silane coupling agent C, wherein the resins A comprise a polymer A1 having a hydroxyl group with a hydroxyl value of 20-200 mg-KOH/g and/or an alkyd resin A2, the proportion of the resins A and that of the (meth)acrylate B are 20-60 mass % and 40-80 mass %, respectively, with respect to the total amount, which is taken as 100 mass %, of the resins A and the (meth)acrylate B, and the amount of the silane coupling agent C is 0.3-15 parts by mass per 100 parts by mass of the total amount of the resins A and the (meth)acrylate B.

Electrophotographic photoreceptor, process cartridge, and image-forming apparatus

An electrophotographic photoreceptor includes a conductive substrate and a photosensitive layer disposed on the conductive substrate. An outermost surface layer of the electrophotographic photoreceptor contains fluorine-containing resin particles and a fluorine-containing graft polymer having a fluorinated alkyl group. In an infrared absorption spectrum of the fluorine-containing graft polymer, a ratio of a peak area in a wavenumber range of from 1,020 cm.sup.−1 to 1,308 cm.sup.−1 to a peak area in a wavenumber range of from 1,673 cm.sup.−1 to 1,779 cm.sup.−1 is 2.7 or more and 4.8 or less.

Electrophotographic photoreceptor, process cartridge, and image-forming apparatus

An electrophotographic photoreceptor includes a conductive substrate and a photosensitive layer disposed on the conductive substrate. An outermost surface layer of the electrophotographic photoreceptor contains fluorine-containing resin particles and a fluorine-containing graft polymer having a fluorinated alkyl group. In an infrared absorption spectrum of the fluorine-containing graft polymer, a ratio of a peak area in a wavenumber range of from 1,020 cm.sup.−1 to 1,308 cm.sup.−1 to a peak area in a wavenumber range of from 1,673 cm.sup.−1 to 1,779 cm.sup.−1 is 2.7 or more and 4.8 or less.

Polymers from muconic acid isomers and its derivatives

This invention relates to polymerization of muconic acid and its derivatives. Muconic acid useful for the invention can be in any of its isomeric forms including cis, cis-muconic acid (ccMA), cis, trans-muconic acid (ctMA), and trans, trans-muconic acid (ttMA). Muconic acid used in the invention can be derived either from renewable carbon resources through biological fermentation or from non-renewable petrochemical resources through biological fermentation or chemical conversion.

Polymers from muconic acid isomers and its derivatives

This invention relates to polymerization of muconic acid and its derivatives. Muconic acid useful for the invention can be in any of its isomeric forms including cis, cis-muconic acid (ccMA), cis, trans-muconic acid (ctMA), and trans, trans-muconic acid (ttMA). Muconic acid used in the invention can be derived either from renewable carbon resources through biological fermentation or from non-renewable petrochemical resources through biological fermentation or chemical conversion.

Denture Material Having Anti-Microbial Properties

Antimicrobial polymer composite materials are disclosed that are suitable for making oral devices used in dental applications, such as denture bases. Acrylic resin composite materials comprising antimicrobial polymers and antimicrobial fillers provide reduction in common oral microorganisms after long-term aging, with reduced release rate of antimicrobial agents from the composite material. Antimicrobial polymers are prepared from compositions comprising acrylate and/or methacrylate monomers and polymerizable quaternary ammonium silicon-containing compounds.