Embodiments of the present invention relate to polyethylene-based compositions, monolayer films, multilayer films, laminates, and articles. In one aspect, a polyethylene-based composition comprises (A) at least 95% by weight, based on the total weight of the polyethylene-based composition, of one or more polyethylenes; and (B) 250 to 15,000 ppm, based on the total weight of the polyethylene-based composition, of a polydimethylsiloxane having a number average molecular weight (M.sub.n) of 1,000 to 40,000 g/mol, wherein the polyethylene-based composition has a density of 0.865 to 0.915 g/cm.sup.3 and a melt index (I.sub.2) of 0.5 to 25 g/10 minutes.

A silicone polymer production method achieves a significantly improved yield due to the needlessness of a rinsing step and can produce a stable silicone polymer. The production method for a silicone polymer includes a step of preparing at least one silane compound selected from the compounds represented by general formula (1); R.sub.aSi(OR.sup.1).sub.4-a (1), wherein R is a hydrogen atom or a monovalent organic group, R.sup.1 is a monovalent organic group, and a is an integer of 1 or 2 and the compounds represented by general formula (2); Si(OR.sup.2).sub.4 (2), wherein R.sup.2 is a monovalent organic group, a step of hydrolyzing it with a quaternary ammonium compound in the presence of water, and a step of bringing it into contact with a cation exchange resin.

R.sup.1.sub.aR.sup.2.sub.bSi(R.sup.3).sub.4−(a+b)   (1)

A composition for a silicon-containing resist underlying film and for forming a resist underlying film that can be removed by a conventional method employing dry etching, but also by a method employing wet etching using a chemical liquid in a step for processing a semiconductor substrate or the like; and a composition for forming a resist underlying film for lithography and for forming a resist underlying film that has excellent storage stability and produces less residue in a dry etching step. A composition for forming a resist underlying film, the composition including a hydrolysis condensate of a hydrolysable silane mixture containing an alkyltrialkoxy silane and a hydrolysable silane of formula (1), wherein the contained amount of the alkyltrialkoxy silane in the mixture is 0 mol % or more but less than 40 mol % with respect to the total amount by mole of all of the hydrolysable silane contained in the mixture.

Example patterning materials and pattern films are described. One example patterning material includes polysiloxane. The polysiloxane includes at least one cyclic structure formed by silicon-oxygen (Si—O) bond repetitions and an organic group connected to a Si atom in the at least one cyclic structure. A subset of Si atoms in the at least one cyclic structure are substituted by a metal element, and/or at least one organic group includes a halogen element.

Example patterning materials and pattern films are described. One example patterning material includes polysiloxane. The polysiloxane includes at least one cyclic structure formed by silicon-oxygen (Si—O) bond repetitions and an organic group connected to a Si atom in the at least one cyclic structure. A subset of Si atoms in the at least one cyclic structure are substituted by a metal element, and/or at least one organic group includes a halogen element.

Provided are a yaw brake lining and a method of producing the same, which relate to the technical field of macromolecular material. The yaw brake lining is mainly prepared from, by weight, the following ingredients: 40-50 parts of polyethylene terephthalate, 5-10 parts of polybutylene terephthalate, 5-10 parts of polytrimethylene terephthalate, 20-30 parts of glass fiber, 1-3 parts of anti-wear agent, 1-5 parts of lubricant, 1-3 parts of antioxidant and 1-3 parts of coupling agent. It achieves the technical effect that the brake disc is protected from damage due to its direct collision with the metal material during braking, and thus effectively guarantees the braking effect of the yaw brake.

A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure represented by general formula (u2-1), and a block (b22) consisting of a polymer having a repeating structure of a structural unit (u22) containing a silicon atom, and the block (b22) is positioned between the first block and the block (b21) (wherein R.sup.P211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and R.sup.P212 represents an organic group having a polar group). ##STR00001##

Thus, the present invention provides a composition in powder form comprising highly dispersed silica particles, polymethylsiloxane particles, and a cationic surfactant, wherein at least 25% by weight of the cationic surfactant is present in primary polymethylsiloxane particles carrying the cationic surfactant on their surface and/or in agglomerates of these primary particles.

Thus, the present invention provides a composition in powder form comprising highly dispersed silica particles, polymethylsiloxane particles, and a cationic surfactant, wherein at least 25% by weight of the cationic surfactant is present in primary polymethylsiloxane particles carrying the cationic surfactant on their surface and/or in agglomerates of these primary particles.

A method of storing gas comprises providing a recipient for receiving the gas and providing a porous gas storage material. The gas storage material comprises a cross-linked polymeric framework and a plurality of pores for gas sorption. The cross-linked polymeric framework comprises aromatic ring-containing monomeric units comprising at least two aromatic rings. The aromatic ring-containing monomeric units are linked by covalent cross-linking between aromatic rings to form a stable, rigid nanoporous material for storing the gas at pressures significantly greater than the atmospheric pressure, for example in excess of 100 bar. A possible application is the storage and transportation of compressed natural gas.