C08G75/02

POLYARYLENE SULFIDE PRODUCTION METHOD AND POLYARYLENE SULFIDE PRODUCTION APPARATUS
20190338075 · 2019-11-07 ·

Provided is a PAS production method and a PAS production apparatus wherein, in a gas-liquid system including a gas phase containing water, a dihalo aromatic compound, and hydrogen sulfide and a liquid phase containing a polar organic solvent and PAS, the dihalo aromatic compound and the hydrogen sulfide that can be volatilized at the time of dehydration from the gas phase can be recovered. The PAS production method according to the present invention includes: a condensation step of obtaining a first intermediate gas phase containing a dihalo aromatic compound and hydrogen sulfide and a first intermediate liquid phase containing water, a dihalo aromatic compound, and a sulfur source by condensation from the gas phase in the gas-liquid; a first recovery step of bringing the first intermediate gas phase into contact with a polar organic solvent to obtain a first recovered gas phase containing hydrogen sulfide and a first recovered liquid phase containing a polar organic solvent, a dihalo aromatic compound, and a sulfur source; and a second recovery step of bringing the first recovered gas phase into contact with an alkali metal hydroxide aqueous solution to obtain a second recovered liquid phase containing water, a sulfur source, and an alkali metal hydroxide.

TEMPORARY PROTECTIVE LACQUER OPTICAL ELEMENT
20190330480 · 2019-10-31 ·

A lacquer composition is provided, comprising 20%-79.9% by weight, based on the total weight of the composition, of a thiol compound having two or more thiol groups, 20%-79.9% by weight, based on the total weight of the composition, of a compound having two or more carbon-carbon double bonds and 0.1%-10% by weight, based on the total weight of the composition, of a separating agent having an alkyl radical having 4-20 carbon atoms, where the alkyl radical is unsubstituted or fluorine-substituted and the alkyl radical is bonded to a functional group. Also provided are the use of this lacquer composition as a protective lacquer on an optical surface of an optical element in the production of the optical element, and an optical element comprising the protective lacquer.

Heteroatom containing cyclic dimers

The present invention provides cyclic dimers of alpha acids and polymers derived therefrom. Also provided are processes for preparing and methods of using the cyclic dimers and the polymers derived from the cyclic dimers.

Heteroatom containing cyclic dimers

The present invention provides cyclic dimers of alpha acids and polymers derived therefrom. Also provided are processes for preparing and methods of using the cyclic dimers and the polymers derived from the cyclic dimers.

Polymer and polymer electrolyte membrane comprising same

The present specification relates to a polymer with improved ion transport capability, a polymer electrolyte membrane including the same, a membrane-electrode assembly including the polymer electrolyte membrane, a fuel cell including the membrane-electrode assembly, and a redox flow battery including the polymer electrolyte membrane.

Polymer and polymer electrolyte membrane comprising same

The present specification relates to a polymer with improved ion transport capability, a polymer electrolyte membrane including the same, a membrane-electrode assembly including the polymer electrolyte membrane, a fuel cell including the membrane-electrode assembly, and a redox flow battery including the polymer electrolyte membrane.

POLYARYLENE SULFIDE RESIN AND MANUFACTURING METHOD THEREFOR, POLY(ARYLENE SULFONIUM SALT) AND MANUFACTURING METHOD THEREFOR, AND SULFOXIDE

The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit,

##STR00001##

wherein R.sup.1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar.sup.1 and Ar.sup.2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.

Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator

The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. ##STR00001##
In the formula, four pieces of R.sup.1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R.sup.2 each independently represent a fluorine atom or a trifluoromethyl group; R.sup.3, R.sup.6, R.sup.7 and R.sup.10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R.sup.4 and R.sup.5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R.sup.4 and R.sup.5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R.sup.8 and R.sup.9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R.sup.8 and R.sup.9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R.sup.3 to R.sup.10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator

The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. ##STR00001##
In the formula, four pieces of R.sup.1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R.sup.2 each independently represent a fluorine atom or a trifluoromethyl group; R.sup.3, R.sup.6, R.sup.7 and R.sup.10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R.sup.4 and R.sup.5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R.sup.4 and R.sup.5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R.sup.8 and R.sup.9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R.sup.8 and R.sup.9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R.sup.3 to R.sup.10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.

POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIALS AND APPLICATION OF SAME

A polymerizable composition for optical materials of the present invention includes a polymer (a) comprised of one or more compounds selected from compounds represented by the following General Formulas (1) to (4), a compound (b) of which light absorption characteristics vary by sensing changes in environment; and a polymerization reactive compound (c) (except for the polymer (a)).

##STR00001##