C08G8/04

RESIST UNDERLAYER FILM-FORMING COMPOSITION

A composition for forming a resist underlayer film containing a solvent and polymer comprising a unit structure (A) represented by formula (1) and/or formula (2). The composition is capable of forming a hydrophobic underlayer film that has a high contact angle with pure water and exhibits high adhesion to an upper layer film, thereby being not susceptible to separation therefrom, while meeting the requirement of good coatability, the composition being also capable of exhibiting other good characteristics such as sufficient resistance to a chemical agent that is used for resist underlayer films.

HIGH STIFFNESS RUBBER COMPOSITION
20210347966 · 2021-11-11 ·

The rubber composition comprises at least one resin based: (A1) on at least one aromatic compound comprising at least one aromatic ring bearing at least two functional groups, one of these functional groups being a hydroxymethyl functional group and the other being an aldehyde functional group or a hydroxymethyl functional group; and (A2) on at least one phenolic compound chosen from (A21) at least one aromatic polyphenol comprising at least one aromatic ring bearing at least two hydroxyl functional groups in the meta position with respect to one another, the two positions ortho to at least one of the hydroxyl functional groups being unsubstituted; and/or (A22) at least one aromatic monophenol comprising at least one six-membered aromatic ring bearing a single hydroxyl functional group, the two positions ortho to the hydroxyl functional group being unsubstituted or at least one position ortho to and the position para to the hydroxyl functional group being unsubstituted; and their mixtures.

Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin

An object of the present invention is to provide a new compound that is useful as a film forming material for lithography and the like. The above object can be achieved by a compound represented by the following formula (1). ##STR00001##

Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin

An object of the present invention is to provide a new compound that is useful as a film forming material for lithography and the like. The above object can be achieved by a compound represented by the following formula (1). ##STR00001##

Expandable porous organic polymer-based hydrogen ion conductive material and method for preparing same

The present invention relates to a porous organic polymer-based hydrogen ion conductive material and a method for preparing the same. More specifically, the present invention relates to a method for preparing a porous organic polymer (POP)-based material with high proton conductivity that is applicable to a membrane electrode assembly (MEA) of a proton exchange membrane fuel cell (PEMFC). The porous organic polymer-based proton conductive material of the present invention can be prepared in an easy and simple manner by microwave treatment and acid treatment requiring short processing time and low processing cost. In addition, the porous organic polymer-based proton conductive material of the present invention can be developed into a highly proton conductive material having the potential to replace Nafion through a simple post-synthesis modification. Therefore, the porous organic polymer-based proton conductive material of the present invention is suitable for use in a proton exchange membrane fuel cell.

Aqueous adhesive composition comprising a ithermosetting resin

An aqueous adhesive composition comprises a thermosetting resin based on: at least one aromatic compound bearing at least two functions, one of these functions being a hydroxymethyl function and the other being an aldehyde function or a hydroxymethyl function, the aromatic compound comprising at least one aromatic ring; and at least aromatic polyphenol comprising at least one aromatic ring bearing at least two hydroxyl functions in the meta position relative to one another, the two positions ortho to at least one of the hydroxyl functions being unsubstituted. Such an adhesive composition may especially be used to join elements made of wood; it constitutes an advantageous alternative to the use of a formaldehyde-based phenolic resin adhesive.

Aqueous adhesive composition comprising a ithermosetting resin

An aqueous adhesive composition comprises a thermosetting resin based on: at least one aromatic compound bearing at least two functions, one of these functions being a hydroxymethyl function and the other being an aldehyde function or a hydroxymethyl function, the aromatic compound comprising at least one aromatic ring; and at least aromatic polyphenol comprising at least one aromatic ring bearing at least two hydroxyl functions in the meta position relative to one another, the two positions ortho to at least one of the hydroxyl functions being unsubstituted. Such an adhesive composition may especially be used to join elements made of wood; it constitutes an advantageous alternative to the use of a formaldehyde-based phenolic resin adhesive.

Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate

The invention provides: a dihydroxynaphthalene condensate which suppresses soft particle generation and is suitably usable for a composition excellent in filterability; and a method for producing the dihydroxynaphthalene condensate. In the method for producing a dihydroxynaphthalene condensate, dihydroxynaphthalene to be used has a sulfur element content of 100 ppm or less in terms of mass among constituent elements. The dihydroxynaphthalene and a condensation agent are condensed in presence of an acid or a base to produce the dihydroxynaphthalene condensate.

Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate

The invention provides: a dihydroxynaphthalene condensate which suppresses soft particle generation and is suitably usable for a composition excellent in filterability; and a method for producing the dihydroxynaphthalene condensate. In the method for producing a dihydroxynaphthalene condensate, dihydroxynaphthalene to be used has a sulfur element content of 100 ppm or less in terms of mass among constituent elements. The dihydroxynaphthalene and a condensation agent are condensed in presence of an acid or a base to produce the dihydroxynaphthalene condensate.

NOVOLAC PHENOLIC RESINS, PROCESS OF SYNTHESIS OF SAID PHENOLIC RESINS AND USE THEREOF
20220064356 · 2022-03-03 ·

The present invention relates to a novolac-type phenolic resin synthesis process in which there is the addition of lignin, to a novolac-type phenolic resin comprising lignin, and to the use of said phenolic resin.