C08F299/02

Cross-linked polymeric materials and articles

Reprocessable materials are provided that include a product of cross-linking a glycidyl methacrylate grafted high-density polyethylene (HDPE-g-GMA) with a polymacrolactone of formula (II) to form a cross-linked polymer exhibiting vitrimer characteristics. Methods for preparing the cross-linked polymer materials include reacting the glycidyl methacrylate grafted high-density polyethylene of with the polymacrolactone in the presence of a first catalyst under conditions that initiate cross-linking of HDPE-g-GMA with the polymacrolactone. Mechanically reprocessable articles include a structural element that is or includes the cross-linked polymer material. Examples of the mechanically reprocessable articles include pallets or molded structures formed from the material and configured to support a load of at least 1000 kg without bending.

Hydrophobic pinning mat for directed self-assembly of diblock copolymer novel compositions and processes for self-assembly of block copolymers
11384193 · 2022-07-12 · ·

The present invention relates to a novel styrenic polymer comprised of the repeat units of structures (I), (II), and (III), wherein R.sub.1, R.sub.2 and R.sub.3 are individually selected from H or a C-1 to C-4 linear alkyl, R.sub.5, R.sub.7 and R.sub.6 are individually selected from a C-1 to C-8 linear alkyl, a C-3 to C-8 linear alkyl and a C-3 to C-8 cyclic alkyl and to the novel composition comprised of this polymer and a spin on organic solvent. In another aspect of this invention it pertains to the use of this composition to create a grafted on a substrate, and a further aspect, this grafted film may be used in a directed self-assembly process. ##STR00001##

Block copolymers, membranes and methods

Block copolymers, thin films including block copolymers, and methods for forming block copolymers and thin films. The block copolymers, due to self-assembly or otherwise, may include one or more regions. The one or more regions may permit a thin film including a block copolymer to be used as a nanostructured membrane.

Methods of forming a semiconductor device using block copolymer materials

Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Methods of forming a semiconductor device using block copolymer materials

Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

RESIN COMPOSITION, FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
20220064444 · 2022-03-03 · ·

Provided are a resin composition including a coloring material, a resin, and a solvent, in which, in a case where a film having a thickness of 0.60 μm is formed by heating the resin composition at 200° C. for 30 minutes, a rate of change ΔA in an absorbance of the film after performing a heating treatment of the film at 300° C. for 5 hours in a nitrogen atmosphere, which is represented by Expression (1), is 50% or less; a film formed of the resin composition; a color filter; a solid-state imaging element; and an image display device. In the following expression, ΔA is the rate of change in the absorbance of the film after the heating treatment, A1 is a maximum value of an absorbance of the film before the heating treatment in a wavelength range of 400 to 1100 nm, and A2 is an absorbance of the film after the heating treatment, and is an absorbance at a wavelength showing the maximum value of the absorbance of the film before the heating treatment in a wavelength range of 400 to 1100 nm.


ΔA=|100−(A2/A1)×100|  (1)

Block Copolymers, Membranes and Methods
20210332177 · 2021-10-28 ·

Block copolymers, thin films including block copolymers, and methods for forming block copolymers and thin films. The block copolymers, due to self-assembly or otherwise, may include one or more regions. The one or more regions may permit a thin film including a block copolymer to be used as a nanostructured membrane.

Block copolymer

The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.

Gels derived from poly(ethylidene norbornene)-b-poly(cyclopentene) block copolymer nanocomposites for viscosity modifications and drilling fluid applications

The present application is directed to a nanocomposite organo gel having a continuous polymeric network structure, wherein polymer chains are held together by ionic interaction between polymer chain ends, interparticle chain entanglements, layered silicate surface modifier, ionic salt, and layered silicate. The present application is also directed to methods of making and using the nanocomposite organo gel.

Gels derived from poly(ethylidene norbornene)-b-poly(cyclopentene) block copolymer nanocomposites for viscosity modifications and drilling fluid applications

The present application is directed to a nanocomposite organo gel having a continuous polymeric network structure, wherein polymer chains are held together by ionic interaction between polymer chain ends, interparticle chain entanglements, layered silicate surface modifier, ionic salt, and layered silicate. The present application is also directed to methods of making and using the nanocomposite organo gel.