Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): ##STR00001##
(wherein R.sub.1 represents a hydrogen atom or a methyl group, R.sub.2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

An article, comprising a packaging article such as food or beverage container (20), or a portion thereof, that includes a substrate (30, 32) and a coating (34) disposed on at least a portion of the substrate (30, 32). The coating (34) is preferably formed from a coating composition that comprises a latex emulsion having a first-stage copolymer, a second-stage copolymer, and a linkage interconnecting the first-stage copolymer and the second-stage copolymer prior to curing.

An article, comprising a packaging article such as food or beverage container (20), or a portion thereof, that includes a substrate (30, 32) and a coating (34) disposed on at least a portion of the substrate (30, 32). The coating (34) is preferably formed from a coating composition that comprises a latex emulsion having a first-stage copolymer, a second-stage copolymer, and a linkage interconnecting the first-stage copolymer and the second-stage copolymer prior to curing.

An article, comprising a packaging article such as food or beverage container (20), or a portion thereof, that includes a substrate (30, 32) and a coating (34) disposed on at least a portion of the substrate (30, 32). The coating (34) is preferably formed from a coating composition that comprises a latex emulsion having a first-stage copolymer, a second-stage copolymer, and a linkage interconnecting the first-stage copolymer and the second-stage copolymer prior to curing.

An article, comprising a packaging article such as food or beverage container (20), or a portion thereof, that includes a substrate (30, 32) and a coating (34) disposed on at least a portion of the substrate (30, 32). The coating (34) is preferably formed from a coating composition that comprises a latex emulsion having a first-stage copolymer, a second-stage copolymer, and a linkage interconnecting the first-stage copolymer and the second-stage copolymer prior to curing.

The present invention relates to a photo-curable and heat-curable resin composition including: an acid-modified oligomer having a photo-curable functional group having an acrylate group or an unsaturated double bond, and a carboxyl group in the molecule; a photopolymerizable monomer having at least two photo-curable unsaturated functional groups; a heat-curable binder having a heat-curable functional group; a plate-like inorganic filler having an E-modulus of 90 to 120 (Gpa); a dispersant; and a photo-initiator, and a dry film solder resist prepared therefrom.

The present invention relates to a photo-curable and heat-curable resin composition including: an acid-modified oligomer having a photo-curable functional group having an acrylate group or an unsaturated double bond, and a carboxyl group in the molecule; a photopolymerizable monomer having at least two photo-curable unsaturated functional groups; a heat-curable binder having a heat-curable functional group; a plate-like inorganic filler having an E-modulus of 90 to 120 (Gpa); a dispersant; and a photo-initiator, and a dry film solder resist prepared therefrom.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

A novel bio-based superabsorbent polymer material based on a proteinaceous natural polymer is introduced herein. There is further disclosed a method for the manufacture of such a bio-based crosslinked superabsorbent polymer material. The method includes, but not limited to, introducing polymerizable unsaturated groups onto the natural polymer or its derivative so as to yield a macromonomer. The macromonomer can be formed by covalently binding unsaturated carbon-carbon double bonds to a proteinaceous substrate through a reaction of a selected chemical compound and the amino group on the proteinaceous substrate. The macromonomer is then copolymerized with unsaturated co-monomer(s) to form a crosslinked superabsorbent material.