C08F299/02

Thermosetting resin composition and its production method, prepreg, laminate, and printed wiring board

The present invention provides a thermosetting resin composition containing (A) a maleimide compound, (B) an epoxy resin having at least two epoxy groups in one molecule, (C) a copolymer resin having a structural unit derived from an aromatic vinyl compound and a structural unit derived from a maleic anhydride, (D) a silica treated with an aminosilane coupling agent, and (E) a flame retardant dispersion.

Polymer composition

The present invention relates to a polymer composition, an optical laminate and a display device, and can provide a polymer composition capable of forming a pressure-sensitive adhesive layer which has excellent workability, durability and dimensional stability and is capable of effectively alleviating the bending phenomenon of the display, through a polymer capable of forming a physically cross-linked structure together with a chemically cross-linked structure. In addition, the present invention can provide an optical laminate comprising a cross-linked product of the polymer composition and a display device comprising the same.

Polymer composition

The present invention relates to a polymer composition, an optical laminate and a display device, and can provide a polymer composition capable of forming a pressure-sensitive adhesive layer which has excellent workability, durability and dimensional stability and is capable of effectively alleviating the bending phenomenon of the display, through a polymer capable of forming a physically cross-linked structure together with a chemically cross-linked structure. In addition, the present invention can provide an optical laminate comprising a cross-linked product of the polymer composition and a display device comprising the same.

Block copolymer containing photo-sensitive moiety

The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.

Block copolymer containing photo-sensitive moiety

The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.

COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICROPHASE-SEPARATED PATTERN

A self-assembled film forming composition for forming a phase-separated structure of a block copolymer layer on a substrate, containing a block copolymer and a solvent, and is configured such that: the block copolymer is obtained by bonding a silicon-free polymer to a silicon-containing polymer that contains, as a constituent unit, styrene that is substituted by a silicon-containing group; the silicon-free polymer contains a structure derived from formula [1-1] or formula [1-2]; and the silicon-containing group contains one silicon atom. [In formula [1-1] or formula [1-2], each of R.sup.1 and R.sup.2 independently represents a hydrogen atom, a halogen atom or an alkyl group having 1-10 carbon atoms; and each of R.sup.3-R.sup.5 independently represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1-10 carbon atoms, an alkoxy group having 1-10 carbon atoms, a cyano group, an amino group, an amide group or a carbonyl group.]

COMPOSITION FOR FORMING BLOCK COPOLYMER LAYER FOR FORMATION OF MICROPHASE-SEPARATED PATTERN

A self-assembled film forming composition for forming a phase-separated structure of a block copolymer layer on a substrate, containing a block copolymer and a solvent, and is configured such that: the block copolymer is obtained by bonding a silicon-free polymer to a silicon-containing polymer that contains, as a constituent unit, styrene that is substituted by a silicon-containing group; the silicon-free polymer contains a structure derived from formula [1-1] or formula [1-2]; and the silicon-containing group contains one silicon atom. [In formula [1-1] or formula [1-2], each of R.sup.1 and R.sup.2 independently represents a hydrogen atom, a halogen atom or an alkyl group having 1-10 carbon atoms; and each of R.sup.3-R.sup.5 independently represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1-10 carbon atoms, an alkoxy group having 1-10 carbon atoms, a cyano group, an amino group, an amide group or a carbonyl group.]

Block copolymer and micelle compositions and methods of use thereof

Provided herein are block copolymers comprising a hydrophilic polymer segment and a hydrophobic polymer segment, wherein the hydrophilic polymer segment comprises a polymer selected from the group consisting of: poly(ethylene oxide) (PEO), poly(methacrylate phosphatidyl choline) (MPC), and polyvinylpyrrolidone (PVP), wherein the hydrophobic polymer segment comprises ##STR00001##
wherein R′ is —H or —CH.sub.3, wherein R is —NR.sup.1R.sup.2, wherein R.sup.1 and R.sup.2 are alkyl groups, wherein R.sup.1 and R.sup.2 are the same or different, wherein R.sup.1 and R.sup.2 together have from 5 to 16 carbons, wherein R.sup.1 and R.sup.2 may optionally join to form a ring, wherein n is 1 to about 10, and wherein x is about 20 to about 200 in total. Also provided are pH-sensitive micelle compositions for therapeutic and diagnostic applications.

Hardenable polymer composition

The present invention relates to a hardenable polymer composition containing at least one acrylate compound, at least one silyl-terminated polymer and at least one photoinitiator, to the use of the polymer composition as or in an adhesive, a sealant, gasket, knifing filler or coating composition, and to an adhesive composition, a sealant composition, a gasket composition, a knifing filler composition or a coating composition comprising the polymer composition.

Block copolymer

The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.