The present invention provides a radiation-sensitive composition containing (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein the content of a solid component in the composition is within the range of 1 to 80% by mass, the content of the solvent is within the range of 20 to 99% by mass, and the resist base material (A) is a compound represented by a specific formula.

An aromatic polyphenol derivative comprising at least one aromatic ring bearing at least two OZ groups in the meta position relative to one another, the two positions ortho to at least one of the OZ groups being unsubstituted, is used for the manufacture of a phenol-aldehyde resin for reinforcing a rubber composition. Each OZ group represents an OSi(R.sub.1R.sub.2R.sub.3) group with R.sub.1, R.sub.2, R.sub.3 representing, independently of one another, a hydrocarbon-based radical or a substituted hydrocarbon-based radical.

An aromatic polyphenol derivative comprising at least one aromatic ring bearing at least two OZ groups in the meta position relative to one another, the two positions ortho to at least one of the OZ groups being unsubstituted, is used for the manufacture of a phenol-aldehyde resin for reinforcing a rubber composition. Each OZ group represents an OSi(R.sub.1R.sub.2R.sub.3) group with R.sub.1, R.sub.2, R.sub.3 representing, independently of one another, a hydrocarbon-based radical or a substituted hydrocarbon-based radical.

A laminate is provided comprising a support, a resin layer, a metal layer, an insulating layer, and a redistribution layer. The resin layer comprises a photo-decomposable resin having light-shielding properties and has a transmittance of up to 20% with respect to light of wavelength 355 nm. The laminate is easy to fabricate and has thermal process resistance, the support is easily separated, and a semiconductor package is efficiently produced.

A laminate is provided comprising a support, a resin layer, a metal layer, an insulating layer, and a redistribution layer. The resin layer comprises a photo-decomposable resin having light-shielding properties and has a transmittance of up to 20% with respect to light of wavelength 355 nm. The laminate is easy to fabricate and has thermal process resistance, the support is easily separated, and a semiconductor package is efficiently produced.

A hardmask composition, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1, below; and a solvent,

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A hardmask composition, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns using the hardmask layer including a cured product of the hardmask composition, the hardmask composition including a compound represented by Chemical Formula 1, below; and a solvent,

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Alkylphenol-aldehyde resins and alkoxy alkylphenol-aldehyde resins that have a natural aldehyde component for use in oilfield applications. A method for synthesizing an alkylphenol-aldehyde resin having a natural aldehyde component, a method for synthesizing an alkoxy alkylphenol-aldehyde resin having a natural aldehyde component, and methods for asphaltene inhibition, viscosity reduction, and emulsion breaking using the disclosed resins.

Alkylphenol-aldehyde resins and alkoxy alkylphenol-aldehyde resins that have a natural aldehyde component for use in oilfield applications. A method for synthesizing an alkylphenol-aldehyde resin having a natural aldehyde component, a method for synthesizing an alkoxy alkylphenol-aldehyde resin having a natural aldehyde component, and methods for asphaltene inhibition, viscosity reduction, and emulsion breaking using the disclosed resins.

An underlayer composition, comprising a polymer comprising a repeating unit of formula (1):

wherein Ar is a monocyclic or polycyclic C.sub.5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R.sup.1, R.sup.2; R.sup.a and R.sup.b are as provided herein; optionally, R.sup.1 and R.sup.2 can be taken together form a 5- to 7-membered ring; optionally, one of R.sup.11 to R.sup.13 can be taken together with R.sup.1 to form a 5- to 7-membered ring; wherein R.sup.a and R.sup.b optionally may be taken together to form a 5- to 7-membered ring; wherein one of R.sup.a or R.sup.b optionally may be taken together with R.sup.2 to form a 5- to 7-membered ring; and when X is O, R.sup.a and R.sup.b are absent.

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