The present disclosure provides a phosphor-containing phenol formaldehyde resin compound having a general formula (I): ##STR00001##
The compound is formed of a phenol formaldehyde resin and an aromatic phosphate compound by performing a condensation reaction, which may be used as a curing agent of an epoxy resin. The phenol formaldehyde resin is formed of a phenolic compound, a bisphenol compound and formaldehyde. The present disclosure further provides a phosphor-containing phenol formaldehyde resin cured material which is formed of the phosphor-containing phenol formaldehyde resin compound and an epoxy resin under a high temperature. The phosphor-containing phenol formaldehyde resin compound is added separately or mixed with an epoxy resin curing agent.

The present disclosure provides a phosphor-containing phenol formaldehyde resin compound having a general formula (I): ##STR00001##
The compound is formed of a phenol formaldehyde resin and an aromatic phosphate compound by performing a condensation reaction, which may be used as a curing agent of an epoxy resin. The phenol formaldehyde resin is formed of a phenolic compound, a bisphenol compound and formaldehyde. The present disclosure further provides a phosphor-containing phenol formaldehyde resin cured material which is formed of the phosphor-containing phenol formaldehyde resin compound and an epoxy resin under a high temperature. The phosphor-containing phenol formaldehyde resin compound is added separately or mixed with an epoxy resin curing agent.

The invention relates to an in-situ process for preparing an alkylphenol-aldehyde resin. The process comprises the step of providing a raw alkylphenol composition. The raw alkylphenol composition comprises one or more alkylphenol compounds and at least about 1 wt % phenol. Each alkylphenol compound has one or more alkyl substituents. The raw alkylphenol composition is reacted directly, without pre-purification, with one or more aldehydes to form an in-situ alkylphenol-aldehyde resin. The invention also relates to an in-situ alkylphenol-aldehyde resin formed from the in-situ process, and its use in a tackifier composition and rubber composition. The tackifier composition and rubber composition containing the in-situ alkylphenol-aldehyde resin show, inter alia, improved tack performance.

The invention relates to an in-situ process for preparing an alkylphenol-aldehyde resin. The process comprises the step of providing a raw alkylphenol composition. The raw alkylphenol composition comprises one or more alkylphenol compounds and at least about 1 wt % phenol. Each alkylphenol compound has one or more alkyl substituents. The raw alkylphenol composition is reacted directly, without pre-purification, with one or more aldehydes to form an in-situ alkylphenol-aldehyde resin. The invention also relates to an in-situ alkylphenol-aldehyde resin formed from the in-situ process, and its use in a tackifier composition and rubber composition. The tackifier composition and rubber composition containing the in-situ alkylphenol-aldehyde resin show, inter alia, improved tack performance.

Provided are a modified epoxy resin and a modified epoxy resin whose cured products exhibit good heat resistance and dielectric properties, methods for producing these, a curable resin composition, a cured product of the curable resin composition, and a printed wiring substrate. A modified phenolic resin comprises a phenolic resin structure (A), wherein at least one aromatic nucleus (a) in the phenolic resin structure (A) has, as a substituent, a structural segment (1) represented by structural formula (1) below: ##STR00001##
In the formula, Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group.

Provided are a modified epoxy resin and a modified epoxy resin whose cured products exhibit good heat resistance and dielectric properties, methods for producing these, a curable resin composition, a cured product of the curable resin composition, and a printed wiring substrate. A modified phenolic resin comprises a phenolic resin structure (A), wherein at least one aromatic nucleus (a) in the phenolic resin structure (A) has, as a substituent, a structural segment (1) represented by structural formula (1) below: ##STR00001##
In the formula, Ar each independently represent a phenyl group, a naphthyl group, or a structural segment having, on an aromatic nucleus of a phenyl or naphthyl group, at least one substituent selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogen atom, a phenyl group, and an aralkyl group.

The present invention provides a resin composition for a printed wiring board comprising a cyanate compound (A) represented by following general formula (1): ##STR00001##
wherein n represents an integer of 1 or more; and an epoxy resin (B).

The present invention provides a resin composition for a printed wiring board comprising a cyanate compound (A) represented by following general formula (1): ##STR00001##
wherein n represents an integer of 1 or more; and an epoxy resin (B).

The present invention provides a resist under layer film composition containing a novolak resin having a repeating unit shown by the formula (1), ##STR00001##
wherein R represents a group containing one or more fluorine atoms. There is provided a resist under layer film composition that is excellent in filling property, generates little outgas, and has excellent dry etching resistance and heat resistance.

The present invention provides a resist under layer film composition containing a novolak resin having a repeating unit shown by the formula (1), ##STR00001##
wherein R represents a group containing one or more fluorine atoms. There is provided a resist under layer film composition that is excellent in filling property, generates little outgas, and has excellent dry etching resistance and heat resistance.