Patent classifications
C08G61/02
Fluorescent conjugated polymers
Water solvated polymeric dyes and polymeric tandem dyes are provided. The polymeric dyes include a water solvated light harvesting multichromophore having a conjugated segment of aryl or heteroaryl co-monomers linked via covalent bonds, vinylene groups or ethynylene groups. The polymeric tandem dyes further include a signaling chromophore covalently linked to the multichromophore in energy-receiving proximity therewith. Also provided are labeled specific binding members that include the subject polymeric dyes. Methods of evaluating a sample for the presence of a target analyte and methods of labeling a target molecule in which the subject polymeric dyes find use are also provided. Systems and kits for practicing the subject methods are also provided.
Fluorinated aromatic polymer and method for producing same
The present invention addresses the problem of providing a fluorine-containing aromatic polymer; a method for producing the fluorine-containing aromatic polymer; etc. The problem can be solved by: a polymer having a monomer unit represented by formula (1) (wherein R.sup.1 in each occurrence is independently a halogen atom, NR.sup.11R.sup.12 (wherein R.sup.11 and R.sup.12 are independently a hydrogen atom or an organic group), or an organic group; n1 is an integer of 0 to 4; two R.sup.1s that can be present in the ortho-positions may form a ring together with two carbon atoms on the adjacent benzene ring, wherein the formed ring may have an organic group as a substituent; and L.sup.1 is a single bond, an oxygen atom, a sulfur atom, -L.sup.11-O—, —O-L.sup.12-O—, -L.sup.13-S—, or —S-L.sup.14-S— (wherein L.sup.11 to L.sup.14 are each independently an alkylene group optionally having one or more substituents); etc.
NOVEL GROUP 4 TRANSITION METAL COMPOUND AND USE THEREOF
The present invention relates to a novel Group 4 transition metal compound, a method for preparing the compound, a catalyst composition comprising the compound, and a method for preparing a polyolefin comprising performing a polymerization reaction of olefin monomers, in the presence of the catalyst composition. Since the Group 4 transition metal compound of the present invention exhibits an excellent catalytic activity in polyolefin synthesis reactions, as well as having excellent thermal stability, it can be used for polyolefin synthesis reactions at high temperatures, and by changing the type of a central metal and ligand, the weight average molecular weight of synthesized polyolefins and the octene content in the polymer can be controlled. Therefore, it can be effectively used in polyolefin synthesis processes in which grades are controlled.
NOVEL GROUP 4 TRANSITION METAL COMPOUND AND USE THEREOF
The present invention relates to a novel Group 4 transition metal compound, a method for preparing the compound, a catalyst composition comprising the compound, and a method for preparing a polyolefin comprising performing a polymerization reaction of olefin monomers, in the presence of the catalyst composition. Since the Group 4 transition metal compound of the present invention exhibits an excellent catalytic activity in polyolefin synthesis reactions, as well as having excellent thermal stability, it can be used for polyolefin synthesis reactions at high temperatures, and by changing the type of a central metal and ligand, the weight average molecular weight of synthesized polyolefins and the octene content in the polymer can be controlled. Therefore, it can be effectively used in polyolefin synthesis processes in which grades are controlled.
Oligomer resin compositions
A resin has a structure defined by Formula (I) ##STR00001## wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).
Oligomer resin compositions
A resin has a structure defined by Formula (I) ##STR00001## wherein: (a) each R.sub.5 is independently a methylene group (CH.sub.2), or a methylene group substituted with one or more —H, —CH.sub.3, or halogen functionalities; (b) each R.sub.6 is independently a bond or a straight-chain or branched, linear or cyclic, saturated or unsaturated, substituted or unsubstituted, aliphatic or aromatic group having between 1 and 2 carbon atoms; (c) each X is independently a functionality possessing at least one non-aromatic alkene or alkyne moiety; (d) each Z is independently either H or X; (e) each Z is independently either H or X, and each p is independently an integer from 1-4; (f) each w is independently 0, or an integer greater than or equal to 1, and (i) when w is 0, the bracket region represents a bond and n is 0, or an integer greater than or equal to 1; and (ii) when n is 0, the bracket region represents a bond. The resin is especially well suited for use in a base station, circuit board, server, router, radome or satellite structure, as well as such processes as digital light printing (DLP), continuous liquid interface printing (CLIP), and Stereolithography (SL).
NOVEL POLYMERS AND METHODS FOR THEIR MANUFACTURE
Embodiments of the invention relate to a novel class of polymers with superior mechanical properties and chemical stability, as compared to known polymers. These polymers are particularly well suited for use in anion exchange membranes (AEMs), including those employed in fuel cells. Novel methods for the manufacture of these polymers are also described.
NOVEL POLYMERS AND METHODS FOR THEIR MANUFACTURE
Embodiments of the invention relate to a novel class of polymers with superior mechanical properties and chemical stability, as compared to known polymers. These polymers are particularly well suited for use in anion exchange membranes (AEMs), including those employed in fuel cells. Novel methods for the manufacture of these polymers are also described.
Material for forming organic film, patterning process, and polymer
A material for forming an organic film contains a polymer having a repeating unit shown by the following general formula (1), and an organic solvent, where AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent; W.sub.1 represents a divalent organic group having 2 to 20 carbon atoms and no aromatic ring, and a methylene group constituting the organic group is optionally substituted with an oxygen atom or a carbonyl group; and W.sub.2 represents a divalent organic group having 6 to 80 carbon atoms and at least one or more aromatic rings. This invention provides: an organic film material being excellent in film formability and enabling high etching resistance and excellent twisting resistance and filling property; a patterning process using this material; and a polymer suitable for such an organic film material. ##STR00001##
Material for forming organic film, patterning process, and polymer
A material for forming an organic film contains a polymer having a repeating unit shown by the following general formula (1), and an organic solvent, where AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent; W.sub.1 represents a divalent organic group having 2 to 20 carbon atoms and no aromatic ring, and a methylene group constituting the organic group is optionally substituted with an oxygen atom or a carbonyl group; and W.sub.2 represents a divalent organic group having 6 to 80 carbon atoms and at least one or more aromatic rings. This invention provides: an organic film material being excellent in film formability and enabling high etching resistance and excellent twisting resistance and filling property; a patterning process using this material; and a polymer suitable for such an organic film material. ##STR00001##